IN187865B - - Google Patents

Info

Publication number
IN187865B
IN187865B IN837CA1996A IN187865B IN 187865 B IN187865 B IN 187865B IN 837CA1996 A IN837CA1996 A IN 837CA1996A IN 187865 B IN187865 B IN 187865B
Authority
IN
India
Application number
Other languages
English (en)
Inventor
William Albert Larkin
Original Assignee
Atofina Chem Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atofina Chem Inc filed Critical Atofina Chem Inc
Publication of IN187865B publication Critical patent/IN187865B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/22—Tin compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/22—Tin compounds
    • C07F7/2208—Compounds having tin linked only to carbon, hydrogen and/or halogen
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Surface Treatment Of Glass (AREA)
  • Paints Or Removers (AREA)
IN837CA1996 1995-06-02 1996-05-08 IN187865B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/459,958 US5725904A (en) 1995-06-02 1995-06-02 Liquid methyltin halide compositions

Publications (1)

Publication Number Publication Date
IN187865B true IN187865B (de) 2002-07-13

Family

ID=23826851

Family Applications (1)

Application Number Title Priority Date Filing Date
IN837CA1996 IN187865B (de) 1995-06-02 1996-05-08

Country Status (19)

Country Link
US (2) US5725904A (de)
EP (1) EP0745605B1 (de)
JP (1) JPH08333376A (de)
KR (1) KR100407420B1 (de)
CN (1) CN1096504C (de)
AR (1) AR002179A1 (de)
AT (1) ATE238314T1 (de)
AU (1) AU701688B2 (de)
BR (1) BR9602525A (de)
CA (1) CA2175953A1 (de)
CO (1) CO4560462A1 (de)
CZ (1) CZ292143B6 (de)
DE (1) DE69627573T2 (de)
DK (1) DK0745605T3 (de)
ES (1) ES2191725T3 (de)
IN (1) IN187865B (de)
PT (1) PT745605E (de)
TW (1) TW408160B (de)
ZA (1) ZA964410B (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5725904A (en) * 1995-06-02 1998-03-10 Elf Atochem North America, Inc. Liquid methyltin halide compositions
US6238734B1 (en) * 1999-07-08 2001-05-29 Air Products And Chemicals, Inc. Liquid precursor mixtures for deposition of multicomponent metal containing materials
US6503561B1 (en) * 1999-07-08 2003-01-07 Air Products And Chemicals, Inc. Liquid precursor mixtures for deposition of multicomponent metal containing materials
US20070194470A1 (en) * 2006-02-17 2007-08-23 Aviza Technology, Inc. Direct liquid injector device
US20080026147A1 (en) * 2006-07-28 2008-01-31 Gulbrandsen Chemicals, Inc. Method and formulation for depositing a metal-containing coating on a substrate
US20080152804A1 (en) * 2006-07-28 2008-06-26 Gulbrandsen Chemicals, Inc. Method for depositing a metal-containing coating on a substrate
US7947374B2 (en) * 2009-02-19 2011-05-24 Guardian Industries Corp. Coated article with sputter-deposited transparent conductive coating capable of surviving harsh environments, and method of making the same
US20100209730A1 (en) * 2009-02-19 2010-08-19 Guardian Industries Corp., Coated article with sputter-deposited transparent conductive coating for refrigeration/freezer units, and method of making the same
US8097342B2 (en) 2009-02-19 2012-01-17 Guardian Industries Corp. Coated article with sputter-deposited transparent conductive coating capable of surviving harsh environments, and method of making the same
US8062706B2 (en) * 2009-03-31 2011-11-22 Ppg Industries Ohio, Inc. Recovery of monobutyltin trichloride

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2566346A (en) * 1948-09-08 1951-09-04 Pittsburgh Plate Glass Co Electroconductive products and production thereof
GB1520124A (en) * 1974-09-18 1978-08-02 M & T Chemicals Inc Process for applying stannic oxide coatings to glass
IT1024841B (it) * 1974-11-18 1978-07-20 Olivetti Ing C S P A Cartuccia per un nastro inchiostra to senza fine di macchine per ufficio soriventi
US4130673A (en) * 1975-07-02 1978-12-19 M&T Chemicals Inc. Process of applying tin oxide on glass using butyltin trichloride
US4187336A (en) * 1977-04-04 1980-02-05 Gordon Roy G Non-iridescent glass structures
US4254017A (en) * 1978-11-13 1981-03-03 M&T Chemicals Inc. Organotin mercaptoalkanol esters and alkoxides containing sulfide groups
JPS5714594A (en) * 1980-06-30 1982-01-25 Adeka Argus Chem Co Ltd Preparing process for mixture of dimethyltin dichloride with monomethyltin trichloride
US4293594A (en) * 1980-08-22 1981-10-06 Westinghouse Electric Corp. Method for forming conductive, transparent coating on a substrate
US4530857A (en) * 1983-05-13 1985-07-23 M&T Chemicals Inc. Glass container hot end coating formulation and method of use
US4731256A (en) * 1984-04-10 1988-03-15 M&T Chemicals Inc. Liquid coating composition for producing high quality, high performance fluorine-doped tin oxide coatings
US4584206A (en) * 1984-07-30 1986-04-22 Ppg Industries, Inc. Chemical vapor deposition of a reflective film on the bottom surface of a float glass ribbon
US4590096A (en) * 1984-12-28 1986-05-20 M&T Chemicals Inc. Water vapor, reaction rate and deposition rate control of tin oxide film by CVD on glass
US4547400A (en) * 1985-02-25 1985-10-15 Ford Motor Company Method of making infrared reflective glass sheet-I
US4731462A (en) * 1986-07-18 1988-03-15 M&T Chemicals Inc. Organotin compounds containing fluorine useful for forming fluorine-doped tin oxide coating
US5004490A (en) * 1987-08-10 1991-04-02 Ford Motor Company Method of making glass substrate coated with tin oxide
US5090985A (en) * 1989-10-17 1992-02-25 Libbey-Owens-Ford Co. Method for preparing vaporized reactants for chemical vapor deposition
US5725904A (en) * 1995-06-02 1998-03-10 Elf Atochem North America, Inc. Liquid methyltin halide compositions

Also Published As

Publication number Publication date
DK0745605T3 (da) 2003-08-18
CZ292143B6 (cs) 2003-08-13
US5853799A (en) 1998-12-29
PT745605E (pt) 2003-09-30
DE69627573D1 (de) 2003-05-28
CA2175953A1 (en) 1996-12-03
AR002179A1 (es) 1998-01-07
EP0745605A2 (de) 1996-12-04
JPH08333376A (ja) 1996-12-17
ATE238314T1 (de) 2003-05-15
ES2191725T3 (es) 2003-09-16
EP0745605A3 (de) 1999-03-17
CZ161096A3 (en) 1996-12-11
CN1096504C (zh) 2002-12-18
AU701688B2 (en) 1999-02-04
EP0745605B1 (de) 2003-04-23
US5725904A (en) 1998-03-10
AU5221196A (en) 1996-12-12
DE69627573T2 (de) 2003-11-27
ZA964410B (en) 1997-07-31
TW408160B (en) 2000-10-11
CO4560462A1 (es) 1998-02-10
KR970001253A (ko) 1997-01-21
KR100407420B1 (ko) 2004-04-09
BR9602525A (pt) 1998-10-27
CN1147024A (zh) 1997-04-09

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