CH500514A - Verfahren zur Herstellung von Reliefdruckplatten - Google Patents
Verfahren zur Herstellung von ReliefdruckplattenInfo
- Publication number
- CH500514A CH500514A CH1863568A CH1863568A CH500514A CH 500514 A CH500514 A CH 500514A CH 1863568 A CH1863568 A CH 1863568A CH 1863568 A CH1863568 A CH 1863568A CH 500514 A CH500514 A CH 500514A
- Authority
- CH
- Switzerland
- Prior art keywords
- production
- printing plates
- relief printing
- relief
- plates
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US69116467A | 1967-12-18 | 1967-12-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
CH500514A true CH500514A (de) | 1970-12-15 |
Family
ID=24775414
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH1863568A CH500514A (de) | 1967-12-18 | 1968-12-13 | Verfahren zur Herstellung von Reliefdruckplatten |
Country Status (9)
Country | Link |
---|---|
AT (1) | AT294136B (xx) |
BE (1) | BE725171A (xx) |
CH (1) | CH500514A (xx) |
DE (1) | DE1815457A1 (xx) |
ES (1) | ES361574A1 (xx) |
FR (1) | FR1599162A (xx) |
GB (1) | GB1217756A (xx) |
IL (1) | IL31102A (xx) |
NL (1) | NL6818139A (xx) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004004865B4 (de) * | 2004-01-30 | 2008-01-10 | Qimonda Ag | Antireflexschicht, die mit einem Photoresist beschichtet ist, enthaltend Polymere auf der Basis von Zimtsäure für die 157 nm Photolithographie |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1488709A (en) * | 1973-10-10 | 1977-10-12 | Hercules Inc | Photo-oxidizable compositions and elements |
CA1079387A (en) * | 1977-04-18 | 1980-06-10 | Norris E. Cott | Test station apparatus |
US4568734A (en) * | 1983-02-15 | 1986-02-04 | Eastman Kodak Company | Electron-beam and X-ray sensitive polymers and resists |
-
1968
- 1968-11-19 IL IL31102A patent/IL31102A/xx unknown
- 1968-11-19 GB GB54742/68A patent/GB1217756A/en not_active Expired
- 1968-12-05 FR FR1599162D patent/FR1599162A/fr not_active Expired
- 1968-12-09 BE BE725171D patent/BE725171A/xx unknown
- 1968-12-13 CH CH1863568A patent/CH500514A/de not_active IP Right Cessation
- 1968-12-16 AT AT1221168A patent/AT294136B/de not_active IP Right Cessation
- 1968-12-17 NL NL6818139A patent/NL6818139A/xx unknown
- 1968-12-18 ES ES361574A patent/ES361574A1/es not_active Expired
- 1968-12-18 DE DE19681815457 patent/DE1815457A1/de active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004004865B4 (de) * | 2004-01-30 | 2008-01-10 | Qimonda Ag | Antireflexschicht, die mit einem Photoresist beschichtet ist, enthaltend Polymere auf der Basis von Zimtsäure für die 157 nm Photolithographie |
US7405028B2 (en) | 2004-01-30 | 2008-07-29 | Infineon Technologies, Ag | Polymers based on cinnamic acid as a bottom antireflective coating for 157 NM photolithography |
Also Published As
Publication number | Publication date |
---|---|
DE1815457A1 (de) | 1969-07-24 |
GB1217756A (en) | 1970-12-31 |
IL31102A (en) | 1972-05-30 |
BE725171A (xx) | 1969-05-16 |
AT294136B (de) | 1971-11-10 |
ES361574A1 (es) | 1970-11-01 |
NL6818139A (xx) | 1969-06-20 |
FR1599162A (xx) | 1970-07-15 |
IL31102A0 (en) | 1969-01-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased |