IL151825A - Oxygen reduced niobium oxides - Google Patents
Oxygen reduced niobium oxidesInfo
- Publication number
- IL151825A IL151825A IL151825A IL15182502A IL151825A IL 151825 A IL151825 A IL 151825A IL 151825 A IL151825 A IL 151825A IL 15182502 A IL15182502 A IL 15182502A IL 151825 A IL151825 A IL 151825A
- Authority
- IL
- Israel
- Prior art keywords
- niobium
- niobium oxide
- anode
- lubricant
- binder
- Prior art date
Links
- 229910000484 niobium oxide Inorganic materials 0.000 title claims abstract description 137
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical class [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 title claims abstract description 136
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title claims abstract description 50
- 239000001301 oxygen Substances 0.000 title claims abstract description 50
- 229910052760 oxygen Inorganic materials 0.000 title claims abstract description 50
- 239000000843 powder Substances 0.000 claims abstract description 40
- 238000000034 method Methods 0.000 claims abstract description 38
- 239000011230 binding agent Substances 0.000 claims abstract description 29
- 239000000314 lubricant Substances 0.000 claims abstract description 28
- 239000010955 niobium Substances 0.000 claims description 84
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 77
- 229910052758 niobium Inorganic materials 0.000 claims description 75
- 229910052751 metal Inorganic materials 0.000 claims description 33
- 239000002184 metal Substances 0.000 claims description 33
- 238000005245 sintering Methods 0.000 claims description 20
- 239000000203 mixture Substances 0.000 claims description 7
- -1 poly(propylene carbonate) Polymers 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 229920001223 polyethylene glycol Polymers 0.000 claims description 4
- 238000003825 pressing Methods 0.000 claims description 4
- 239000002904 solvent Substances 0.000 claims description 4
- 235000021355 Stearic acid Nutrition 0.000 claims description 3
- 229920000180 alkyd Polymers 0.000 claims description 3
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 claims description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 3
- 238000005406 washing Methods 0.000 claims description 2
- 239000002202 Polyethylene glycol Substances 0.000 claims 2
- 239000004372 Polyvinyl alcohol Substances 0.000 claims 2
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 claims 2
- 229920000379 polypropylene carbonate Polymers 0.000 claims 2
- 239000000243 solution Substances 0.000 claims 2
- 239000008117 stearic acid Substances 0.000 claims 2
- 239000011148 porous material Substances 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 72
- 239000003990 capacitor Substances 0.000 abstract description 31
- 125000004430 oxygen atom Chemical group O* 0.000 abstract description 6
- 238000012546 transfer Methods 0.000 abstract description 6
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 30
- 229910052715 tantalum Inorganic materials 0.000 description 27
- 230000015572 biosynthetic process Effects 0.000 description 24
- 238000010438 heat treatment Methods 0.000 description 15
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 14
- 238000012360 testing method Methods 0.000 description 13
- 239000008188 pellet Substances 0.000 description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 8
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- 229910052786 argon Inorganic materials 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 5
- 239000012467 final product Substances 0.000 description 5
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 239000003792 electrolyte Substances 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 125000003821 2-(trimethylsilyl)ethoxymethyl group Chemical group [H]C([H])([H])[Si](C([H])([H])[H])(C([H])([H])[H])C([H])([H])C(OC([H])([H])[*])([H])[H] 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 3
- 238000007743 anodising Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 235000011007 phosphoric acid Nutrition 0.000 description 3
- 238000004626 scanning electron microscopy Methods 0.000 description 3
- 238000012216 screening Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000004678 hydrides Chemical class 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 241000191291 Abies alba Species 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- YOWQFIUMFQOIEI-UHFFFAOYSA-N [O-2].O.[Nb+5] Chemical compound [O-2].O.[Nb+5] YOWQFIUMFQOIEI-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910021386 carbon form Inorganic materials 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000009125 cardiac resynchronization therapy Methods 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000004845 hydriding Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 150000002821 niobium Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G33/00—Compounds of niobium
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/495—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on vanadium, niobium, tantalum, molybdenum or tungsten oxides or solid solutions thereof with other oxides, e.g. vanadates, niobates, tantalates, molybdates or tungstates
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/63—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B using additives specially adapted for forming the products, e.g.. binder binders
- C04B35/638—Removal thereof
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- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/64—Burning or sintering processes
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/10—Alloys containing non-metals
- C22C1/1089—Alloys containing non-metals by partial reduction or decomposition of a solid metal compound
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C29/00—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides
- C22C29/12—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on oxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/042—Electrodes or formation of dielectric layers thereon characterised by the material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
- H01G9/052—Sintered electrodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
- H01G9/052—Sintered electrodes
- H01G9/0525—Powder therefor
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/03—Particle morphology depicted by an image obtained by SEM
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- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/40—Electric properties
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- C01—INORGANIC CHEMISTRY
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- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
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- Structural Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Inorganic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Powder Metallurgy (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
Abstract
Methods to at least partially reduce a niobium oxide are described wherein the process includes heat treating the niobium oxide in the presence of a getter material and in an atmosphere which permits the transfer of oxygen atoms from the niobium oxide to the getter material, and for a sufficient time and at a sufficient temperature to form an oxygen reduced niobium oxide. Niobium oxides and/or suboxides are also described as well as capacitors containing anodes made from the niobium oxides and suboxides. Anodes formed from niobium oxide powders using binders and/or lubricants are described as well as methods to form the anodes.
