AT294136B - Verfahren zur Herstellung einer Reliefdruckplatte - Google Patents
Verfahren zur Herstellung einer ReliefdruckplatteInfo
- Publication number
- AT294136B AT294136B AT1221168A AT1221168A AT294136B AT 294136 B AT294136 B AT 294136B AT 1221168 A AT1221168 A AT 1221168A AT 1221168 A AT1221168 A AT 1221168A AT 294136 B AT294136 B AT 294136B
- Authority
- AT
- Austria
- Prior art keywords
- production
- printing plate
- relief printing
- relief
- plate
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US69116467A | 1967-12-18 | 1967-12-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AT294136B true AT294136B (de) | 1971-11-10 |
Family
ID=24775414
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT1221168A AT294136B (de) | 1967-12-18 | 1968-12-16 | Verfahren zur Herstellung einer Reliefdruckplatte |
Country Status (9)
| Country | Link |
|---|---|
| AT (1) | AT294136B (xx) |
| BE (1) | BE725171A (xx) |
| CH (1) | CH500514A (xx) |
| DE (1) | DE1815457A1 (xx) |
| ES (1) | ES361574A1 (xx) |
| FR (1) | FR1599162A (xx) |
| GB (1) | GB1217756A (xx) |
| IL (1) | IL31102A (xx) |
| NL (1) | NL6818139A (xx) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1488709A (en) * | 1973-10-10 | 1977-10-12 | Hercules Inc | Photo-oxidizable compositions and elements |
| CA1079387A (en) * | 1977-04-18 | 1980-06-10 | Norris E. Cott | Test station apparatus |
| US4568734A (en) * | 1983-02-15 | 1986-02-04 | Eastman Kodak Company | Electron-beam and X-ray sensitive polymers and resists |
| DE102004004865B4 (de) | 2004-01-30 | 2008-01-10 | Qimonda Ag | Antireflexschicht, die mit einem Photoresist beschichtet ist, enthaltend Polymere auf der Basis von Zimtsäure für die 157 nm Photolithographie |
-
1968
- 1968-11-19 IL IL31102A patent/IL31102A/xx unknown
- 1968-11-19 GB GB54742/68A patent/GB1217756A/en not_active Expired
- 1968-12-05 FR FR1599162D patent/FR1599162A/fr not_active Expired
- 1968-12-09 BE BE725171D patent/BE725171A/xx unknown
- 1968-12-13 CH CH1863568A patent/CH500514A/de not_active IP Right Cessation
- 1968-12-16 AT AT1221168A patent/AT294136B/de not_active IP Right Cessation
- 1968-12-17 NL NL6818139A patent/NL6818139A/xx unknown
- 1968-12-18 ES ES361574A patent/ES361574A1/es not_active Expired
- 1968-12-18 DE DE19681815457 patent/DE1815457A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE1815457A1 (de) | 1969-07-24 |
| GB1217756A (en) | 1970-12-31 |
| IL31102A (en) | 1972-05-30 |
| BE725171A (xx) | 1969-05-16 |
| CH500514A (de) | 1970-12-15 |
| ES361574A1 (es) | 1970-11-01 |
| NL6818139A (xx) | 1969-06-20 |
| FR1599162A (xx) | 1970-07-15 |
| IL31102A0 (en) | 1969-01-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ELJ | Ceased due to non-payment of the annual fee |