CH500514A - Verfahren zur Herstellung von Reliefdruckplatten - Google Patents

Verfahren zur Herstellung von Reliefdruckplatten

Info

Publication number
CH500514A
CH500514A CH1863568A CH1863568A CH500514A CH 500514 A CH500514 A CH 500514A CH 1863568 A CH1863568 A CH 1863568A CH 1863568 A CH1863568 A CH 1863568A CH 500514 A CH500514 A CH 500514A
Authority
CH
Switzerland
Prior art keywords
production
printing plates
relief printing
relief
plates
Prior art date
Application number
CH1863568A
Other languages
English (en)
Inventor
Soth Burnett Leo
Original Assignee
Fmc Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fmc Corp filed Critical Fmc Corp
Publication of CH500514A publication Critical patent/CH500514A/de

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
CH1863568A 1967-12-18 1968-12-13 Verfahren zur Herstellung von Reliefdruckplatten CH500514A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US69116467A 1967-12-18 1967-12-18

Publications (1)

Publication Number Publication Date
CH500514A true CH500514A (de) 1970-12-15

Family

ID=24775414

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1863568A CH500514A (de) 1967-12-18 1968-12-13 Verfahren zur Herstellung von Reliefdruckplatten

Country Status (9)

Country Link
AT (1) AT294136B (de)
BE (1) BE725171A (de)
CH (1) CH500514A (de)
DE (1) DE1815457A1 (de)
ES (1) ES361574A1 (de)
FR (1) FR1599162A (de)
GB (1) GB1217756A (de)
IL (1) IL31102A (de)
NL (1) NL6818139A (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004004865B4 (de) * 2004-01-30 2008-01-10 Qimonda Ag Antireflexschicht, die mit einem Photoresist beschichtet ist, enthaltend Polymere auf der Basis von Zimtsäure für die 157 nm Photolithographie

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1488709A (en) * 1973-10-10 1977-10-12 Hercules Inc Photo-oxidizable compositions and elements
CA1079387A (en) * 1977-04-18 1980-06-10 Norris E. Cott Test station apparatus
US4568734A (en) * 1983-02-15 1986-02-04 Eastman Kodak Company Electron-beam and X-ray sensitive polymers and resists

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004004865B4 (de) * 2004-01-30 2008-01-10 Qimonda Ag Antireflexschicht, die mit einem Photoresist beschichtet ist, enthaltend Polymere auf der Basis von Zimtsäure für die 157 nm Photolithographie
US7405028B2 (en) 2004-01-30 2008-07-29 Infineon Technologies, Ag Polymers based on cinnamic acid as a bottom antireflective coating for 157 NM photolithography

Also Published As

Publication number Publication date
ES361574A1 (es) 1970-11-01
DE1815457A1 (de) 1969-07-24
AT294136B (de) 1971-11-10
BE725171A (de) 1969-05-16
NL6818139A (de) 1969-06-20
IL31102A0 (en) 1969-01-29
GB1217756A (en) 1970-12-31
IL31102A (en) 1972-05-30
FR1599162A (de) 1970-07-15

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Legal Events

Date Code Title Description
PL Patent ceased