NO941768D0 - Anordning og fremgangsmåte for utförelse av tynnfilmsjikt-tykkelsesmetrologi med höy romopplösning - Google Patents
Anordning og fremgangsmåte for utförelse av tynnfilmsjikt-tykkelsesmetrologi med höy romopplösningInfo
- Publication number
- NO941768D0 NO941768D0 NO941768A NO941768A NO941768D0 NO 941768 D0 NO941768 D0 NO 941768D0 NO 941768 A NO941768 A NO 941768A NO 941768 A NO941768 A NO 941768A NO 941768 D0 NO941768 D0 NO 941768D0
- Authority
- NO
- Norway
- Prior art keywords
- carrying
- thin film
- film layer
- layer thickness
- out thin
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US6431693A | 1993-05-14 | 1993-05-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
NO941768D0 true NO941768D0 (no) | 1994-05-11 |
NO941768L NO941768L (no) | 1994-11-15 |
Family
ID=22055096
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO941768A NO941768L (no) | 1993-05-14 | 1994-05-11 | Anordning og fremgangsmåte for utförelse av tynnfilmsjikt-tykkelsesmetrologi med höy romopplösning |
Country Status (5)
Country | Link |
---|---|
US (1) | US5543919A (no) |
EP (1) | EP0624775A1 (no) |
JP (1) | JPH07134007A (no) |
IL (1) | IL109589A0 (no) |
NO (1) | NO941768L (no) |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5872633A (en) * | 1996-07-26 | 1999-02-16 | Speedfam Corporation | Methods and apparatus for detecting removal of thin film layers during planarization |
US5958148A (en) | 1996-07-26 | 1999-09-28 | Speedfam-Ipec Corporation | Method for cleaning workpiece surfaces and monitoring probes during workpiece processing |
US6030887A (en) * | 1998-02-26 | 2000-02-29 | Memc Electronic Materials, Inc. | Flattening process for epitaxial semiconductor wafers |
US5946102A (en) * | 1997-07-28 | 1999-08-31 | Mmr Technologies, Inc. | Method and apparatus for parameter difference imaging of a sample surface |
US6142855A (en) * | 1997-10-31 | 2000-11-07 | Canon Kabushiki Kaisha | Polishing apparatus and polishing method |
US5972162A (en) * | 1998-01-06 | 1999-10-26 | Speedfam Corporation | Wafer polishing with improved end point detection |
US6200908B1 (en) | 1999-08-04 | 2001-03-13 | Memc Electronic Materials, Inc. | Process for reducing waviness in semiconductor wafers |
US7151609B2 (en) * | 2000-07-06 | 2006-12-19 | Filmetrics, Inc. | Determining wafer orientation in spectral imaging |
US6900900B2 (en) * | 2000-11-16 | 2005-05-31 | Process Diagnostics, Inc. | Apparatus and method for enabling high resolution film thickness and thickness-uniformity measurements |
US6654698B2 (en) | 2001-06-12 | 2003-11-25 | Applied Materials, Inc. | Systems and methods for calibrating integrated inspection tools |
US6897941B2 (en) * | 2001-11-07 | 2005-05-24 | Applied Materials, Inc. | Optical spot grid array printer |
KR20050044369A (ko) | 2001-11-07 | 2005-05-12 | 어플라이드 머티어리얼스, 인코포레이티드 | 마스크없는 광자-전자 스팟-그리드 어레이 프린터 |
EP1613933A1 (de) * | 2003-04-07 | 2006-01-11 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Anordnung zur optischen abstandsbestimmung einer reflektierenden oberfläche |
US7068363B2 (en) * | 2003-06-06 | 2006-06-27 | Kla-Tencor Technologies Corp. | Systems for inspection of patterned or unpatterned wafers and other specimen |
US7084966B2 (en) * | 2003-10-20 | 2006-08-01 | Infineon Technologies Ag | Optical measurement of device features using lenslet array illumination |
WO2006078471A2 (en) * | 2005-01-07 | 2006-07-27 | Filmetrics, Inc. | Determining wafer orientation in spectral imaging |
US20100006785A1 (en) * | 2008-07-14 | 2010-01-14 | Moshe Finarov | Method and apparatus for thin film quality control |
RU2523773C2 (ru) | 2009-05-13 | 2014-07-20 | СиО2 Медикал Продактс, Инк., | Способ по выделению газа для инспектирования поверхности с покрытием |
WO2013170052A1 (en) | 2012-05-09 | 2013-11-14 | Sio2 Medical Products, Inc. | Saccharide protective coating for pharmaceutical package |
US7985188B2 (en) | 2009-05-13 | 2011-07-26 | Cv Holdings Llc | Vessel, coating, inspection and processing apparatus |
US9458536B2 (en) | 2009-07-02 | 2016-10-04 | Sio2 Medical Products, Inc. | PECVD coating methods for capped syringes, cartridges and other articles |
US11624115B2 (en) | 2010-05-12 | 2023-04-11 | Sio2 Medical Products, Inc. | Syringe with PECVD lubrication |
JP5365581B2 (ja) * | 2010-05-28 | 2013-12-11 | 信越半導体株式会社 | 薄膜付ウェーハの評価方法 |
