IL24471A - A multilayer thin-film coated substrate - Google Patents
A multilayer thin-film coated substrateInfo
- Publication number
- IL24471A IL24471A IL24471A IL2447165A IL24471A IL 24471 A IL24471 A IL 24471A IL 24471 A IL24471 A IL 24471A IL 2447165 A IL2447165 A IL 2447165A IL 24471 A IL24471 A IL 24471A
- Authority
- IL
- Israel
- Prior art keywords
- layer
- capacitor
- coated substrate
- electrode
- tantalum
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims description 65
- 239000010409 thin film Substances 0.000 title claims 9
- 239000010410 layer Substances 0.000 claims description 109
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 37
- 229910052715 tantalum Inorganic materials 0.000 claims description 35
- 239000011241 protective layer Substances 0.000 claims description 25
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 15
- 239000003990 capacitor Substances 0.000 claims description 14
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 14
- 238000005530 etching Methods 0.000 claims description 12
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 11
- 238000000576 coating method Methods 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 8
- 229910044991 metal oxide Inorganic materials 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- 239000004020 conductor Substances 0.000 claims description 3
- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 3
- 238000007743 anodising Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 5
- 230000000873 masking effect Effects 0.000 claims 3
- 241000282887 Suidae Species 0.000 claims 1
- 238000000151 deposition Methods 0.000 description 11
- 230000008021 deposition Effects 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000011109 contamination Methods 0.000 description 5
- 150000004706 metal oxides Chemical class 0.000 description 5
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- FGHSTPNOXKDLKU-UHFFFAOYSA-N nitric acid;hydrate Chemical compound O.O[N+]([O-])=O FGHSTPNOXKDLKU-UHFFFAOYSA-N 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C13/00—Resistors not provided for elsewhere
- H01C13/02—Structural combinations of resistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/40—Structural combinations of fixed capacitors with other electric elements, the structure mainly consisting of a capacitor, e.g. RC combinations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/901—Printed circuit
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49126—Assembling bases
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
- Y10T428/24975—No layer or component greater than 5 mils thick
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Semiconductor Integrated Circuits (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US409656A US3406043A (en) | 1964-11-09 | 1964-11-09 | Integrated circuit containing multilayer tantalum compounds |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IL24471A true IL24471A (en) | 1969-03-27 |
Family
ID=23621435
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL24471A IL24471A (en) | 1964-11-09 | 1965-10-15 | A multilayer thin-film coated substrate |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US3406043A (es) |
| BE (1) | BE671926A (es) |
| CH (1) | CH453505A (es) |
| DE (1) | DE1615010B1 (es) |
| ES (1) | ES318876A1 (es) |
| FR (1) | FR1462496A (es) |
| GB (1) | GB1125394A (es) |
| IL (1) | IL24471A (es) |
| NL (1) | NL141750B (es) |
| SE (1) | SE326746B (es) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3489656A (en) * | 1964-11-09 | 1970-01-13 | Western Electric Co | Method of producing an integrated circuit containing multilayer tantalum compounds |
| US3487522A (en) * | 1966-02-01 | 1970-01-06 | Western Electric Co | Multilayered thin-film intermediates employing parting layers to permit selective,sequential etching |
| US3479237A (en) * | 1966-04-08 | 1969-11-18 | Bell Telephone Labor Inc | Etch masks on semiconductor surfaces |
| US3491433A (en) * | 1966-06-08 | 1970-01-27 | Nippon Electric Co | Method of making an insulated gate semiconductor device |