Description
1*tth Λΐηηοι» ovarii iiw «ηη
OXYGEN REDUCED NIOBIUM OXIDES
OXYGEN REDUCED NIOBIUM OXIDES
RAC OTIND OF THE T VF.NTTON
The present invention relates to niobium and oxides thereof and more particularly relates to niobium oxides and methods to at least partially reduce niobium oxide and further relates to oxygen reduced niobium.
STIMMAttV OF TTTF. PttF.SF.NT TNVF.NTTON
In accordance with the purposes of the present invention, as embodied and described herein, the present invention relates to a method to at least partially reduce a niobiiim oxide which includes the steps of heat treating the niobium oxide in the presence of a getter material and in an atmosphere which permits the transfer of oxygen atoms from the niobium oxide to the getter material for a sufficient time and temperature to form an oxygen reduced niobium oxide.
The present invention also relates to oxygen reduced niobium oxides which preferably have beneficial properties, especially when formed into an electrolytic capacitor anode. For instance, a capacitor made from the oxygen reduced niobium oxide of the present invention can have a capacitance of up to about 200,000 CV/g or more. Further, electrolytic capacitor anodes made from the oxygen reduced niobium oxides of the present invention can have a low DC leakage. For instance, such a capacitor can have a DC leakage of from about 0.5 nA CV to about 5.0 nA/CV.
Accordingly, the present invention also relates to methods to increase capacitance and reduce DC leakage in capacitors made from niobium oxides, which involves partially reducing a niobium oxide by heat treating the niobium oxide in the presence of a getter material and in an atmosphere which permits the transfer of oxygen atoms from the niobium
oxide to the getter material, for a sufficient time and temperature to form an oxygen reduced niobium oxide, which when formed into a capacitor anode, has reduced DC leakage and/or increased capacitance.
The present invention further relates to capacitor anodes containing the niobium oxides of the present invention and having other beneficial properties.
It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are intended to provide further explanation of the present invention, as claimed.
BRTF.TT DRSCRTPTTON Off TffF. Tttt A WINQS
Figures 1-1 1 are SEMs of various oxygen reduced niobium oxides of the present invention at various magnifications.
Figure 12 is a graph plotting DC leakage vs. Formation voltage for a niobium oxide capacitor anode and other anodes made from niobium or tantalum.
Figures 13 and 14 are graphs showing a DCL and capacitance comparison of an anode containing niobium oxide compared to anodes containing niobium flake and tantalum.
Figure 15 is a graph showing DC leakage for anodes formed from niobium suboxides of the present invention.
Figure 16 is a graph showing the ^capacitance from a wet anodes formed from niobium oxide and tantalum.
Figures 17 and 18 are graphs showing the flammability of anodes- from niobium, tantalum, and niobium oxide.
Figure 19 is a graph showing the ignition energy needed to ignite niobium oxide powders compared to niobium powders and tantalum powders.
TTETATT.FT) "DRSfH ΤΡΤΪΟΝ OF TFT PRESENT INVENTION
In an embodiment of the present invention, the present invention relates to methods to at least partially reduce a niobium oxide. In general, the method includes the steps of heat treating a starting niobium oxide in the presence of a getter material in an atmosphere which permits the transfer of oxygen atoms from the niobium oxide to the getter material for a sufficient time and at a sufficient temperature to form an oxygen reduced niobium oxide.
For purposes of the present invention, the niobium oxide can be at least one oxide of niobium metal and/or alloys thereof. A specific example of a starting niobium oxide is
Nb205.
The niobium oxide used in the present invention can be in any shape or size.
Preferably, the niobium oxide is in the form of a powder or a plurality of particles. Examples of the type of powder that can be used include, but are not limited to, flaked, angular, nodular, and mixtures or variations thereof. Preferably, the niobium oxide is in the form of a powder which more effectively leads to the oxygen reduced niobium oxide.
Examples of such preferred niobium oxide powders include those having mesh sizes of from about 60/100 to about 100/325 mesh and from about 60/100 to about 200/325 mesh. Another range of size is from -40 mesh to about -325 mesh.
The getter material for purposes of the present invention is any material capable of reducing the specific starting niobium oxide to the oxygen reduced niobium oxide. Preferably, the getter material comprises tantalum, niobium, or both. More preferably, the getter material is niobium. The niobium getter material for purposes of the present invention is any material containing niobium metal which can remove or reduce at least partially the oxygen in the niobium oxide. Thus, the niobium getter material can be an alloy or a material containing mixtures of niobium metal with other ingredients. Preferably, the niobium getter
material is predominantly, if not exclusively, niobium metal. The purity of the niobium metal
is not important but it is preferred that high purity niobium metal comprise the getter material
to avoid the introduction of other impurities during the heat treating process. Accordingly,
the niobium metal in the niobium getter material preferably has a purity of at least about 98%
and more preferably at least about 99%. Further, it is preferred that impurities such as oxygen
are not present or are present in amounts below about 100 ppm.
The getter material can be in any shape or size. For instance, the getter material can
be in the form of a tray which contains the niobium oxide to be reduced or can be in a
particle or powder size. Preferably, the getter materials are in the form of a powder in order
to have the most efficient surface area for reducing the niobium oxide. The getter material,
I
\ thus, can be flaked, angular, nodular, and mixtures or variations thereof. The getter material
can be a tantalum hydride material. A preferred form is coarse chips, e.g., 14/40 mesh chips
that can be easily separated from the powder product by screening.
Similarly, the getter material can be tantalum and the like and can have the same 15 preferred parameters and/or properties discussed above for the niobium getter material. Other
getter materials can be used alone or in combination with the tantalum or niobium getter
materials. Also, other materials can form a part of the getter material.
