IL157040A0 - Polycyclic fluorine-containing polymers and photoresists for microlithography - Google Patents
Polycyclic fluorine-containing polymers and photoresists for microlithographyInfo
- Publication number
- IL157040A0 IL157040A0 IL15704002A IL15704002A IL157040A0 IL 157040 A0 IL157040 A0 IL 157040A0 IL 15704002 A IL15704002 A IL 15704002A IL 15704002 A IL15704002 A IL 15704002A IL 157040 A0 IL157040 A0 IL 157040A0
- Authority
- IL
- Israel
- Prior art keywords
- microlithography
- photoresists
- containing polymers
- polycyclic
- fluorine
- Prior art date
Links
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title 1
- 229910052731 fluorine Inorganic materials 0.000 title 1
- 239000011737 fluorine Substances 0.000 title 1
- 238000001393 microlithography Methods 0.000 title 1
- 229920002120 photoresistant polymer Polymers 0.000 title 1
- 125000003367 polycyclic group Chemical group 0.000 title 1
- 229920000642 polymer Polymers 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
- C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US28026901P | 2001-03-30 | 2001-03-30 | |
| PCT/US2002/009799 WO2002079287A1 (en) | 2001-03-30 | 2002-03-27 | Polycyclic fluorine-containing polymers and photoresists for microlithography |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IL157040A0 true IL157040A0 (en) | 2004-02-08 |
Family
ID=23072365
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL15704002A IL157040A0 (en) | 2001-03-30 | 2002-03-27 | Polycyclic fluorine-containing polymers and photoresists for microlithography |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP1383812B1 (enExample) |
| JP (1) | JP2004526844A (enExample) |
| KR (1) | KR20040018342A (enExample) |
| CN (1) | CN1215099C (enExample) |
| DE (1) | DE60211883T2 (enExample) |
| IL (1) | IL157040A0 (enExample) |
| WO (1) | WO2002079287A1 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1675264A (zh) * | 2002-08-09 | 2005-09-28 | E.I.内穆尔杜邦公司 | 用作光致抗蚀剂的具有带稠合4－元碳环的多环基团的氟化聚合物和用于微石印术的方法 |
| JP2005535780A (ja) * | 2002-08-09 | 2005-11-24 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | フォトレジスト、フルオロポリマーおよび１５７ｎｍ微細平版印刷のための方法 |
| JP4386197B2 (ja) | 2003-03-06 | 2009-12-16 | 日本電気株式会社 | 脂環式不飽和化合物、重合体、化学増幅レジスト組成物、及び該組成物を用いたパターン形成方法 |
| US7297811B2 (en) | 2003-12-04 | 2007-11-20 | International Business Machines Corporation | Precursors to fluoroalkanol-containing olefin monomers and associated methods of synthesis and use |
| US7193023B2 (en) | 2003-12-04 | 2007-03-20 | International Business Machines Corporation | Low activation energy photoresists |
| US7495135B2 (en) | 2003-12-04 | 2009-02-24 | International Business Machines Corporation | Precursors to fluoroalkanol-containing olefin monomers, and associated methods of synthesis and use |
| US7820369B2 (en) | 2003-12-04 | 2010-10-26 | International Business Machines Corporation | Method for patterning a low activation energy photoresist |
| CN1779569B (zh) * | 2004-11-22 | 2010-09-29 | 北京科华微电子材料有限公司 | 氟代环烯烃聚合物及在深紫外类光刻胶中的应用 |
| US7732547B2 (en) * | 2007-07-12 | 2010-06-08 | Industrial Technology Research Institute | Fluorinated cyclic olefinic graft polymer |
| JP6545168B2 (ja) * | 2013-11-13 | 2019-07-17 | オーソゴナル，インコーポレイテッド | 分岐型フッ素化感光性ポリマー |
| DE102014119634B4 (de) | 2014-05-05 | 2023-05-11 | Taiwan Semiconductor Manufacturing Company, Ltd. | Verfahren zum herstellen von halbleitervorrichtungen und photolitographiematerial |
| WO2021088198A1 (en) * | 2019-11-04 | 2021-05-14 | 3M Innovative Properties Company | Electronic telecommunications articles comprising crosslinked fluoropolymers and methods |
| CN118307704A (zh) * | 2024-04-26 | 2024-07-09 | 安徽恒坤新材料科技有限公司 | 一种桥型结构光刻胶树脂和KrF光刻胶组合物及其制备方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2928865A (en) * | 1957-03-25 | 1960-03-15 | Du Pont | Fluorinated tricyclononanes and tetracycloundecanes |
| EP0437619B1 (en) * | 1989-07-07 | 1995-08-30 | Daikin Industries, Limited | Fluorinated copolymer and method of producing the same |
-
2002
- 2002-03-27 IL IL15704002A patent/IL157040A0/xx unknown
- 2002-03-27 WO PCT/US2002/009799 patent/WO2002079287A1/en not_active Ceased
- 2002-03-27 KR KR10-2003-7012744A patent/KR20040018342A/ko not_active Withdrawn
- 2002-03-27 DE DE60211883T patent/DE60211883T2/de not_active Expired - Lifetime
- 2002-03-27 JP JP2002578302A patent/JP2004526844A/ja active Pending
- 2002-03-27 CN CNB028077636A patent/CN1215099C/zh not_active Expired - Fee Related
- 2002-03-27 EP EP02757868A patent/EP1383812B1/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| HK1066554A1 (en) | 2005-03-24 |
| WO2002079287A1 (en) | 2002-10-10 |
| CN1500099A (zh) | 2004-05-26 |
| DE60211883D1 (en) | 2006-07-06 |
| DE60211883T2 (de) | 2007-06-06 |
| JP2004526844A (ja) | 2004-09-02 |
| EP1383812A1 (en) | 2004-01-28 |
| EP1383812B1 (en) | 2006-05-31 |
| KR20040018342A (ko) | 2004-03-03 |
| CN1215099C (zh) | 2005-08-17 |
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