| US3544287A (en) * | 1967-04-13 | 1970-12-01 | Western Electric Co | Heat treatment of multilayered thin film structures employing oxide parting layers |
| US3617373A (en) * | 1968-05-24 | 1971-11-02 | Western Electric Co | Methods of making thin film patterns |
| DE1790013B1 (de) * | 1968-08-27 | 1971-11-25 | Siemens Ag | Elektrische duennschichtschaltung |
| US3772102A (en) * | 1969-10-27 | 1973-11-13 | Gen Electric | Method of transferring a desired pattern in silicon to a substrate layer |
| US3844831A (en) * | 1972-10-27 | 1974-10-29 | Ibm | Forming a compact multilevel interconnection metallurgy system for semi-conductor devices |
| GB1424980A (en) * | 1973-06-20 | 1976-02-11 | Siemens Ag | Thin-film electrical circuits |
| US3907620A (en) * | 1973-06-27 | 1975-09-23 | Hewlett Packard Co | A process of forming metallization structures on semiconductor devices |
| US3874922A (en) * | 1973-08-16 | 1975-04-01 | Boeing Co | Tantalum thin film resistors by reactive evaporation |
| US3916071A (en) * | 1973-11-05 | 1975-10-28 | Texas Instruments Inc | Ceramic substrate for receiving resistive film and method of forming chromium/chromium oxide ceramic substrate |
| US4098917A (en) * | 1976-09-08 | 1978-07-04 | Texas Instruments Incorporated | Method of providing a patterned metal layer on a substrate employing metal mask and ion milling |
| US4189516A (en) * | 1978-07-17 | 1980-02-19 | National Research Development Corporation | Epitaxial crystalline aluminium nitride |
| DE2851584B2 (de) * | 1978-11-29 | 1980-09-04 | Fried. Krupp Gmbh, 4300 Essen | Verbundkörper |
| US4226932A (en) * | 1979-07-05 | 1980-10-07 | Gte Automatic Electric Laboratories Incorporated | Titanium nitride as one layer of a multi-layered coating intended to be etched |
| JPS5831336A (ja) * | 1981-08-19 | 1983-02-24 | Konishiroku Photo Ind Co Ltd | ホトマスク素材 |
| JP2619838B2 (ja) * | 1989-09-08 | 1997-06-11 | 新日本製鐵株式会社 | セラミックスコーティング金属板 |
| WO1992007968A1 (en) * | 1990-10-26 | 1992-05-14 | International Business Machines Corporation | STRUCTURE AND METHOD OF MAKING ALPHA-Ta IN THIN FILMS |
| US5221449A (en) * | 1990-10-26 | 1993-06-22 | International Business Machines Corporation | Method of making Alpha-Ta thin films |
| US7676905B2 (en) * | 2005-08-15 | 2010-03-16 | Hitachi Global Storage Technologies Netherlands B.V. | Method of manufacturing a self aligned magnetoresistive sensor |
| TW201134337A (en) * | 2010-03-25 | 2011-10-01 | Kinik Co | Method for manufacturing substrate and the structure thereof |
| JP6092674B2 (ja) | 2013-03-22 | 2017-03-08 | シャープ株式会社 | 構造体、無線通信装置および構造体の製造方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL251302A (es) * | 1959-05-06 | |||
| FR1300771A (fr) * | 1961-05-09 | 1962-08-10 | Haloid Xerox | Panneau de circuit imprimé à deux dimensions |
| US3256588A (en) * | 1962-10-23 | 1966-06-21 | Philco Corp | Method of fabricating thin film r-c circuits on single substrate |
-
1964
- 1964-11-09 US US409656A patent/US3406043A/en not_active Expired - Lifetime
-
1965
- 1965-10-15 IL IL24471A patent/IL24471A/en unknown
- 1965-10-19 GB GB44155/65A patent/GB1125394A/en not_active Expired
- 1965-10-25 ES ES0318876A patent/ES318876A1/es not_active Expired
- 1965-11-03 NL NL656514243A patent/NL141750B/xx unknown
- 1965-11-03 DE DE1965W0040226 patent/DE1615010B1/de active Pending
- 1965-11-05 BE BE671926D patent/BE671926A/xx unknown
- 1965-11-08 FR FR37717A patent/FR1462496A/fr not_active Expired
- 1965-11-08 SE SE14397/65A patent/SE326746B/xx unknown
- 1965-11-09 CH CH1541965A patent/CH453505A/de unknown
Also Published As
| Publication number | Publication date |
|---|---|
| ES318876A1 (es) | 1966-05-01 |
| SE326746B (es) | 1970-08-03 |
| DE1615010B1 (de) | 1971-02-11 |
| NL141750B (nl) | 1974-03-15 |
| US3406043A (en) | 1968-10-15 |
| FR1462496A (fr) | 1966-04-15 |
| NL6514243A (es) | 1966-05-10 |
| CH453505A (de) | 1968-06-14 |
| BE671926A (es) | 1966-03-01 |
| GB1125394A (en) | 1968-08-28 |
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