Generally, a sufficient amount of getter material is present to at least partially reduce
the niobium oxide being heat treated. Further, the amount of the getter material is dependent 20 upon the amount of reducing desired to the niobium oxide. For instance, if a slight reduction
in the niobium oxide is desired, then the getter material will be present in a stoichemetric
amount. Similarly, if the niobium oxide is to be reduced substantially with respect to its
oxygen presence, then the getter material is present in a 2 to 5 times stoichemetric amount.
Generally, the amount of getter material present (e.g., based on the tantalum getter material
being 100% tantalum) can be present based on the following ratio of getter material to the amount of niobium oxide present of from about 2 to 1 to about 10 to 1.
Furthermore, the amount of getter material can also be dependent on the type of niobium oxide being reduced. For instance, when the niobium oxide being reduced is NkOs, the amount of getter material is preferably 5 to 1.
The heat treating that the starting niobium oxide is subjected to can be conducted in any heat treatment device or furnace commonly used in the heat treatment of metals, such as niobium and tantalum. The heat treatment of the niobium oxide in the presence of the getter material is at a sufficient temperature and for a sufficient time to form an oxygen reduced niobium oxide. The temperature and time of the heat treatment can be dependent on a variety of factors such as the amount of reduction of the niobium oxide, the amount of the getter material, and the type of getter material as well as the type of starting niobium oxide. Generally, the heat treatment of the niobium oxide is at a temperature of from less than or about 800° C to about 1900° C and more preferably from about 1000° C to about 1400° C, and most preferably from about 1200° C to about 1250° C. In more detail, when the niobium oxide is a niobium containing oxide, the heat treatment temperatures will be from about 1000° C to about 1300° C, and more preferably from about 1200° C to about 1250° C for a time of from about 5 minutes to about 100 minutes, and more preferably from about 30 minutes to about 60 minutes. Routine testing in view of the present application will permit one skilled in the art to readily control the times and temperatures of the heat treatment in order to obtain the proper or desired reduction of the niobium oxide.
The heat treatment occurs in an atmosphere which permits the transfer of oxygen atoms from the niobium oxide to the getter material. The heat treatment preferably occurs in a hydrogen containing atmosphere which is preferably just hydrogen. Other gases can also be
present with the hydrogen, such as inert gases, so long as the other gases do not react with the hydrogen. Preferably, the hydrogen atmosphere is present during the heat treatment at a pressure of from about 10 Torr to about 2000 Torr, and more preferably from about 100 Torr to about 1000 Torr, and most preferably from about 100 Torr to about 930 Torr. Mixtures of H2 and an inert gas such as Ar can be used. Also, H2 in N2 can be used to effect control of the N2 level of the niobium oxide.
During the heat treatment process, a constant heat treatment temperature can be used during the entire heat treating process or variations in temperature or temperature steps can be used. For instance, hydrogen can be initially admitted at 1000° C followed by increasing the temperature to 1250° C for 30 minutes followed by reducing the temperature to 1000° C and held there until removal of the H2 gas. After the H2 or other atmosphere is removed, the furnace temperature can be dropped. Variations of these steps can be used to suit any preferences of the industry.
The oxygen reduced niobium oxides can also contain levels of nitrogen, e.g., from about 100 ppm to about 80,000 ppni N2 or to about 130,000 ppm N2. Suitable ranges includes from about 31 ,000 ppm N2 to about 30,000 ppm N2 and from about 50,000 ppm N2 to about 80,000 N2.
The oxygen reduced niobium oxide is any niobium oxide which has a lower oxygen content in the metal oxide compared to the starting niobium oxide. Typical reduced niobium oxides comprise NbO, NbOo.7, NbOu, Nb02, and any combination thereof with or without other oxides present. Generally, the reduced niobium oxide of the present invention has an atomic ratio of niobium to oxygen of about l :less than 2.5, and preferably 1 :2 and more preferably 1 : 1.1 , 1 : 1 , or 1 :0.7. Put another way, the reduced niobium oxide preferably has the
formula NbxOy, wherein Nb is niobium, x is 2 or less, and y is less than 2.5x. More preferably x is 1 and y is less than 2, such as 1.1 , 1.0, 0.7, and the like.
The starting niobium oxides can be prepared by calcining at 1000° C until removal of any volatile components. The oxides can be sized by screening. Preheat treatment of the niobium oxides can be used to create controlled porosity in the oxide particles.
The reduced niobium oxides of the present invention also preferably have a microporous surface and preferably have a sponge-like structure, wherein the primary particles are preferably 1 micron or less. The SEMs further depict the type of preferred reduced niobium oxide of the present invention. As can be seen in these microphotographs, the reduced niobium oxides of the present invention can have high specific surface area, and a porous structure with approximately 50% porosity. Further, the reduced niobium oxides of the present invention can be characterized as having a preferred specific surface area of from about 0.5 to about 10.0 m2/g, more preferably from about 0.5 to 2.0 m2/g, and even more preferably from about 1.0 to about 1.5 m2/g. The preferred apparent density of the powder of the niobium oxides is less than about 2.0 g/cc, more preferably, less than 1.5 g/cc and more preferably, from about 0.5 to about 1.5 g/cc.
The various oxygen reduced niobium oxides of the present invention can be further characterized by the electrical properties resulting from the formation of a capacitor anode using the oxygen reduced niobium oxides of the present invention. In general, the oxygen reduced niobium oxides of the present invention can be tested for electrical properties by pressing powders of the oxygen reduced niobium oxide into an anode and sintering the pressed powder at appropriate temperatures and then anodizing the anode to produce an electrolytic capacitor anode which can then be subsequently tested for electrical properties.
