IL95966A0 - Chemical vapor deposition process to replicate the finish and/or figure of preshaped structures - Google Patents

Chemical vapor deposition process to replicate the finish and/or figure of preshaped structures

Info

Publication number
IL95966A0
IL95966A0 IL95966A IL9596690A IL95966A0 IL 95966 A0 IL95966 A0 IL 95966A0 IL 95966 A IL95966 A IL 95966A IL 9596690 A IL9596690 A IL 9596690A IL 95966 A0 IL95966 A0 IL 95966A0
Authority
IL
Israel
Prior art keywords
replicate
finish
vapor deposition
chemical vapor
deposition process
Prior art date
Application number
IL95966A
Other languages
English (en)
Original Assignee
Cvd Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cvd Inc filed Critical Cvd Inc
Publication of IL95966A0 publication Critical patent/IL95966A0/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
IL95966A 1989-10-23 1990-10-12 Chemical vapor deposition process to replicate the finish and/or figure of preshaped structures IL95966A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/425,076 US4997678A (en) 1989-10-23 1989-10-23 Chemical vapor deposition process to replicate the finish and figure of preshaped structures

Publications (1)

Publication Number Publication Date
IL95966A0 true IL95966A0 (en) 1991-07-18

Family

ID=23685038

Family Applications (1)

Application Number Title Priority Date Filing Date
IL95966A IL95966A0 (en) 1989-10-23 1990-10-12 Chemical vapor deposition process to replicate the finish and/or figure of preshaped structures

Country Status (6)

Country Link
US (1) US4997678A (fr)
EP (1) EP0425196B1 (fr)
JP (1) JPH079063B2 (fr)
CA (1) CA2027171C (fr)
DE (1) DE69008815T2 (fr)
IL (1) IL95966A0 (fr)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2655364B1 (fr) * 1989-12-01 1992-04-10 Europ Propulsion Procede de fabrication d'une piece en materiau composite, notamment a texture fibres de carbone ou refractaires et matrice carbone ou ceramique.
FR2659949B1 (fr) * 1990-03-26 1992-12-04 Europ Propulsion Procede de conformation d'une texture fibreuse de renfort pour la fabrication d'une piece en materiau composite.
US5374412A (en) * 1992-07-31 1994-12-20 Cvd, Inc. Highly polishable, highly thermally conductive silicon carbide
US5484629A (en) * 1993-05-27 1996-01-16 Eastman Kodak Company Coating apparatus and method
EP0665305A4 (fr) * 1993-08-17 1996-01-10 Aktsionernoe Obschestvo Russko Procede de production de couches de carbure de silicium et produit associe.
US5719062A (en) * 1995-06-06 1998-02-17 Saint Gobain Industrial Ceramics Corporation Process for analyzing analytes using HF-resistant ultrasonic nebulizer components
JPH1179846A (ja) * 1997-09-01 1999-03-23 Tokai Carbon Co Ltd 炭化珪素成形体
US6042758A (en) * 1998-05-05 2000-03-28 Cvd, Inc. Precision replication by chemical vapor deposition
US6228297B1 (en) * 1998-05-05 2001-05-08 Rohm And Haas Company Method for producing free-standing silicon carbide articles
US6231923B1 (en) 1998-08-17 2001-05-15 Tevtech Llc Chemical vapor deposition of near net shape monolithic ceramic parts
US6464912B1 (en) 1999-01-06 2002-10-15 Cvd, Incorporated Method for producing near-net shape free standing articles by chemical vapor deposition
JP2001073139A (ja) * 1999-09-07 2001-03-21 Asahi Glass Co Ltd 炭化ケイ素質成形体の製造方法
US6641767B2 (en) * 2000-03-10 2003-11-04 3M Innovative Properties Company Methods for replication, replicated articles, and replication tools
US6616870B1 (en) * 2000-08-07 2003-09-09 Shipley Company, L.L.C. Method of producing high aspect ratio domes by vapor deposition
US8114505B2 (en) * 2003-12-05 2012-02-14 Morgan Advanced Ceramics, Inc. Free-standing silicon carbide articles formed by chemical vapor deposition and methods for their manufacture
US20050123713A1 (en) * 2003-12-05 2005-06-09 Forrest David T. Articles formed by chemical vapor deposition and methods for their manufacture
US20060057287A1 (en) * 2003-12-08 2006-03-16 Incomplete Trex Enterprises Corp Method of making chemical vapor composites
JP4583104B2 (ja) * 2004-08-10 2010-11-17 原子燃料工業株式会社 メチルトリクロロシランガス発生装置
EP1772901B1 (fr) * 2005-10-07 2012-07-25 Rohm and Haas Electronic Materials, L.L.C. Dispositif support de plaquette semiconductrice et méthode de traitement de semi-conducteurs
JP5065660B2 (ja) * 2005-12-02 2012-11-07 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 半導体処理
JP5554142B2 (ja) * 2010-05-14 2014-07-23 株式会社豊田中央研究所 半導体膜の気相成長方法
US8545103B1 (en) * 2011-04-19 2013-10-01 Us Synthetic Corporation Tilting pad bearing assemblies and apparatuses, and motor assemblies using the same
KR101469713B1 (ko) * 2012-12-06 2014-12-05 연세대학교 산학협력단 경사형 C/SiC 코팅막 형성 방법 및 장치
US10816702B2 (en) 2016-03-18 2020-10-27 Corning Incorporated Reflective optical element with high stiffness substrate

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1109142B (de) * 1958-04-03 1961-06-22 Wacker Chemie Gmbh Verfahren zur Herstellung geformter Koerper
US3905778A (en) * 1973-08-01 1975-09-16 Westinghouse Electric Corp Mirror with optically polished surface
GB1499683A (en) * 1974-06-20 1978-02-01 Westinghouse Electric Corp High power laser mirror
US4426405A (en) * 1981-02-20 1984-01-17 Emerson Electric Co. Method for producing improved silicon carbide resistance elements
US4513030A (en) * 1982-06-18 1985-04-23 The United States Of America As Represented By The United States Department Of Energy Method of producing silicon carbide articles
US4753414A (en) * 1986-04-14 1988-06-28 Balzers Optical Corporation Carbon coatings in replicated optics art
ZW6687A1 (en) * 1986-05-13 1987-12-02 Hoffmann La Roche 1,3-disubstituted imidazolium salts

Also Published As

Publication number Publication date
CA2027171C (fr) 1993-12-21
DE69008815D1 (de) 1994-06-16
DE69008815T2 (de) 1994-08-25
EP0425196B1 (fr) 1994-05-11
CA2027171A1 (fr) 1991-04-24
JPH079063B2 (ja) 1995-02-01
US4997678A (en) 1991-03-05
JPH03153873A (ja) 1991-07-01
EP0425196A1 (fr) 1991-05-02

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