IL116876A0 - Pulsed ion beam assisted deposition - Google Patents
Pulsed ion beam assisted depositionInfo
- Publication number
- IL116876A0 IL116876A0 IL11687696A IL11687696A IL116876A0 IL 116876 A0 IL116876 A0 IL 116876A0 IL 11687696 A IL11687696 A IL 11687696A IL 11687696 A IL11687696 A IL 11687696A IL 116876 A0 IL116876 A0 IL 116876A0
- Authority
- IL
- Israel
- Prior art keywords
- ion beam
- assisted deposition
- beam assisted
- pulsed ion
- pulsed
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5826—Treatment with charged particles
- C23C14/5833—Ion beam bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
- C23C26/02—Coating not provided for in groups C23C2/00 - C23C24/00 applying molten material to the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
- H01J27/14—Other arc discharge ion sources using an applied magnetic field
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/31—Processing objects on a macro-scale
- H01J2237/3142—Ion plating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Combustion & Propulsion (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US37670295A | 1995-01-23 | 1995-01-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
IL116876A0 true IL116876A0 (en) | 1996-07-23 |
Family
ID=23486107
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL11687696A IL116876A0 (en) | 1995-01-23 | 1996-01-23 | Pulsed ion beam assisted deposition |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0757598A4 (xx) |
JP (1) | JPH09511028A (xx) |
AU (1) | AU4965896A (xx) |
CA (1) | CA2186102A1 (xx) |
IL (1) | IL116876A0 (xx) |
WO (1) | WO1996022841A1 (xx) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AUPR179500A0 (en) * | 2000-11-30 | 2000-12-21 | Saintech Pty Limited | Ion source |
FR2832736B1 (fr) * | 2001-11-28 | 2004-12-10 | Eppra | Procede perfectionne de revetement d'un support par un materiau |
CN100341121C (zh) * | 2003-09-10 | 2007-10-03 | 台湾积体电路制造股份有限公司 | 介电层的改质方法与其在镶嵌式金属制程的应用 |
FR2865946B1 (fr) * | 2004-02-09 | 2007-12-21 | Commissariat Energie Atomique | Procede de realisation d'une couche de materiau sur un support |
US7703479B2 (en) | 2005-10-17 | 2010-04-27 | The University Of Kentucky Research Foundation | Plasma actuator |
JP6470061B2 (ja) * | 2015-02-03 | 2019-02-13 | スタンレー電気株式会社 | p型ZnO系半導体構造の製造方法、及び、ZnO系半導体素子の製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2155024A (en) * | 1984-03-03 | 1985-09-18 | Standard Telephones Cables Ltd | Surface treatment of plastics materials |
US4844785A (en) * | 1984-03-27 | 1989-07-04 | Matsushita Electric Industrial Co., Ltd. | Method for deposition of hard carbon film |
ATE80955T1 (de) * | 1984-06-20 | 1992-10-15 | Gould Inc | Laserverfahren zur photomaskenreparatur. |
US4490229A (en) * | 1984-07-09 | 1984-12-25 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Deposition of diamondlike carbon films |
US4793908A (en) * | 1986-12-29 | 1988-12-27 | Rockwell International Corporation | Multiple ion source method and apparatus for fabricating multilayer optical films |
US5055318A (en) * | 1988-10-11 | 1991-10-08 | Beamalloy Corporation | Dual ion beam ballistic alloying process |
DE69218820T2 (de) * | 1991-03-07 | 1997-10-02 | Minnesota Mining & Mfg | Polymer mit vernetztem Flächengebiet |
US5316969A (en) * | 1992-12-21 | 1994-05-31 | Board Of Trustees Of The Leland Stanford Junior University | Method of shallow junction formation in semiconductor devices using gas immersion laser doping |
-
1996
- 1996-01-23 CA CA002186102A patent/CA2186102A1/en not_active Abandoned
- 1996-01-23 IL IL11687696A patent/IL116876A0/xx unknown
- 1996-01-23 EP EP96906197A patent/EP0757598A4/en not_active Withdrawn
- 1996-01-23 WO PCT/US1996/001000 patent/WO1996022841A1/en not_active Application Discontinuation
- 1996-01-23 AU AU49658/96A patent/AU4965896A/en not_active Abandoned
- 1996-01-23 JP JP8523004A patent/JPH09511028A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
CA2186102A1 (en) | 1996-08-01 |
JPH09511028A (ja) | 1997-11-04 |
AU4965896A (en) | 1996-08-14 |
EP0757598A1 (en) | 1997-02-12 |
WO1996022841A1 (en) | 1996-08-01 |
EP0757598A4 (en) | 2001-03-14 |
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