IL244155B - An end–hall ion source with enhanced radiation cooling - Google Patents

An end–hall ion source with enhanced radiation cooling

Info

Publication number
IL244155B
IL244155B IL24415516A IL24415516A IL244155B IL 244155 B IL244155 B IL 244155B IL 24415516 A IL24415516 A IL 24415516A IL 24415516 A IL24415516 A IL 24415516A IL 244155 B IL244155 B IL 244155B
Authority
IL
Israel
Prior art keywords
ion source
radiation cooling
hall ion
enhanced radiation
enhanced
Prior art date
Application number
IL24415516A
Other languages
English (en)
Hebrew (he)
Other versions
IL244155A0 (en
Original Assignee
Kaufman And Robinson Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kaufman And Robinson Inc filed Critical Kaufman And Robinson Inc
Publication of IL244155A0 publication Critical patent/IL244155A0/en
Publication of IL244155B publication Critical patent/IL244155B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field
    • H01J27/146—End-Hall type ion sources, wherein the magnetic field confines the electrons in a central cylinder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002—Cooling arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Manufacturing & Machinery (AREA)
  • Plasma Technology (AREA)
IL24415516A 2013-09-25 2016-02-16 An end–hall ion source with enhanced radiation cooling IL244155B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/998,044 US8994258B1 (en) 2013-09-25 2013-09-25 End-hall ion source with enhanced radiation cooling
PCT/US2014/000171 WO2015047446A1 (en) 2013-09-25 2014-07-29 End-hall ion source with enhanced radiation cooling

Publications (2)

Publication Number Publication Date
IL244155A0 IL244155A0 (en) 2016-04-21
IL244155B true IL244155B (en) 2019-10-31

Family

ID=52690357

Family Applications (1)

Application Number Title Priority Date Filing Date
IL24415516A IL244155B (en) 2013-09-25 2016-02-16 An end–hall ion source with enhanced radiation cooling

Country Status (8)