Accordingly, another embodiment of the present invention relates to anodes for capacitors formed from the oxygen reduced niobium oxides of the present invention. Anodes can be made from the powdered form of the reduced oxides in a similar process as used for fabricating metal anodes, i.e., pressing porous pellets with embedded lead wires or other connectors followed by optional sintering and anodizing. The lead connector can be embedded or attached at any time before anodizing. Anodes made from some of the oxygen reduced niobium oxides of the present invention can have a capacitance of from about 1,000 CV/g or lower to about 300,000 CV/g or more, and other ranges of capacitance can be from about 20,000 CV/g to about 300,000 CV/g or from about 62,000 CV/g to about 200,000 CV/g and preferably from about 60,000 to 150,000 CV/g. In forming the capacitor anodes of the present invention, a sintering temperature can be used which will permit the formation of a capacitor anode having the desired properties. The sintering temperature will be based on the oxygen reduced niobium oxide used. Preferably, the sintering temperature is from about 1200° C to about 1750° C and more preferably from about 1200° C to about 1400° C and most preferably from about 1250° C to about 1350° C when the oxygen reduced niobium oxide is an oxygen reduced niobium oxide.
The anodes formed from the niobium oxides of the present invention are preferably formed at a voltage of about 35 volts and preferably from about 6 to about 70 volts. When an oxygen reduced niobium oxide is used, preferably, the forming voltages are from about 6 to about 50 volts, and more preferably from about 10 to about 40 volts. Other high formation voltages can .be used such as from about 70 volts to about 130 volts. The DC leakage achieved by the niobium oxides of the present invention have provided excellent low leakage at high formation voltages. This low leakage is significantly better than capacitors formed with Nb powder as can be seen in, for instance, Figure 12. Anodes of the reduced niobium
oxides can be prepared by fabricating a pellet of Nb2Os with a lead wire followed by sintering in H2 atmosphere or other suitable atmosphere in the proximity of a getter material just as with powdered oxides. In this embodiment, the anode article produced can be produced directly, e.g., forming the oxygen reduced valve metal oxide and an anode at the same time. Also, the anodes formed from the oxygen reduced niobium oxides of the present invention preferably have a DC leakage of less than about 5.0 nA/CV. In an embodiment of the present invention, the anodes formed from some of the oxygen reduced niobium oxides of the present invention have a DC leakage of from about 5.0 nA/CV to about 0.50 nA/CV. The present invention also relates to a capacitor in accordance with the present invention having a niobium oxide film on the surface of the capacitor. Preferably, the film is a niobium pentoxide film. The means of making metal powder into capacitor anodes is known to those skilled in the art and such methods such as those set forth in U.S. Pat. Nos. 4,805,074, 5,412,533, 5,21 1 ,741, and 5,245,514, and European Application Nos. 0 634 762 Al and 0 634 761 Al , all of which are incorporated in their entirety herein by reference.
The capacitors of the present invention can be used in a variety of end uses such as automotive electronics, cellular phones, computers, such, as monitors, mother boards, and the like, consumer electronics including TVs and CRTs, printers/copiers, power supplies, modems, computer notebooks, disc drives, and the like.
Preferably, the niobium suboxide of the present invention is a NbO or oxygen depleted NbO or an aggregate or agglomerate which contains NbO and niobium metal or niobum metal with a rich oxygen content. Unlike NbO, Nb02 is undesirable due to its resistive nature, whereas NbO is very conductive. Accordingly, capacitor anodes which are formed from NbO or oxygen depleted NbO or mixture of NbO with niobium metal are desirable and preferred for purposes of the present invention.
In making the niobium oxides of the present invention, and preferably NbO or variations thereof, hydrogen gas is preferably used as the carrier wherein oxygen is transferred from the starting niobium material, namely Nb2Os to Nb with the use of the H2 gas as the carrier. The preferred reaction scheme is as follows:
H2
Nb205 + 3Nb ► 5NbO
As can be seen, using a niobium metal as the getter material, the getter material along with the starting niobium oxide can all result into the final product which is preferably NbO. In more detail, there are typically two processes involved in preparing the niobum suboxides of the present invention. One process involves the preparation of the getter material and the other part of the process involves the use of the getter material along with the starting niobium oxide to form the niobium suboxide of the present invention. In preparing the getter matieral, which is preferably niobium powder, a niobium ingot is subjected to a hydriding process in order to harden the niobum metal for purposes of crushing the ingot into powder which is subsequently subjected to a screen in order to obtain a uniform particle distrubution which is preferably from about 5 to about 300 microns in size. If needed, the powder can be subjected two or more times to the crusher in order to achieve the desired uniform particle distrubuton. Afterwards, the powder is then subjected to milling in order to obtain the desired particle size which is from about 1 to about 5 microns in size. After milling, the material is preferably leached with acid in order to remove impurities and then the material is subjected to drying to obtain the niobium getter powder.
This niobium getter powder is then mixed with or blended with the starting niobium oxide material, which is preferably Nt^Os, and subjected to a hydrogen heat treatment which preferably occurs at a temperature of from about 900 to about 1,200 with the hydrogen
pressure being from about 50 Torr to about 900 Torr. Preferably, the starting niobium oxide is -325 mesh. Preferably, the heat treatment occurs for a sufficient time to achieve the reaction set forth above which is the full conversion of the getter material and the starting metal oxide to the final product which is preferably NbO. Thus, in this process, the getter material as well as the staring nietal oxide all become the final product.
