IL109589A0 - Apparatus and method for performing high spatial resolution thin film layer thickness metrology - Google Patents

Apparatus and method for performing high spatial resolution thin film layer thickness metrology

Info

Publication number
IL109589A0
IL109589A0 IL10958994A IL10958994A IL109589A0 IL 109589 A0 IL109589 A0 IL 109589A0 IL 10958994 A IL10958994 A IL 10958994A IL 10958994 A IL10958994 A IL 10958994A IL 109589 A0 IL109589 A0 IL 109589A0
Authority
IL
Israel
Prior art keywords
thin film
film layer
layer thickness
spatial resolution
high spatial
Prior art date
Application number
IL10958994A
Other languages
English (en)
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of IL109589A0 publication Critical patent/IL109589A0/xx

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
IL10958994A 1993-05-14 1994-05-06 Apparatus and method for performing high spatial resolution thin film layer thickness metrology IL109589A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US6431693A 1993-05-14 1993-05-14

Publications (1)

Publication Number Publication Date
IL109589A0 true IL109589A0 (en) 1994-08-26

Family

ID=22055096

Family Applications (1)

Application Number Title Priority Date Filing Date
IL10958994A IL109589A0 (en) 1993-05-14 1994-05-06 Apparatus and method for performing high spatial resolution thin film layer thickness metrology

Country Status (5)

Country Link
US (1) US5543919A (no)
EP (1) EP0624775A1 (no)
JP (1) JPH07134007A (no)
IL (1) IL109589A0 (no)
NO (1) NO941768L (no)

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US5958148A (en) 1996-07-26 1999-09-28 Speedfam-Ipec Corporation Method for cleaning workpiece surfaces and monitoring probes during workpiece processing
US5872633A (en) * 1996-07-26 1999-02-16 Speedfam Corporation Methods and apparatus for detecting removal of thin film layers during planarization
US6030887A (en) * 1998-02-26 2000-02-29 Memc Electronic Materials, Inc. Flattening process for epitaxial semiconductor wafers
US5946102A (en) * 1997-07-28 1999-08-31 Mmr Technologies, Inc. Method and apparatus for parameter difference imaging of a sample surface
US6142855A (en) 1997-10-31 2000-11-07 Canon Kabushiki Kaisha Polishing apparatus and polishing method
US5972162A (en) * 1998-01-06 1999-10-26 Speedfam Corporation Wafer polishing with improved end point detection
US6200908B1 (en) 1999-08-04 2001-03-13 Memc Electronic Materials, Inc. Process for reducing waviness in semiconductor wafers
US7151609B2 (en) * 2000-07-06 2006-12-19 Filmetrics, Inc. Determining wafer orientation in spectral imaging
US6900900B2 (en) * 2000-11-16 2005-05-31 Process Diagnostics, Inc. Apparatus and method for enabling high resolution film thickness and thickness-uniformity measurements
US6654698B2 (en) 2001-06-12 2003-11-25 Applied Materials, Inc. Systems and methods for calibrating integrated inspection tools
CN101446773A (zh) 2001-11-07 2009-06-03 应用材料有限公司 无掩膜光子电子点格栅阵列光刻机
KR20050044371A (ko) * 2001-11-07 2005-05-12 어플라이드 머티어리얼스, 인코포레이티드 광학 스폿 그리드 어레이 프린터
EP1613933A1 (de) * 2003-04-07 2006-01-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Anordnung zur optischen abstandsbestimmung einer reflektierenden oberfläche
US7068363B2 (en) * 2003-06-06 2006-06-27 Kla-Tencor Technologies Corp. Systems for inspection of patterned or unpatterned wafers and other specimen
US7084966B2 (en) * 2003-10-20 2006-08-01 Infineon Technologies Ag Optical measurement of device features using lenslet array illumination
WO2006078471A2 (en) * 2005-01-07 2006-07-27 Filmetrics, Inc. Determining wafer orientation in spectral imaging
US20100006785A1 (en) * 2008-07-14 2010-01-14 Moshe Finarov Method and apparatus for thin film quality control
DK2251454T3 (da) 2009-05-13 2014-10-13 Sio2 Medical Products Inc Coating og inspektion af beholder
US7985188B2 (en) 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
US9545360B2 (en) 2009-05-13 2017-01-17 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
JP5365581B2 (ja) * 2010-05-28 2013-12-11 信越半導体株式会社 薄膜付ウェーハの評価方法
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
CN103930595A (zh) 2011-11-11 2014-07-16 Sio2医药产品公司 用于药物包装的钝化、pH保护性或润滑性涂层、涂布方法以及设备
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
US9664626B2 (en) 2012-11-01 2017-05-30 Sio2 Medical Products, Inc. Coating inspection method
EP2920567B1 (en) 2012-11-16 2020-08-19 SiO2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
WO2014085348A2 (en) 2012-11-30 2014-06-05 Sio2 Medical Products, Inc. Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like
US9662450B2 (en) 2013-03-01 2017-05-30 Sio2 Medical Products, Inc. Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
KR102211788B1 (ko) 2013-03-11 2021-02-04 에스아이오2 메디컬 프로덕츠, 인크. 코팅된 패키징
US9863042B2 (en) 2013-03-15 2018-01-09 Sio2 Medical Products, Inc. PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases
EP3122917B1 (en) 2014-03-28 2020-05-06 SiO2 Medical Products, Inc. Antistatic coatings for plastic vessels
US10295342B2 (en) * 2015-08-14 2019-05-21 Kla-Tencor Corporation System, method and computer program product for calibration of metrology tools
KR20180048694A (ko) 2015-08-18 2018-05-10 에스아이오2 메디컬 프로덕츠, 인크. 산소 전달률이 낮은, 의약품 및 다른 제품의 포장용기
EP3150959B1 (en) * 2015-10-02 2018-12-26 Soitec Method for measuring thickness variations in a layer of a multilayer semiconductor structure
CN114752986B (zh) * 2022-03-15 2024-01-05 深南电路股份有限公司 一种电镀工具的参数调整方法及电镀方法

