IL273145A - Metrology in lithographic processes - Google Patents
Metrology in lithographic processesInfo
- Publication number
- IL273145A IL273145A IL273145A IL27314520A IL273145A IL 273145 A IL273145 A IL 273145A IL 273145 A IL273145 A IL 273145A IL 27314520 A IL27314520 A IL 27314520A IL 273145 A IL273145 A IL 273145A
- Authority
- IL
- Israel
- Prior art keywords
- metrology
- lithographic processes
- lithographic
- processes
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N21/4788—Diffraction
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP17190401 | 2017-09-11 | ||
EP17193415.1A EP3462239A1 (en) | 2017-09-27 | 2017-09-27 | Metrology in lithographic processes |
PCT/EP2018/071069 WO2019048145A1 (en) | 2017-09-11 | 2018-08-02 | Metrology in lithographic processes |
Publications (3)
Publication Number | Publication Date |
---|---|
IL273145A true IL273145A (en) | 2020-04-30 |
IL273145B1 IL273145B1 (en) | 2023-11-01 |
IL273145B2 IL273145B2 (en) | 2024-03-01 |
Family
ID=63165342
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL273145A IL273145B2 (en) | 2017-09-11 | 2018-08-02 | Metrology in lithographic processes |
Country Status (7)
Country | Link |
---|---|
US (1) | US10656533B2 (en) |
JP (1) | JP6979529B2 (en) |
KR (1) | KR102390687B1 (en) |
CN (1) | CN111095112B (en) |
IL (1) | IL273145B2 (en) |
TW (1) | TWI703409B (en) |
WO (1) | WO2019048145A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3770682A1 (en) | 2019-07-25 | 2021-01-27 | ASML Netherlands B.V. | Method and system for determining information about a target structure |
CN115777084A (en) * | 2020-07-09 | 2023-03-10 | Asml荷兰有限公司 | Metrology method, apparatus and computer program |
JP2022085481A (en) * | 2020-11-27 | 2022-06-08 | 東京エレクトロン株式会社 | Inspection equipment, change kit, and replacement method of change kitt |
Family Cites Families (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5523193A (en) | 1988-05-31 | 1996-06-04 | Texas Instruments Incorporated | Method and apparatus for patterning and imaging member |
US5296891A (en) | 1990-05-02 | 1994-03-22 | Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. | Illumination device |
US5229872A (en) | 1992-01-21 | 1993-07-20 | Hughes Aircraft Company | Exposure device including an electrically aligned electronic mask for micropatterning |
WO1999049504A1 (en) | 1998-03-26 | 1999-09-30 | Nikon Corporation | Projection exposure method and system |
JP3977324B2 (en) | 2002-11-12 | 2007-09-19 | エーエスエムエル ネザーランズ ビー.ブイ. | Lithographic apparatus |
US7791727B2 (en) | 2004-08-16 | 2010-09-07 | Asml Netherlands B.V. | Method and apparatus for angular-resolved spectroscopic lithography characterization |
US7391513B2 (en) * | 2006-03-29 | 2008-06-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method using overlay measurement quality indication |
US7791724B2 (en) | 2006-06-13 | 2010-09-07 | Asml Netherlands B.V. | Characterization of transmission losses in an optical system |
US7701577B2 (en) | 2007-02-21 | 2010-04-20 | Asml Netherlands B.V. | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
SG152187A1 (en) | 2007-10-25 | 2009-05-29 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
NL1036123A1 (en) | 2007-11-13 | 2009-05-14 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. |
NL1036245A1 (en) | 2007-12-17 | 2009-06-18 | Asml Netherlands Bv | Diffraction based overlay metrology tool and method or diffraction based overlay metrology. |
NL1036597A1 (en) | 2008-02-29 | 2009-09-01 | Asml Netherlands Bv | Metrology method and apparatus, lithographic apparatus, and device manufacturing method. |
NL1036684A1 (en) | 2008-03-20 | 2009-09-22 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. |