Country Link
US (2) US8994258B1 (OSRAM)
EP (1) EP3050071B1 (OSRAM)
JP (1) JP6655007B2 (OSRAM)
AU (1) AU2014328759B9 (OSRAM)
CA (1) CA2920813C (OSRAM)
IL (1) IL244155B (OSRAM)
SG (1) SG11201602162VA (OSRAM)
WO (1) WO2015047446A1 (OSRAM)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2969372B1 (fr) * 2010-12-21 2015-04-17 Commissariat Energie Atomique Dispositif d’ionisation a la resonance cyclotron electronique
US8994258B1 (en) * 2013-09-25 2015-03-31 Kaufman & Robinson, Inc. End-hall ion source with enhanced radiation cooling
US9859098B2 (en) * 2015-12-22 2018-01-02 Varian Semiconductor Equipment Associates, Inc. Temperature controlled ion source
US10347457B1 (en) * 2017-12-19 2019-07-09 Varian Semiconductor Equipment Associates, Inc. Dynamic temperature control of an ion source
CA3103016C (en) 2018-06-20 2024-01-16 Board Of Trustees Of Michigan State University Single beam plasma source
CN109087840B (zh) * 2018-09-27 2023-11-07 中山市博顿光电科技有限公司 一种水冷式射频中和器
US11393652B2 (en) 2019-01-25 2022-07-19 Muons, Inc. Bi-metallic anode for amplitude modulated magnetron
WO2020198012A1 (en) 2019-03-26 2020-10-01 Board Of Trustees Of Michigan State University Single beam plasma source
CN111081510A (zh) * 2020-03-02 2020-04-28 成都国泰真空设备有限公司 一种霍尔离子源装置
CN111710580B (zh) * 2020-07-16 2025-03-04 中山市博顿光电科技有限公司 离子源电场结构及离子源装置
US11823867B2 (en) * 2021-05-20 2023-11-21 Kaufman & Robinson, Inc. Load current derived switch timing of switching resonant topology
US12413148B2 (en) * 2021-05-20 2025-09-09 Kaufman & Robinson, Inc. Power efficient load current derived switch timing of switching resonant topology
JP7695555B2 (ja) * 2021-12-24 2025-06-19 日本製鉄株式会社 接触熱コンダクタンス推定方法及び接触電気抵抗推定方法
JP7688272B2 (ja) * 2021-12-24 2025-06-04 日本製鉄株式会社 接触熱コンダクタンス推定方法及び接触電気抵抗推定方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3275829A (en) * 1960-08-15 1966-09-27 Special Devices Inc Cavity radiator with a pyrotechnic charge that remains intact during and after combustion
US4126489A (en) * 1973-07-17 1978-11-21 Varian Associates, Inc. Method of making cathode heaters
US4862032A (en) 1986-10-20 1989-08-29 Kaufman Harold R End-Hall ion source
JP2628533B2 (ja) * 1988-10-25 1997-07-09 文夫 渡辺 質量分析型残留ガス分析計
JPH03266336A (ja) * 1990-03-15 1991-11-27 Fujitsu Ltd ガスイオン源装置
US5402032A (en) * 1992-10-29 1995-03-28 Litton Systems, Inc. Traveling wave tube with plate for bonding thermally-mismatched elements
JP3609407B2 (ja) * 1993-06-21 2005-01-12 ソシエテ・ナシオナル・デテユード・エ・ドウ・コンストリユクシオン・ドウ・モトール・ダヴイアシオン、“エス．エヌ．ウ．セ．エム．アー．” 閉鎖電子ドリフトを持つ長さの短いプラズマ加速器
US6750600B2 (en) * 2001-05-03 2004-06-15 Kaufman & Robinson, Inc. Hall-current ion source
US6454910B1 (en) 2001-09-21 2002-09-24 Kaufman & Robinson, Inc. Ion-assisted magnetron deposition
US6608431B1 (en) * 2002-05-24 2003-08-19 Kaufman & Robinson, Inc. Modular gridless ion source
US7667379B2 (en) 2002-06-27 2010-02-23 Kaufman & Robinson, Inc. Industrial hollow cathode with radiation shield structure
US7342236B2 (en) * 2004-02-23 2008-03-11 Veeco Instruments, Inc. Fluid-cooled ion source
US7116054B2 (en) * 2004-04-23 2006-10-03 Viacheslav V. Zhurin High-efficient ion source with improved magnetic field
US7476869B2 (en) * 2005-02-18 2009-01-13 Veeco Instruments, Inc. Gas distributor for ion source
US7566883B2 (en) 2005-02-18 2009-07-28 Veeco Instruments, Inc. Thermal transfer sheet for ion source
US7312579B2 (en) * 2006-04-18 2007-12-25 Colorado Advanced Technology Llc Hall-current ion source for ion beams of low and high energy for technological applications
EP2276054A1 (en) * 2009-07-13 2011-01-19 Applied Materials, Inc. Sputtering system, rotatable cylindrical target assembly, backing tube, target element and cooling shield
US9624570B2 (en) * 2012-02-09 2017-04-18 Fluxion Inc. Compact, filtered ion source
US8994258B1 (en) 2013-09-25 2015-03-31 Kaufman & Robinson, Inc. End-hall ion source with enhanced radiation cooling

Also Published As

Publication number Publication date
US20180012722A1 (en) 2018-01-11
EP3050071A4 (en) 2017-05-03
AU2014328759B2 (en) 2018-12-20
US10068739B2 (en) 2018-09-04
IL244155A0 (en) 2016-04-21
JP2016536740A (ja) 2016-11-24
CA2920813A1 (en) 2015-04-02
AU2014328759B9 (en) 2019-02-14
JP6655007B2 (ja) 2020-02-26
AU2014328759A1 (en) 2016-03-03
EP3050071A1 (en) 2016-08-03
CA2920813C (en) 2020-02-18
EP3050071B1 (en) 2018-06-13
US8994258B1 (en) 2015-03-31
SG11201602162VA (en) 2016-04-28
WO2015047446A1 (en) 2015-04-02
US20150084496A1 (en) 2015-03-26

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