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US3869211A (en) * 1972-06-29 1975-03-04 Canon Kk Instrument for measuring thickness of thin film
GB2016678B (en) * 1978-03-10 1982-09-15 Asahi Dow Ltd Infrared multilayer film thickness measuring method and apparatus
JPS63118603A (ja) * 1986-11-06 1988-05-23 Sumitomo Heavy Ind Ltd インキ膜厚計測装置
JPS6453101A (en) * 1987-05-25 1989-03-01 Kurashiki Boseki Kk Equal tilt angle interference type film thickness gauge
US5042949A (en) * 1989-03-17 1991-08-27 Greenberg Jeffrey S Optical profiler for films and substrates
US5101111A (en) * 1989-07-13 1992-03-31 Dainippon Screen Mfg. Co., Ltd. Method of measuring thickness of film with a reference sample having a known reflectance
US5291269A (en) * 1991-12-06 1994-03-01 Hughes Aircraft Company Apparatus and method for performing thin film layer thickness metrology on a thin film layer having shape deformations and local slope variations
US5293214A (en) * 1991-12-06 1994-03-08 Hughes Aircraft Company Apparatus and method for performing thin film layer thickness metrology by deforming a thin film layer into a reflective condenser
US5333049A (en) * 1991-12-06 1994-07-26 Hughes Aircraft Company Apparatus and method for interferometrically measuring the thickness of thin films using full aperture irradiation
US5337150A (en) * 1992-08-04 1994-08-09 Hughes Aircraft Company Apparatus and method for performing thin film layer thickness metrology using a correlation reflectometer

Also Published As

Publication number Publication date
NO941768L (no) 1994-11-15
US5543919A (en) 1996-08-06
EP0624775A1 (en) 1994-11-17
JPH07134007A (ja) 1995-05-23
NO941768D0 (no) 1994-05-11

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