The sintering properties of the anode formed from the niobium suboxides of the present invention show that the present invention provides an anode which has DC leakage capability comparable to tantalum when sintered at high temperatures but, unlike other metals, is less prone to capacitance lost during sintering. These favorable properties are set forth in Figs. 13 and 14 which show a comparison of the preferred niobium oxide of the present invention compared to an anode formed from niobium flake and an anode formed from tantalum. As can be seen in Fig. 13, the anode formed from the niobium oxide of the present invention showed satisfactory DC leakage when the anode was sintered at temperatures of from about 1200 to 1600 °C or higher whereas an anode formed from niobium metal showed a higher DC leakage for sintering temperatures of from about 1200 to 1600 °C with no significant drop in DC leakage at high temperatures, such as 1400 to 1600 °C.
Also, as shown in Fig. 14, when an anode made from niobium metal was sintered at temperatures of from 1200 to 1600 °C and then capacitance tested with a wet anode, the capacitance steadily declined as the sintering temperature increased to the point where the capacitance was about 10,000 CV/g at a sintering temperature of about 1600 °C. Unlike niobium metal, when an anode made from the niobium suboxides of the present invention was tested, the capacitance was fairly steady when sintered at a variety of temperatures of from 1200 to about 1600 °C. There was only a slight drop at these higher temperatures. This
is even different from an anode made from tantalum which showed a significant drop after sintering at 1400 °C. Accordingly, the anodes formed from the niobium suboxides of the present invention showed excellent resistance to DC leakage as well as an ability to resist capacitance loss at higher sintering temperatures.
The anodes formed from the niobium suboxides of the present invention further showed an ability to have a low DC leakage even with high formation voltages. In addition, the capacitance of the anodes formed from the niobium suboxides of the present invention showed high capacitance for a variety of formation voltages such as from 20 to 60 volts.
In more detail, as shown in Fig. 12 of the present application, when anodes formed from the niobium suboxides of the present invention were tested for DC leakage, the DC leakage was below 10 nA/CV for formation voltages from under 20 to over 60 volts which is quite different from anodes formed from niobium metal which show a dramatic increase in DC leakage when formation voltages exceeded 50 volts. Further, as shown in Fig. 16, the capacitance from a wet anode formed from niobium oxide was comparable to tantalum at formation voltages of from 20 to 60 volts. These tests and Figs. 15 and 16 show that the niobium suboxides can be formed into anodes and be used in capacitors rated up to 20 volts unlike capacitors using niobium metal which are rated below 10 volts.
In addition, as shown in Figs. 17 and 18, anodes formed from niobium suboxides are far less flammable than anodes formed from niobium or tantalum. As Fig. 17 shows, the heat released from an anode formed from the niobium suboxides of the present invention is considerably lower with regard to heat released at 500 °C than tantalum and niobium anodes. Furthermore, the flammability of the niobiums of oxides of the present invention is significantly lower than the flammability or burning rate of tantalum or niobium, as shown in Fig. 18. The burning rate is determined by Reference Test EEC Directive 79/831 ANNEX
Part A from Chi 1 worth Technology Inc. Also, the ignition energy (mJ) needed to ignite niobium oxide powders is significantly higher than the ignition energy needed to ignite niobium powder or tantalum powder as shown in Fig. 19. From such data, the niobium oxide of the present invention did not ignite at 500 mJ but ignited at an energy level of 10J (a significantly higher amount of energy). On the other hand, both niobium and tantalum powders ignited at less than 3 mJ.
The capacitor anodes of the present invention which contain the niobium suboxides of the present invention are preferably prepared by pressing niobium oxide powder into the shape of a capacitor anode and sintering the anode at a temperature of from about 1200 °C to about 1600 °C for a time of from about 1 minute to about 30 minutes. Afterwards, the anode is then anodized at a formation voltage of from about 16 volts to about 75 volts preferably at a formation temperature of about 85 °C. Other formation temperatures can be used such as from 50 °C to 100 °C. Afterwards, the anode is then annealed at a annealing temperature of from about 300 °C to about 350 °C for a time of from about 10 minutes to about 60 minutes. Once this annealing is completed, the anode is again anodized at the same or slightly lower (5-10% lower) formation voltage than it is exposed to. The second formation lasts from about 10 minutes to 120 minutes at about 85° C. The anode is then preferably manganized at a temperature of from about 220 °C to about 280 °C for a time of from about 1 minute to about 30 minutes.
The present invention further relates to methods to at least partially reduce a niobium oxide. Preferably, the method involves heat treating a starting niobium oxide in the presence of a getter material in an atmosphere which permits the transfer of oxygen atoms from the starting niobium oxide to the getter material for a sufficient time and a sufficient temperature to form an oxygen reduced niobium oxide. Preferably, the oxygen reduced niobium oxide is
NbO, depleted NbO, or a niobium metal with NbO. As stated earlier, preferably the getter material is a niobium metal and more preferably a niobium powder. In the preferred process, the getter material converts to the oxygen reduced niobium oxide as well. Thus, the getter material also forms part of the final product.
