IN191475B - - Google Patents

Info

Publication number
IN191475B
IN191475B IN527CA1997A IN191475B IN 191475 B IN191475 B IN 191475B IN 527CA1997 A IN527CA1997 A IN 527CA1997A IN 191475 B IN191475 B IN 191475B
Authority
IN
India
Application number
Other languages
English (en)
Inventor
Kamiguchi Yuzo
Saito Kazuhiro
Fukuzawa Hideaki
Fuke Hiromi
Iwaskai Hitoshi
Original Assignee
Toshiba Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Kk filed Critical Toshiba Kk
Publication of IN191475B publication Critical patent/IN191475B/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3268—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
    • H01F10/3281—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn only by use of asymmetry of the magnetic film pair itself, i.e. so-called pseudospin valve [PSV] structure, e.g. NiFe/Cu/Co
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/10—Magnetoresistive devices
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B2005/3996—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects large or giant magnetoresistive effects [GMR], e.g. as generated in spin-valve [SV] devices
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
    • G11B5/3916—Arrangements in which the active read-out elements are coupled to the magnetic flux of the track by at least one magnetic thin film flux guide
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
    • G11B5/3929—Disposition of magnetic thin films not used for directly coupling magnetic flux from the track to the MR film or for shielding
    • G11B5/3932—Magnetic biasing films
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3967—Composite structural arrangements of transducers, e.g. inductive write and magnetoresistive read
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3295—Spin-exchange coupled multilayers wherein the magnetic pinned or free layers are laminated without anti-parallel coupling within the pinned and free layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Thin Magnetic Films (AREA)
  • Hall/Mr Elements (AREA)
  • Magnetic Heads (AREA)
  • Measuring Magnetic Variables (AREA)
  • Laminated Bodies (AREA)
IN527CA1997 1996-03-28 1997-03-25 IN191475B (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP07340496A JP3461999B2 (ja) 1996-03-28 1996-03-28 磁気抵抗効果素子
JP10906796A JP3217697B2 (ja) 1996-03-28 1996-04-30 磁気抵抗効果素子

Publications (1)

Publication Number Publication Date
IN191475B true IN191475B (ja) 2003-12-06

Family

ID=26414548

Family Applications (1)

Application Number Title Priority Date Filing Date
IN527CA1997 IN191475B (ja) 1996-03-28 1997-03-25

Country Status (8)

