IL98174A0 - Chemical vapor deposition of diamond coatings on hard substrates - Google Patents

Chemical vapor deposition of diamond coatings on hard substrates

Info

Publication number
IL98174A0
IL98174A0 IL98174A IL9817491A IL98174A0 IL 98174 A0 IL98174 A0 IL 98174A0 IL 98174 A IL98174 A IL 98174A IL 9817491 A IL9817491 A IL 9817491A IL 98174 A0 IL98174 A0 IL 98174A0
Authority
IL
Israel
Prior art keywords
vapor deposition
chemical vapor
diamond coatings
hard substrates
substrates
Prior art date
Application number
IL98174A
Other languages
English (en)
Original Assignee
Iscar Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Iscar Ltd filed Critical Iscar Ltd
Priority to IL98174A priority Critical patent/IL98174A0/xx
Priority to EP92303690A priority patent/EP0514032A1/de
Priority to ZA923043A priority patent/ZA923043B/xx
Priority to JP4143651A priority patent/JPH05156446A/ja
Publication of IL98174A0 publication Critical patent/IL98174A0/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
IL98174A 1991-05-17 1991-05-17 Chemical vapor deposition of diamond coatings on hard substrates IL98174A0 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
IL98174A IL98174A0 (en) 1991-05-17 1991-05-17 Chemical vapor deposition of diamond coatings on hard substrates
EP92303690A EP0514032A1 (de) 1991-05-17 1992-04-24 Chemische Gasphasenabscheidung von Diamantschichten auf harten Substraten
ZA923043A ZA923043B (en) 1991-05-17 1992-04-27 Chemical vapor deposition of diamond coatings on hard substrates
JP4143651A JPH05156446A (ja) 1991-05-17 1992-05-11 硬質基材へのダイアモンドコーテイングの化学蒸着

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IL98174A IL98174A0 (en) 1991-05-17 1991-05-17 Chemical vapor deposition of diamond coatings on hard substrates

Publications (1)

Publication Number Publication Date
IL98174A0 true IL98174A0 (en) 1992-06-21

Family

ID=11062446

Family Applications (1)

Application Number Title Priority Date Filing Date
IL98174A IL98174A0 (en) 1991-05-17 1991-05-17 Chemical vapor deposition of diamond coatings on hard substrates

Country Status (4)

Country Link
EP (1) EP0514032A1 (de)
JP (1) JPH05156446A (de)
IL (1) IL98174A0 (de)
ZA (1) ZA923043B (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2150739A1 (en) * 1994-06-14 1995-12-15 Deepak G. Bhat Method of depositing a composite diamond coating onto a hard substrate
FR2733255B1 (fr) * 1995-04-21 1997-10-03 France Etat Procede de fabrication d'une piece metallique recouverte de diamant et piece metallique obtenue au moyen d'un tel procede
US20030008070A1 (en) * 2001-06-12 2003-01-09 Applied Materials,Inc Low-resistivity tungsten from high-pressure chemical vapor deposition using metal-organic precursor
JP5982606B2 (ja) * 2011-12-05 2016-08-31 学校法人慶應義塾 ダイヤモンド被膜被着部材およびその製造方法
EP3366808B1 (de) * 2013-06-28 2023-10-25 Wayne State University Verfahren zur schichtbildung auf einem substrat
US9249505B2 (en) 2013-06-28 2016-02-02 Wayne State University Bis(trimethylsilyl) six-membered ring systems and related compounds as reducing agents for forming layers on a substrate
CN112593213A (zh) * 2020-12-11 2021-04-02 岳阳市青方环保科技有限公司 一种自动倾斜器导筒表面的耐磨防腐工艺

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE442305B (sv) * 1984-06-27 1985-12-16 Santrade Ltd Forfarande for kemisk gasutfellning (cvd) for framstellning av en diamantbelagd sammansatt kropp samt anvendning av kroppen
US4731296A (en) * 1986-07-03 1988-03-15 Mitsubishi Kinzoku Kabushiki Kaisha Diamond-coated tungsten carbide-base sintered hard alloy material for insert of a cutting tool
JPS63153275A (ja) * 1986-08-11 1988-06-25 Sumitomo Electric Ind Ltd ダイヤモンド被覆アルミナ

Also Published As

Publication number Publication date
ZA923043B (en) 1993-01-27
EP0514032A1 (de) 1992-11-19
JPH05156446A (ja) 1993-06-22

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