With respect to the anodes formed from the niobium oxides of the present invention, preferably, the niobium oxide powder is mixed with a, binder and/or lubricant solution in an amount sufficient to be able to form the niobium oxide powder into an anode when pressed. J Preferably, the amount of the binder and/or lubricant in the powder ranges from about 1 to about 20 wt%, based on the wt% of the combined ingredients. After mixing the niobium oxide powder with the binder and/or lubricant solution, the solvent that may be present as part of the binder/lubricant solution is removed by evaporation or other drying techniques. Once the solvent, if present, is removed, the niobium oxide powder is then pressed into the shape of an anode, preferably with a tantalum, niobium, or other conductive wire embedded in the anode. While a variety of press densities can be used, preferably, the pressed density is from about 2.5 to about 4.5 g cc. Once pressed into the anode, a de-binding or de-lube step occurs to remove the binder and/or lubricant present in the pressed anode. The removal of the binder and/or lubricant can occur a number of ways including putting the anode in a vacuum furnace at temperatures, for instance, of from about 250 °C to about 1200 °C to thermally decompose the binder and/or lubricant. The binder and/or lubricant can also be removed by other steps such as repeated washings in appropriate solvents to dissolve and/or solubilize, or otherwise remove the binder and/or lubricant that may be present. Once the de- binding de-Iube step is accomplished, the anode is then sintered in a vacuum or under inert atmosphere at appropriate sintering temperatures, such as from about 900 °C to about 1900 "C. The finished anode then preferably has reasonable body and/or wire pull strength as well
as low carbon residue. The anodes of the present invention which use the niobium oxides of the present invention have numerous advantages over tantalum and/or niobium powders which are formed into anodes. Many organic binders and/or lubricants which are used to improve press performance in the formation of an anode lead to high carbon residues which are present after de-binding or de-lubing and sintering. The full removal of the carbon residue can be extremely difficult since carbon forms carbides with metals. The presence of carbon/carbides leads to the formation of defective dielectrics and thus an undesirable product. With the anodes of the present invention, the micro-environment of the anode is oxygen-rich. Thus, when the anode is sintered at high temperature, carbon residue in the anodes can evaporate as carbon monoxide after reacting with oxygen. Thus, the anodes of the present invention have a "self-cleaning" property which is quite different from other anodes formed from tantalum or niobium. Accordingly, the anodes of the present invention have a high tolerance of organic impurities during processing and handling and have the ability to use a wide range of hydrocarbon containing binders and/or lubricants for improved processability including improved powder flow, improved anode green strength, and the like. Accordingly, the binders and/or lubricants that can be used in the present invention include organic binders and organic lubricants as well as binders and lubricants that contain high amounts of hydrocarbons. Examples of suitable binders that can be used in the formation of the pressed anodes of the present invention, include, but are. not limited to, poly(propylene carbonates) such as QPAC-40 available from PAC Polymers, Inc., Greenville, DE; alkyd resin solutions, such as GLYPTAL 1202 available from Glyptal Inc., Chelsea, MA; polyethylene glycols, such as CARBOWAX, available from Union Carbide, Houston, Texas; polyvinylalcohols, stearic acids, and the like. The procedures and additional examples of binders and/or lubricants set forth in Publication Nos. WO 98/30348; WO 00/45472; WO
00/44068; WO 00/28559; WO 00/46818; WO 00/19469; WO 00/14755; WO 00/14139; and WO 00/12783; and U.S. Patent Nos. 6,072,694; 6,056,899; and 6,001,281, all of which are incorporated in their entirety by reference herein, can be used in the present invention.
The present invention will be further clarified by the following examples, which are intended to be exemplary of the present invention.
TF.ST METHODS
Anode Fahrication:
size - 0.1 7" dia
3.5 Dp
powder wt = 341 mg
Anode Sintering:
1300° C I O'
1450° C 10'
1600° C 10'
1750° C 10'
V F.f A nnrli7.atinn- 30V Ef @ 60° C/0.1% H3PO4 Electrolyte
mA/g constant current
DC. T i».akage/Capa tance ■ F.SR Testing:
DC Leakage Testing —
70% Ef (21 VDC) Test Voltage
60 second charge time
% H3PO4 @ 21 ° C
Capacitance - DF Testing:
18% H2S04 @ 21 ° C
120Hz
SOV F.f Reform Annrii/arinn:
50V Ef @ 60° C/0.1 % H3PO4 Electrolyte
mA/g constant current
DC T .fiakagfi/f!apanitance. - F.SR Testing:
DC leakage Testing —
70% Ef (35 VDC) Test Voltage
60 second charge time
75V Rf Reform AnoriizaHon- 75V Ef @ 60° C/0.1% H3PO4 Electrolyte
mA/g constant current
ΏΓ. 1 .eakagfi/f!apa tanne - F.SR Toting:
DC leakage Testing —
70% Ef (52.5 VDC) Test Voltage
60 second charge time
Scott Density, oxygen analysis, phosphorus analysis, and BET analysis were determined according to the procedures set forth in U.S. Patent Nos. 5,011,742; 4,960,471 ; and
4,964,906, all incorporated hereby in their entireties by reference herein.
TCXAIvTPLRS
Example 1
+10 mesh Ta hydride chips (99.2 gms) with approximately 50 ppm oxygen were mixed with 22 grams of M^Os and placed into Ta trays. The trays were placed into a vacuum heat treatment furnace and heated to 1000° C. H2 gas was admitted to the furnace to a pressure of +3psi. The temperature was further ramped to 1240° C and held for 30 minutes. The temperature was lowered to 1050° C for 6 minutes until all H2 was swept from the furnace. While still holding 1050° C, the argon gas was evacuated from the furnace until a pressure of 5 x 10"4 torr was achieved. At this point 700 mm of argon was readmitted to the chamber and the furnace cooled to 60° C.
