IL31102A - Process of making polymeric relief plate - Google Patents

Process of making polymeric relief plate

Info

Publication number
IL31102A
IL31102A IL31102A IL3110268A IL31102A IL 31102 A IL31102 A IL 31102A IL 31102 A IL31102 A IL 31102A IL 3110268 A IL3110268 A IL 3110268A IL 31102 A IL31102 A IL 31102A
Authority
IL
Israel
Prior art keywords
relief plate
making polymeric
polymeric relief
making
plate
Prior art date
Application number
IL31102A
Other languages
English (en)
Other versions
IL31102A0 (en
Original Assignee
Fmc Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fmc Corp filed Critical Fmc Corp
Publication of IL31102A0 publication Critical patent/IL31102A0/xx
Publication of IL31102A publication Critical patent/IL31102A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
IL31102A 1967-12-18 1968-11-19 Process of making polymeric relief plate IL31102A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US69116467A 1967-12-18 1967-12-18

Publications (2)

Publication Number Publication Date
IL31102A0 IL31102A0 (en) 1969-01-29
IL31102A true IL31102A (en) 1972-05-30

Family

ID=24775414

Family Applications (1)

Application Number Title Priority Date Filing Date
IL31102A IL31102A (en) 1967-12-18 1968-11-19 Process of making polymeric relief plate

Country Status (9)

Country Link
AT (1) AT294136B (xx)
BE (1) BE725171A (xx)
CH (1) CH500514A (xx)
DE (1) DE1815457A1 (xx)
ES (1) ES361574A1 (xx)
FR (1) FR1599162A (xx)
GB (1) GB1217756A (xx)
IL (1) IL31102A (xx)
NL (1) NL6818139A (xx)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1488709A (en) * 1973-10-10 1977-10-12 Hercules Inc Photo-oxidizable compositions and elements
CA1079387A (en) * 1977-04-18 1980-06-10 Norris E. Cott Test station apparatus
US4568734A (en) * 1983-02-15 1986-02-04 Eastman Kodak Company Electron-beam and X-ray sensitive polymers and resists
DE102004004865B4 (de) 2004-01-30 2008-01-10 Qimonda Ag Antireflexschicht, die mit einem Photoresist beschichtet ist, enthaltend Polymere auf der Basis von Zimtsäure für die 157 nm Photolithographie

Also Published As

Publication number Publication date
DE1815457A1 (de) 1969-07-24
GB1217756A (en) 1970-12-31
BE725171A (xx) 1969-05-16
CH500514A (de) 1970-12-15
AT294136B (de) 1971-11-10
ES361574A1 (es) 1970-11-01
NL6818139A (xx) 1969-06-20
FR1599162A (xx) 1970-07-15
IL31102A0 (en) 1969-01-29

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