Country Link
US (1) US6088195A (ja)
JP (2) JP3461999B2 (ja)
KR (1) KR100249976B1 (ja)
CN (1) CN1106635C (ja)
IN (1) IN191475B (ja)
MY (1) MY120928A (ja)
SG (1) SG45540A1 (ja)
TW (1) TW325560B (ja)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2970590B2 (ja) * 1997-05-14 1999-11-02 日本電気株式会社 磁気抵抗効果素子並びにこれを用いた磁気抵抗効果センサ、磁気抵抗検出システム及び磁気記憶システム
US6307708B1 (en) * 1998-03-17 2001-10-23 Kabushiki Kaisha Toshiba Exchange coupling film having a plurality of local magnetic regions, magnetic sensor having the exchange coupling film, and magnetic head having the same
JP3075253B2 (ja) 1998-03-31 2000-08-14 日本電気株式会社 スピンバルブ型感磁素子及びこれを用いた磁気ヘッド並びに磁気ディスク装置
US6738236B1 (en) 1998-05-07 2004-05-18 Seagate Technology Llc Spin valve/GMR sensor using synthetic antiferromagnetic layer pinned by Mn-alloy having a high blocking temperature
US6195240B1 (en) * 1998-07-31 2001-02-27 International Business Machines Corporation Spin valve head with diffusion barrier
DE19843348A1 (de) * 1998-09-22 2000-03-23 Bosch Gmbh Robert Magnetoresistives Sensorelement, insbesondere Winkelsensorelement
US6400536B1 (en) * 1999-03-30 2002-06-04 International Business Machines Corporation Low uniaxial anisotropy cobalt iron (COFE) free layer structure for GMR and tunnel junction heads
JP4054142B2 (ja) 1999-09-28 2008-02-27 富士通株式会社 スピンバルブ型磁気抵抗効果型素子
US6853520B2 (en) * 2000-09-05 2005-02-08 Kabushiki Kaisha Toshiba Magnetoresistance effect element
TW550394B (en) * 2000-10-26 2003-09-01 Res Inst For Electric And Magn Thin-film magnetic field sensor
US6724674B2 (en) * 2000-11-08 2004-04-20 International Business Machines Corporation Memory storage device with heating element
US6771473B2 (en) * 2001-01-22 2004-08-03 Matsushita Electric Industrial Co., Ltd. Magnetoresistive element and method for producing the same
JP2002217030A (ja) * 2001-01-23 2002-08-02 Hitachi Ltd 磁気抵抗効果磁気センサー及び磁気記録再生装置
US6661625B1 (en) 2001-02-20 2003-12-09 Kyusik Sin Spin-dependent tunneling sensor with low resistance metal oxide tunnel barrier
US6665155B2 (en) * 2001-03-08 2003-12-16 International Business Machines Corporation Spin valve sensor with free layer structure having a cobalt niobium (CoNb) or cobalt niobium hafnium (CoNbHf) layer
JP2003198002A (ja) * 2001-12-25 2003-07-11 Fujitsu Ltd 磁気抵抗効果膜および強磁性積層構造体
US7054118B2 (en) * 2002-03-28 2006-05-30 Nve Corporation Superparamagnetic field sensing devices
DE10214159B4 (de) * 2002-03-28 2008-03-20 Qimonda Ag Verfahren zur Herstellung einer Referenzschicht für MRAM-Speicherzellen
JP2003317214A (ja) * 2002-04-19 2003-11-07 Alps Electric Co Ltd 薄膜磁気ヘッド及び薄膜磁気ヘッドの下部シールド層の形成方法
JP2007299880A (ja) 2006-04-28 2007-11-15 Toshiba Corp 磁気抵抗効果素子，および磁気抵抗効果素子の製造方法
JP4388093B2 (ja) * 2007-03-27 2009-12-24 株式会社東芝 磁気抵抗効果素子、磁気ヘッド、磁気記録再生装置
JP4780117B2 (ja) * 2008-01-30 2011-09-28 日立金属株式会社 角度センサ、その製造方法及びそれを用いた角度検知装置
JP5032430B2 (ja) * 2008-09-26 2012-09-26 株式会社東芝 磁気抵抗効果素子の製造方法、磁気抵抗効果素子、磁気ヘッドアセンブリ及び磁気記録再生装置
JP5039007B2 (ja) * 2008-09-26 2012-10-03 株式会社東芝 磁気抵抗効果素子の製造方法、磁気抵抗効果素子、磁気ヘッドアセンブリ及び磁気記録再生装置
JP5032429B2 (ja) * 2008-09-26 2012-09-26 株式会社東芝 磁気抵抗効果素子の製造方法、磁気抵抗効果素子、磁気ヘッドアセンブリ及び磁気記録再生装置
JP5039006B2 (ja) 2008-09-26 2012-10-03 株式会社東芝 磁気抵抗効果素子の製造方法、磁気抵抗効果素子、磁気ヘッドアセンブリ及び磁気記録再生装置
TWI449067B (zh) * 2011-06-01 2014-08-11 Voltafield Technology Corp 自旋閥磁阻感測器
US9349391B2 (en) * 2013-12-04 2016-05-24 HGST Netherlands B.V. Controlling magnetic layer anisotropy field by oblique angle static deposition
JP6233722B2 (ja) 2015-06-22 2017-11-22 Tdk株式会社 磁界発生体、磁気センサシステムおよび磁気センサ
CN110531286A (zh) * 2019-07-26 2019-12-03 西安交通大学 一种抗强磁场干扰的amr传感器及其制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2661068B2 (ja) * 1987-10-29 1997-10-08 ソニー株式会社 磁気抵抗効果型磁気ヘッド
JPH04167214A (ja) * 1990-10-30 1992-06-15 Sony Corp 磁気抵抗効果型磁気ヘッド
US5159513A (en) * 1991-02-08 1992-10-27 International Business Machines Corporation Magnetoresistive sensor based on the spin valve effect
US5549978A (en) * 1992-10-30 1996-08-27 Kabushiki Kaisha Toshiba Magnetoresistance effect element
US5493465A (en) * 1993-03-15 1996-02-20 Kabushiki Kaisha Toshiba Magnetoresistance effect element and magnetic recording apparatus
US5483402A (en) * 1994-06-15 1996-01-09 Quantum Corporation Magneto resistive head having symmetric off-track performance profile
US5648885A (en) * 1995-08-31 1997-07-15 Hitachi, Ltd. Giant magnetoresistive effect sensor, particularly having a multilayered magnetic thin film layer

Also Published As

Publication number Publication date
JPH09266334A (ja) 1997-10-07
KR100249976B1 (ko) 2000-03-15
SG45540A1 (en) 1998-01-16
US6088195A (en) 2000-07-11
JP3461999B2 (ja) 2003-10-27
JP3217697B2 (ja) 2001-10-09
CN1106635C (zh) 2003-04-23
JPH09293218A (ja) 1997-11-11
MY120928A (en) 2005-12-30
TW325560B (en) 1998-01-21
CN1182262A (zh) 1998-05-20

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