The material was passivated with several cyclic exposures to progressively higher partial pressures of oxygen prior to removal from the furnace as follows: The furnace was backfilled with argon to 700 mm followed by filling to one atmosphere with air. After 4 minutes the chamber was evacuated to 10* torr. The chamber was then backfilled to 600 mm with argon followed by air to one atmosphere and held for 4 minutes. The chamber was evacuated to 10'2 torr. The chamber was then backfilled to 400 mm argon followed by air to one atmosphere. After 4 minutes the chamber was evacuated to 10' torr. The chamber was them backfilled to 200 mm argon followed by air to one atmosphere and held for 4 minutes. The chamber was evacuated to 10"2 torr. The chamber was backfilled to one atmosphere with air and held for 4 minutes. The chamber was evacuated to 10"2 torr. The chamber was backfilled to one atmosphere with argon and opened to remove the sample.
The powder product was separated from the tantalum chip getter by screening through a 40 mesh screen. The product was tested with the following results.
CV/g of pellets sintered to 1300° C X 10 minutes and formed
to 35 volts = 81,297
nA/CV (DC leakage) = 5.0
Sintered Density of pellets = 2.7 g/cc
Scott density = 0.9 g cc
Chemical Analysis (ppm)
- C = 70
H2 = 56
Ti = 25 Fe = 25
Mn = 10 Si = 25
Sn = 5 Ni = 5 ,
Cr = 10 Al = 5
Mo = 25 Mg = 5
Cu = 50 B = 2
Pb = 2 all others < limits
Example 2
Samples 1 through 20 are examples following similar steps as above with powdered Nb205 as indicated in the Table. For most of the examples, mesh sizes of the starting input · material are set forth in the Table, for example 60/100, means smaller than 60 mesh, but larger than 100 mesh. Similarly, the screen size of some of the Ta getter is given as 14/40. The getters marked as "Ta hydride chip" are +40 mesh with no upper limit on particle size.
Sample 18 used Nb as the getter material (commercially available N200 flaked Nb powder from CPM). The getter material for sample 18 was fine grained Nb powder which was not separated from the final product. X-ray diffraction showed that some of the getter material remained as Nb, but most was converted to NbOu and NbO by the process as was the starting niobium oxide material Nb2Os.
Sample 15 was a pellet of Nb205, pressed to near solid density, and reacted with ¾
in close proximity to the Ta getter material. The process converted the solid oxide pellet into a porous slug of NbO suboxide. This slug was sintered to a sheet of Nb metal to create an anode lead connection and anodized to 35 volts using similar electrical forming procedures
as used for the powder slug pellets. This sample demonstrates the unique ability of this process to make a ready to anodize slug in a single step from N 205 starting material.
The Table shows the high capacitance and low DC leakage capable of anodes made from the pressed and sintered powders/pellets of the present invention. Microphotographs (SEMs) of various samples were taken. These photographs show the porous structure of the reduced oxygen niobium oxide of the present invention. In particular, Figure 1 is a photograph of the outer surface of a pellet taken at 5,000 X (sample 15). Figure 2 is a photograph of the pellet interior of the same pellet taken at 5,000 X. Figures 3 and 4 are photographs of the outer surface of the same pellet at 1,000 X. Figure 5 is a photograph of sample 1 1 at 2,000 X and Figures 6 and 7 are photographs taken of sample 4 at 5,000 X. Figure 8 is a photograph taken of sample 3 at 2,000 X and Figure 9 is a photograph of sample 6 at 2,000 X. Finally, Figure 10 is a photograph of sample 6, taken at 3,000 X and Figure 1 1 is a photograph of sample 9 taken at 2,000 X.
TABLE 1
X-Ray Defraction Analysis Results
Major 1 and 2 refer to primary components present by weight.
Minor I and 2 refer to secondary components present by weight.
Samples 11 and 12 had the same input material . Samples 2 and 3 had the same input material. Samples 6 and 7 had the same input material. Samples 9 and 10 had the same input material.
Example 3
This experiment was conducted to show the ability of the niobium oxides of the present invention to form at high formation voltages and yet retain an acceptable DC. leakage. The niobium oxide of the present invention was compared to a capacitor formed from commercially available tantalum and niobium metal. In particular, Table 2 sets forth the basic characteristics of the materials that were used to form the capacitor for this example. The C606 tantalum is a commercially available product from Cabot Corporation. The niobium oxide used in Example 3 was prepared in manner similar to Example 1. Table 3 further set forth the chemical compositions of components other than the niobium metal for the niobium oxide of the present invention and the niobium metal which was used for comparison purposes. Tables 4-7 set forth the data obtained for each formation voltage starting at 15 volts and ending at 75 volts. The data is also plotted in Figure 12. The particular capacitor anodes which were tested for DC leakage were formed using the stated formation voltage and in each case the sintering temperature was 1300° C for 10 minutes and the formation temperature of the anode was 60° C with the press density set forth in Table 2. Further, the anodes were formed in 0.1% H3P04 electrolyte, with a 135 milliamps/g constant current up to the desired formation voltage which was held for 3 hours. The test conditions were the same as for the DC leakage tested in Example 1 (except as noted herein) including 10% HjP04 at 21° C. The anode size of the Nb suboxide was 0.17 inch diameter. The anode size of the tantalum was 0.13 inch diameter and the anode size for the niobium was 0.19 inch diameter. The anode weight was as follows: niobium suboxide = 200 mg; tantalum = 200 mg; niobium = 340 mg.
Table 2
Table 3
As can be seen in Figure 12 and Tables 4-7, while the DC leakage for capacitor anodes made from niobium metal increased dramatically at a formation voltage of 75 volts, the DC leakage for the capacitor anode formed from a niobium oxide of the present invention remain relatively stable. This is quite impressive considering the effect seen with respect to a capacitor anode formed from niobium metal. Thus, unlike niobium metal, the
niobium oxides of the present invention have the ability to be formed into capacitor anodes and formed at high voltages while maintaining acceptable DC leakage which was not possible with anodes made simply from niobium metal. Thus, the niobium oxides of the present invention can be possible substitutes for anodes made from tantalum in certain applications which is quite beneficial considering niobium can be less expensive.