NL1036685A1 (en) | 2008-03-24 | 2009-09-25 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. |
NL1036734A1 (en) | 2008-04-09 | 2009-10-12 | Asml Netherlands Bv | A method of assessing a model, an inspection apparatus and a lithographic apparatus. |
NL1036857A1 (en) | 2008-04-21 | 2009-10-22 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. |
CN102067040B (en) | 2008-06-26 | 2013-05-08 | Asml荷兰有限公司 | Overlay measurement apparatus, lithographic apparatus, and device manufacturing method using such overlay measurement apparatus |
US8891061B2 (en) | 2008-10-06 | 2014-11-18 | Asml Netherlands B.V. | Lithographic focus and dose measurement using a 2-D target |
KR101429629B1 (en) | 2009-07-31 | 2014-08-12 | 에이에스엠엘 네델란즈 비.브이. | Metrology method and apparatus, lithographic system, and lithographic processing cell |
JP2013502592A (en) | 2009-08-24 | 2013-01-24 | エーエスエムエル ネザーランズ ビー.ブイ. | Metrology method and apparatus, lithographic apparatus, lithography processing cell, and substrate comprising metrology target |
NL2006229A (en) | 2010-03-18 | 2011-09-20 | Asml Netherlands Bv | Inspection method and apparatus, and associated computer readable product. |
NL2007176A (en) | 2010-08-18 | 2012-02-21 | Asml Netherlands Bv | Substrate for use in metrology, metrology method and device manufacturing method. |
JP5661194B2 (en) | 2010-11-12 | 2015-01-28 | エーエスエムエル ネザーランズ ビー.ブイ. | Metrology method and apparatus, lithography system and device manufacturing method |
NL2009004A (en) | 2011-07-20 | 2013-01-22 | Asml Netherlands Bv | Inspection method and apparatus, and lithographic apparatus. |
NL2010717A (en) | 2012-05-21 | 2013-11-25 | Asml Netherlands Bv | Determining a structural parameter and correcting an asymmetry property. |
CN104471484B (en) * | 2012-07-05 | 2018-02-06 | Asml荷兰有限公司 | Measurement for photolithography |
US9329033B2 (en) * | 2012-09-05 | 2016-05-03 | Kla-Tencor Corporation | Method for estimating and correcting misregistration target inaccuracy |
NL2013210A (en) * | 2013-08-07 | 2015-02-10 | Asml Netherlands Bv | Metrology method and apparatus, lithographic system and device manufacturing method. |
WO2016078862A1 (en) * | 2014-11-21 | 2016-05-26 | Asml Netherlands B.V. | Metrology method and apparatus |
SG11201703585RA (en) * | 2014-11-25 | 2017-06-29 | Kla Tencor Corp | Analyzing and utilizing landscapes |
EP3224676A1 (en) | 2014-11-26 | 2017-10-04 | ASML Netherlands B.V. | Metrology method, computer product and system |
WO2016202695A1 (en) | 2015-06-17 | 2016-12-22 | Asml Netherlands B.V. | Recipe selection based on inter-recipe consistency |
-
2018
- 2018-08-02 IL IL273145A patent/IL273145B2/en unknown
- 2018-08-02 CN CN201880058496.4A patent/CN111095112B/en active Active
- 2018-08-02 JP JP2020535293A patent/JP6979529B2/en active Active
- 2018-08-02 WO PCT/EP2018/071069 patent/WO2019048145A1/en active Application Filing
- 2018-08-02 KR KR1020207007005A patent/KR102390687B1/en active IP Right Grant
- 2018-08-21 US US16/106,322 patent/US10656533B2/en active Active
- 2018-09-07 TW TW107131489A patent/TWI703409B/en active
Also Published As
Publication number | Publication date |
---|---|
KR20200035307A (en) | 2020-04-02 |
KR102390687B1 (en) | 2022-04-26 |
CN111095112B (en) | 2022-05-13 |
JP2020533609A (en) | 2020-11-19 |
TW201921152A (en) | 2019-06-01 |
IL273145B2 (en) | 2024-03-01 |
US10656533B2 (en) | 2020-05-19 |
JP6979529B2 (en) | 2021-12-15 |
CN111095112A (en) | 2020-05-01 |
TWI703409B (en) | 2020-09-01 |
IL273145B1 (en) | 2023-11-01 |
US20190079413A1 (en) | 2019-03-14 |
WO2019048145A1 (en) | 2019-03-14 |
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