IL145709A - Device for rapidly measuring angle-dependent diffraction effects on finely structured surfaces - Google Patents

Device for rapidly measuring angle-dependent diffraction effects on finely structured surfaces

Info

Publication number
IL145709A
IL145709A IL14570900A IL14570900A IL145709A IL 145709 A IL145709 A IL 145709A IL 14570900 A IL14570900 A IL 14570900A IL 14570900 A IL14570900 A IL 14570900A IL 145709 A IL145709 A IL 145709A
Authority
IL
Israel
Prior art keywords
measuring angle
diffraction effects
structured surfaces
finely structured
rapidly measuring
Prior art date
Application number
IL14570900A
Other languages
English (en)
Other versions
IL145709A0 (en
Inventor
Norbert Benesch
Claus Schneider
Lothar Pfitzner
Original Assignee
Semiconductor 300 Gmbh & Co Kg
Dresden And Fraumhofer Ges Zur
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor 300 Gmbh & Co Kg, Dresden And Fraumhofer Ges Zur filed Critical Semiconductor 300 Gmbh & Co Kg
Publication of IL145709A0 publication Critical patent/IL145709A0/xx
Publication of IL145709A publication Critical patent/IL145709A/xx

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4788—Diffraction

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
IL14570900A 1999-03-31 2000-03-31 Device for rapidly measuring angle-dependent diffraction effects on finely structured surfaces IL145709A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19914696A DE19914696C2 (de) 1999-03-31 1999-03-31 Gerät zur schnellen Messung winkelabhängiger Beugungseffekte an feinstrukturierten Oberflächen
PCT/EP2000/002894 WO2000058713A2 (de) 1999-03-31 2000-03-31 Gerät zur schnellen messung winkelabhängiger beugungseffekte an feinstrukturierten oberflächen

Publications (2)

Publication Number Publication Date
IL145709A0 IL145709A0 (en) 2002-07-25
IL145709A true IL145709A (en) 2005-08-31

Family

ID=7903139

Family Applications (1)

Application Number Title Priority Date Filing Date
IL14570900A IL145709A (en) 1999-03-31 2000-03-31 Device for rapidly measuring angle-dependent diffraction effects on finely structured surfaces

Country Status (7)

Country Link
US (1) US6724475B2 (xx)
EP (1) EP1166090B8 (xx)
JP (1) JP3709431B2 (xx)
KR (1) KR100456352B1 (xx)
DE (2) DE19914696C2 (xx)
IL (1) IL145709A (xx)
WO (1) WO2000058713A2 (xx)