Table 4
Table 5
Table 6
Other embodiments of the present invention will be apparent to those skilled in the art from consideration of the specification and practice of the invention disclosed herein. It is intended that the specification and examples be considered as exemplary only, with a true scope and spirit of the invention being indicated by the following claims.
Claims (26)
1. The method of forming an anode comprising the steps of pressing a mixture of niobium oxide powder with at least one binder or lubricant to form the pressed anode, wherein said niobium oxide has an atomic ratio of niobium to oxygen of l :less than 2.5.
2. The method of claim 1 , wherein said niobium oxide is NbO.
3. The method of claim 1, wherein said niobium oxide comprises NbO, NbO0.7, NbO i . i , or combinations thereof.
4. The method of claim 1 , further comprising de-binding or de-lubing the binder or lubricant.
5. The method of claim 4, wherein said de-binding or de-lubing is accomplished by thermally decomposing said binder or lubricant.
6. The method of claim 4, wherein said de-binding or de-lubing is accomplished by repeated washings in at least one solvent capable of removing said binder or lubricant.
7. The method of claim 4, further comprising sintering the anode in a vacuum or under an inert atmosphere.
8. The method of claim 1, wherein said binder or lubricant comprises an organic binder or lubricant.
9. The method of claim 1, wherein said binder or lubricant comprises poly(propylene carbonate), alkyd resin solution, polyethylene glycol, polyvinyl alcohol, stearic acid, or combinations thereof.
10. A pressed anode comprising a niobium oxide powder and at least one binder or lubricant, wherein said niobium oxide powder has an atomic ratio of niobium to oxygen of 1 :less than 2.5.
11. The pressed anode of claim 10, wherein said niobium oxide is NbO.
12. The pressed anode of claim 10, wherein said niobium oxide comprises NbO, NbOo.7, NbO i . i , or combinations thereof. - 30 - 151825/2
13. The pressed anode of claim 10, wherein said binder or lubricant is an organic binder or lubricant.
14. The pressed anode of claim 10, wherein said binder or lubricant comprises poly(propylene carbonate), alkyd resin solution, polyethylene glycol, polyvinyl alcohol, stearic acid, or combinations thereof.
15. The pressed anode of claim 10, wherein said anode has a low carbon residue after removal of the binder or lubricant and after sintering.
16. The pressed anode of claim 15, wherein said niobium oxide is sintered at a temperature of from about 1200° C to about 1750° C.
17. The pressed anode of claim 15, wherein said niobium oxide is sintered at a temperature of from about 1200° C to about 1450° C.
18. The pressed anode of claim 10, wherein the atomic ratio is 1 less than 2.0.
19. The pressed anode of claim 10, wherein the atomic ratio is 1 less than 1.5.
20. The pressed anode of claim 10, wherein the atomic ratio is 1 1.1.
21. The pressed anode of claim 10, wherein the atomic ratio is 1 0.7.
22. The pressed anode of claim 10, wherein the atomic ratio is 1 0.5.
23. The pressed anode of claim 10, wherein said niobium oxide has a porous structure.
24. The pressed anode of claim 10, wherein said niobium oxide has a porous structure having from about 0.1 to about 10 micrometer pores.
25. The pressed anode of claim 10, wherein said niobium oxide is NbO, oxygen depleted NbO, niobium metal with NbO, or combinations thereof.
26. The pressed anode of claim 10, wherein said niobium comprises nodular, flaked, angular, or combinations thereof. For the Applicant Seligsohn Gabrieli & Co.
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US09/533,430 US6373685B1 (en) | 1998-09-16 | 2000-03-23 | Methods to partially reduce a niobium metal oxide and oxygen reduced niobium oxides |
US22966800P | 2000-09-01 | 2000-09-01 | |
US09/758,705 US6462934B2 (en) | 1998-09-16 | 2001-01-11 | Methods to partially reduce a niobium metal oxide and oxygen reduced niobium oxides |
PCT/US2001/009314 WO2001071738A2 (en) | 2000-03-23 | 2001-03-22 | Oxygen reduced niobium oxides |
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JP (1) | JP4754755B2 (en) |
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US6576099B2 (en) | 2000-03-23 | 2003-06-10 | Cabot Corporation | Oxygen reduced niobium oxides |
DE10307716B4 (en) | 2002-03-12 | 2021-11-18 | Taniobis Gmbh | Valve metal powders and processes for their manufacture |
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-
2001
- 2001-03-22 DE DE60139984T patent/DE60139984D1/en not_active Expired - Lifetime
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WO2001071738A2 (en) | 2001-09-27 |
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DE60139984D1 (en) | 2009-11-05 |
EP1266386B1 (en) | 2009-09-23 |
JP2003530688A (en) | 2003-10-14 |
ATE443919T1 (en) | 2009-10-15 |
CN1317723C (en) | 2007-05-23 |
JP4754755B2 (en) | 2011-08-24 |
TW517252B (en) | 2003-01-11 |
EP1266386A2 (en) | 2002-12-18 |
AU4771401A (en) | 2001-10-03 |
CN1427996A (en) | 2003-07-02 |
CZ20023151A3 (en) | 2003-03-12 |
PT1266386E (en) | 2009-10-23 |
MXPA02009291A (en) | 2003-05-23 |
AU2001247714B2 (en) | 2005-06-23 |
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