IN2012DE00981A - - Google Patents

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Publication number
IN2012DE00981A
IN2012DE00981A IN981DE2012A IN2012DE00981A IN 2012DE00981 A IN2012DE00981 A IN 2012DE00981A IN 981DE2012 A IN981DE2012 A IN 981DE2012A IN 2012DE00981 A IN2012DE00981 A IN 2012DE00981A
Authority
IN
India
Prior art keywords
texture
lacquer layer
includes providing
light management
substrate
Prior art date
Application number
Other languages
English (en)
Inventor
Jos Rutten
Rob Van Erven
Original Assignee
Moser Baer India Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Moser Baer India Ltd filed Critical Moser Baer India Ltd
Priority to IN981DE2012 priority Critical patent/IN2012DE00981A/en
Priority to EP13161322.6A priority patent/EP2645420A3/en
Priority to US13/852,066 priority patent/US20130295713A1/en
Publication of IN2012DE00981A publication Critical patent/IN2012DE00981A/en

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/70Surface textures, e.g. pyramid structures
    • H10F77/703Surface textures, e.g. pyramid structures of the semiconductor bodies, e.g. textured active layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/138Manufacture of transparent electrodes, e.g. transparent conductive oxides [TCO] or indium tin oxide [ITO] electrodes
    • H10F71/1385Etching transparent electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/14Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
    • H10F77/148Shapes of potential barriers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/16Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • H10F77/162Non-monocrystalline materials, e.g. semiconductor particles embedded in insulating materials
    • H10F77/166Amorphous semiconductors
    • H10F77/1662Amorphous semiconductors including only Group IV materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/70Surface textures, e.g. pyramid structures
    • H10F77/707Surface textures, e.g. pyramid structures of the substrates or of layers on substrates, e.g. textured ITO layer on a glass substrate
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/548Amorphous silicon PV cells

Landscapes

  • Photovoltaic Devices (AREA)
IN981DE2012 2012-03-30 2012-03-30 IN2012DE00981A (enExample)

Priority Applications (3)

Application Number Priority Date Filing Date Title
IN981DE2012 IN2012DE00981A (enExample) 2012-03-30 2012-03-30
EP13161322.6A EP2645420A3 (en) 2012-03-30 2013-03-27 Modification and optimization of a light management layer for thin film solar cells
US13/852,066 US20130295713A1 (en) 2012-03-30 2013-03-28 Modification and Optimization of a Light Management Area

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IN981DE2012 IN2012DE00981A (enExample) 2012-03-30 2012-03-30

Publications (1)

Publication Number Publication Date
IN2012DE00981A true IN2012DE00981A (enExample) 2015-09-11

Family

ID=47998269

Family Applications (1)

Application Number Title Priority Date Filing Date
IN981DE2012 IN2012DE00981A (enExample) 2012-03-30 2012-03-30

Country Status (3)

Country Link
US (1) US20130295713A1 (enExample)
EP (1) EP2645420A3 (enExample)
IN (1) IN2012DE00981A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9460019B2 (en) * 2014-06-26 2016-10-04 Intel Corporation Sending packets using optimized PIO write sequences without SFENCEs
CN112635591A (zh) * 2020-12-22 2021-04-09 泰州隆基乐叶光伏科技有限公司 一种太阳能电池的制备方法以及太阳能电池

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090266415A1 (en) * 2006-06-27 2009-10-29 Liquidia Technologies , Inc. Nanostructures and materials for photovoltaic devices
KR101494153B1 (ko) * 2007-12-21 2015-02-23 주성엔지니어링(주) 박막형 태양전지 및 그 제조방법
US20100258163A1 (en) * 2009-04-14 2010-10-14 Honeywell International Inc. Thin-film photovoltaics
TWI458126B (zh) * 2009-12-10 2014-10-21 Nat Inst Chung Shan Science & Technology 以奈米壓印形成發光元件之薄膜結構的製造方法
KR20120112004A (ko) * 2011-03-31 2012-10-11 모저 베어 인디아 엘티디 전기 그리드선을 고정하기 위한 래커층 패터닝 방법
JP2012222346A (ja) * 2011-04-08 2012-11-12 Moser Baer India Ltd ラッカー層上に電気グリッド線を転写する方法
IN2012DE00891A (enExample) * 2012-03-27 2015-09-11 Moser Baer India Ltd

Also Published As

Publication number Publication date
EP2645420A3 (en) 2014-06-18
EP2645420A2 (en) 2013-10-02
US20130295713A1 (en) 2013-11-07

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