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DE10134755B4 (de) * 2001-07-17 2004-08-05 Infineon Technologies Ag Verfahren zur Messung einer charakteristischen Abmessung wenigstens einer Struktur auf Halbleiterwafern
WO2003010489A2 (en) * 2001-07-25 2003-02-06 Hohner Corp. Method and apparatus for surface roughness measurement
US6678046B2 (en) * 2001-08-28 2004-01-13 Therma-Wave, Inc. Detector configurations for optical metrology
DE10146945A1 (de) * 2001-09-24 2003-04-10 Zeiss Carl Jena Gmbh Meßanordnung und Meßverfahren
DE10146944A1 (de) * 2001-09-24 2003-04-10 Zeiss Carl Jena Gmbh Meßanordnung
US6813034B2 (en) 2002-02-05 2004-11-02 Therma-Wave, Inc. Analysis of isolated and aperiodic structures with simultaneous multiple angle of incidence measurements
US7061627B2 (en) * 2002-03-13 2006-06-13 Therma-Wave, Inc. Optical scatterometry of asymmetric lines and structures
IL149557A (en) * 2002-05-09 2008-11-03 Nova Measuring Instr Ltd Optical system operating with variable angle of incidence
US6927080B1 (en) * 2002-10-28 2005-08-09 Advanced Micro Devices, Inc. Structures for analyzing electromigration, and methods of using same
US6867862B2 (en) * 2002-11-20 2005-03-15 Mehrdad Nikoonahad System and method for characterizing three-dimensional structures
JP4144352B2 (ja) * 2002-12-26 2008-09-03 株式会社ニコン 線幅計測装置、線幅計測方法、線幅変動検出装置および線幅変動表示方法
DE10302868B4 (de) * 2003-01-25 2008-07-03 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Bestimmung von Strukturparametern einer Oberfläche mit einem lernfähigen System
JP2004279282A (ja) * 2003-03-17 2004-10-07 Oh'tec Electronics Corp ワ−クの外観検査装置
DE102004010363B4 (de) * 2004-03-03 2012-11-15 Qimonda Ag Verfahren zur Bestimmung einer örtlichen Variation des Reflektions- oder Transmissionsverhaltens über die Oberfläche einer Maske
US20070091325A1 (en) * 2005-01-07 2007-04-26 Mehrdad Nikoonahad Multi-channel optical metrology
DE102005023736B4 (de) 2005-05-23 2019-08-22 Vistec Semiconductor Systems Jena Gmbh Verfahren zum Bestimmen von Strukturparametern
US7525672B1 (en) * 2005-12-16 2009-04-28 N&K Technology, Inc. Efficient characterization of symmetrically illuminated symmetric 2-D gratings
US7812943B2 (en) * 2007-10-29 2010-10-12 The United States Of America As Represented By The Secretary Of Commerce Zeroeth order imaging
WO2010151030A2 (ko) * 2009-06-23 2010-12-29 Seo Bongmin 두께변화 측정장치, 이를 이용한 시스템, 이를 이용한 표면 현미경, 두께변화 측정방법 및 이를 이용한 표면 이미지 획득방법
CN102625902B (zh) 2009-06-23 2016-01-06 徐逢敏 用于测量厚度变化的设备、使用该设备的系统、使用该设备的形貌显微镜、测量厚度变化的方法、以及使用该测量方法获取形貌图像的方法
JP5737749B2 (ja) * 2011-02-21 2015-06-17 国立大学法人京都大学 光子ビーム走査装置及び光子ビーム走査方法
US9568422B2 (en) * 2012-12-17 2017-02-14 Advantest Corporation Light beam incident device and reflected light measurement device
FR3002800A1 (fr) * 2013-03-01 2014-09-05 Commissariat Energie Atomique Procede et appareil de caracterisation d'une surface diffractante.
DE102013223945A1 (de) * 2013-11-22 2015-05-28 Inoex Gmbh Messvorrichtung und Verfahren zur Vermessung von Prüfobjekten
DE102015108190A1 (de) * 2015-05-22 2016-11-24 Inoex Gmbh Terahertz-Messvorrichtung und Verfahren zur Vermessung von Prüfobjekten mittels Terahertz-Strahlung
KR20200068541A (ko) * 2018-03-12 2020-06-15 오르보테크 엘티디. 자동화된 광학 검사를 위한 광학 시스템
US11327012B2 (en) * 2018-05-07 2022-05-10 Unm Rainforest Innovations Method and system for in-line optical scatterometry
CN108956093B (zh) * 2018-06-22 2020-06-30 维沃移动通信有限公司 红外散射装置的检测方法和移动终端

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DE3626724C2 (de) * 1986-08-07 1994-06-16 Siemens Ag Anordnung zur Oberflächenprüfung
US5048970A (en) * 1990-06-29 1991-09-17 Nicolas J. Harrick Optical attachment for variable angle reflection spectroscopy
US5221933A (en) * 1991-06-28 1993-06-22 Eastman Kodak Company Beam scanning galvanometer with low inertia mirror and magnet
US5414747A (en) 1993-02-22 1995-05-09 The Penn State Research Foundation Method and apparatus for in-process analysis of polycrystalline films and coatings by x-ray diffraction
DE4326196C2 (de) 1993-08-04 1997-05-22 Fraunhofer Ges Forschung Planarer elektro-optischer Lichtstrahlablenker und Verfahren zu seiner Herstellung
US5637873A (en) * 1995-06-07 1997-06-10 The Boeing Company Directional reflectometer for measuring optical bidirectional reflectance
DE19824624A1 (de) * 1997-07-23 1999-02-25 Univ Ilmenau Tech Meßanordnung zur optischen Diffraktionsanalyse periodischer Submikrometerstrukturen
US6201601B1 (en) * 1997-09-19 2001-03-13 Kla-Tencor Corporation Sample inspection system
KR20010032235A (ko) * 1997-11-19 2001-04-16 마루야마 다카시 광학각도 특성 측정장치

Also Published As

Publication number Publication date
DE50011754D1 (de) 2006-01-05
KR100456352B1 (ko) 2004-11-09
EP1166090B8 (de) 2006-03-08
WO2000058713A2 (de) 2000-10-05
EP1166090A2 (de) 2002-01-02
EP1166090B1 (de) 2005-11-30
US6724475B2 (en) 2004-04-20
KR20020011377A (ko) 2002-02-08
WO2000058713A3 (de) 2001-02-01
JP3709431B2 (ja) 2005-10-26
DE19914696A1 (de) 2000-11-02
JP2002540422A (ja) 2002-11-26
US20020101585A1 (en) 2002-08-01
IL145709A0 (en) 2002-07-25
DE19914696C2 (de) 2002-11-28

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