US9878101B2 (en) | 2010-11-12 | 2018-01-30 | Sio2 Medical Products, Inc. | Cyclic olefin polymer vessels and vessel coating methods |
US9272095B2 (en) | 2011-04-01 | 2016-03-01 | Sio2 Medical Products, Inc. | Vessels, contact surfaces, and coating and inspection apparatus and methods |
JP6095678B2 (ja) | 2011-11-11 | 2017-03-15 | エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド | 薬剤パッケージ用の不動態化、pH保護又は滑性皮膜、被覆プロセス及び装置 |
US9554968B2 (en) | 2013-03-11 | 2017-01-31 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging |
US11116695B2 (en) | 2011-11-11 | 2021-09-14 | Sio2 Medical Products, Inc. | Blood sample collection tube |
JP6509734B2 (ja) | 2012-11-01 | 2019-05-08 | エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド | 皮膜検査方法 |
WO2014078666A1 (en) | 2012-11-16 | 2014-05-22 | Sio2 Medical Products, Inc. | Method and apparatus for detecting rapid barrier coating integrity characteristics |
WO2014085348A2 (en) | 2012-11-30 | 2014-06-05 | Sio2 Medical Products, Inc. | Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like |
US9764093B2 (en) | 2012-11-30 | 2017-09-19 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition |
EP2961858B1 (en) | 2013-03-01 | 2022-09-07 | Si02 Medical Products, Inc. | Coated syringe. |
US9937099B2 (en) | 2013-03-11 | 2018-04-10 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging with low oxygen transmission rate |
US20160017490A1 (en) | 2013-03-15 | 2016-01-21 | Sio2 Medical Products, Inc. | Coating method |
WO2015148471A1 (en) | 2014-03-28 | 2015-10-01 | Sio2 Medical Products, Inc. | Antistatic coatings for plastic vessels |
US10295342B2 (en) | 2015-08-14 | 2019-05-21 | Kla-Tencor Corporation | System, method and computer program product for calibration of metrology tools |
US11077233B2 (en) | 2015-08-18 | 2021-08-03 | Sio2 Medical Products, Inc. | Pharmaceutical and other packaging with low oxygen transmission rate |
EP3150959B1 (en) * | 2015-10-02 | 2018-12-26 | Soitec | Method for measuring thickness variations in a layer of a multilayer semiconductor structure |
CN114752986B (zh) * | 2022-03-15 | 2024-01-05 | 深南电路股份有限公司 | 一种电镀工具的参数调整方法及电镀方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3869211A (en) * | 1972-06-29 | 1975-03-04 | Canon Kk | Instrument for measuring thickness of thin film |
GB2016678B (en) * | 1978-03-10 | 1982-09-15 | Asahi Dow Ltd | Infrared multilayer film thickness measuring method and apparatus |
JPS63118603A (ja) * | 1986-11-06 | 1988-05-23 | Sumitomo Heavy Ind Ltd | インキ膜厚計測装置 |
JPS6453101A (en) * | 1987-05-25 | 1989-03-01 | Kurashiki Boseki Kk | Equal tilt angle interference type film thickness gauge |
US5042949A (en) * | 1989-03-17 | 1991-08-27 | Greenberg Jeffrey S | Optical profiler for films and substrates |
US5101111A (en) * | 1989-07-13 | 1992-03-31 | Dainippon Screen Mfg. Co., Ltd. | Method of measuring thickness of film with a reference sample having a known reflectance |
US5333049A (en) * | 1991-12-06 | 1994-07-26 | Hughes Aircraft Company | Apparatus and method for interferometrically measuring the thickness of thin films using full aperture irradiation |
US5291269A (en) * | 1991-12-06 | 1994-03-01 | Hughes Aircraft Company | Apparatus and method for performing thin film layer thickness metrology on a thin film layer having shape deformations and local slope variations |
US5293214A (en) * | 1991-12-06 | 1994-03-08 | Hughes Aircraft Company | Apparatus and method for performing thin film layer thickness metrology by deforming a thin film layer into a reflective condenser |
US5337150A (en) * | 1992-08-04 | 1994-08-09 | Hughes Aircraft Company | Apparatus and method for performing thin film layer thickness metrology using a correlation reflectometer |
-
1994
- 1994-05-06 IL IL10958994A patent/IL109589A0/xx unknown
- 1994-05-11 NO NO941768A patent/NO941768L/no unknown
- 1994-05-11 EP EP94107383A patent/EP0624775A1/en not_active Withdrawn
- 1994-05-16 JP JP6101415A patent/JPH07134007A/ja active Pending
- 1994-09-20 US US08/309,516 patent/US5543919A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0624775A1 (en) | 1994-11-17 |
US5543919A (en) | 1996-08-06 |
JPH07134007A (ja) | 1995-05-23 |
IL109589A0 (en) | 1994-08-26 |
NO941768L (no) | 1994-11-15 |
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