IL105925A - Ablative process for printed circuit board technology - Google Patents
Ablative process for printed circuit board technologyInfo
- Publication number
- IL105925A IL105925A IL10592593A IL10592593A IL105925A IL 105925 A IL105925 A IL 105925A IL 10592593 A IL10592593 A IL 10592593A IL 10592593 A IL10592593 A IL 10592593A IL 105925 A IL105925 A IL 105925A
- Authority
- IL
- Israel
- Prior art keywords
- substrate
- light source
- coherent light
- circuit board
- printed circuit
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
- B23K26/032—Observing, e.g. monitoring, the workpiece using optical means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/42—Housings not intimately mechanically associated with radiating elements, e.g. radome
- H01Q1/425—Housings not intimately mechanically associated with radiating elements, e.g. radome comprising a metallic grid
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q15/00—Devices for reflection, refraction, diffraction or polarisation of waves radiated from an antenna, e.g. quasi-optical devices
- H01Q15/0006—Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices
- H01Q15/0013—Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices said selective devices working as frequency-selective reflecting surfaces, e.g. FSS, dichroic plates, surfaces being partly transmissive and reflective
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/027—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed by irradiation, e.g. by photons, alpha or beta particles
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09009—Substrate related
- H05K2201/09018—Rigid curved substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09818—Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
- H05K2201/09963—Programming circuit by using small elements, e.g. small PCBs
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0548—Masks
- H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
- H05K2203/107—Using laser light
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Laser Beam Processing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Details Of Aerials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US90178992A | 1992-06-22 | 1992-06-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
IL105925A0 IL105925A0 (en) | 1993-10-20 |
IL105925A true IL105925A (en) | 1997-01-10 |
Family
ID=25414814
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL10592593A IL105925A (en) | 1992-06-22 | 1993-06-07 | Ablative process for printed circuit board technology |
Country Status (6)
Country | Link |
---|---|
US (1) | US5472828A (xx) |
EP (1) | EP0575848B1 (xx) |
JP (1) | JPH06226477A (xx) |
DE (1) | DE69306178T2 (xx) |
IL (1) | IL105925A (xx) |
TW (1) | TW223732B (xx) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5665134A (en) * | 1995-06-07 | 1997-09-09 | Hughes Missile Systems Company | Laser machining of glass-ceramic materials |
EP0787558B1 (en) * | 1995-08-24 | 2001-12-19 | Kabushiki Kaisha Toshiba | Method of manufacturing reflector |
US5955776A (en) | 1996-12-04 | 1999-09-21 | Ball Semiconductor, Inc. | Spherical shaped semiconductor integrated circuit |
US5934965A (en) * | 1997-04-11 | 1999-08-10 | Hughes Electronics Corporation | Apertured nonplanar electrodes and forming methods |
TW420853B (en) * | 1998-07-10 | 2001-02-01 | Siemens Ag | Method of manufacturing the wiring with electric conducting interconnect between the over-side and the underside of the substrate and the wiring with such interconnect |
US6071315A (en) * | 1998-07-10 | 2000-06-06 | Ball Semiconductor, Inc. | Two-dimensional to three-dimensional VLSI design |
FR2782885B1 (fr) * | 1998-08-25 | 2000-11-10 | Gemplus Card Int | Procede de fabrication d'une antenne pour un support d'informations comportant un circuit electronique |
US6388230B1 (en) | 1999-10-13 | 2002-05-14 | Morton International, Inc. | Laser imaging of thin layer electronic circuitry material |
DE10106399C1 (de) * | 2001-02-12 | 2002-09-05 | Siemens Ag | Verfahren zur Herstellung von Schaltungsträgern mit groben Leiterstrukturen und mindestens einem Bereich mit feinen Leiterstrukturen |
JP4274784B2 (ja) * | 2002-05-28 | 2009-06-10 | 新光電気工業株式会社 | 配線形成システムおよびその方法 |
US6988342B2 (en) | 2003-01-17 | 2006-01-24 | Masonite Corporation | Door skin, a method of etching a plate for forming a wood grain pattern in the door skin, and an etched plate formed therefrom |
US7959817B2 (en) | 2004-01-09 | 2011-06-14 | Masonite Corporation | Door skin, a method of etching a plate, and an etched plate formed therefrom |
US7161552B2 (en) * | 2003-08-08 | 2007-01-09 | Lockheed Martin Corporation | Electromagnetic interference protection for radomes |
JP2005181958A (ja) * | 2003-12-22 | 2005-07-07 | Rohm & Haas Electronic Materials Llc | レーザーアブレーションを用いる電子部品および光学部品の形成方法 |
JP4784115B2 (ja) * | 2005-03-15 | 2011-10-05 | 横浜ゴム株式会社 | レドーム |
US8290239B2 (en) * | 2005-10-21 | 2012-10-16 | Orbotech Ltd. | Automatic repair of electric circuits |
US7867688B2 (en) * | 2006-05-30 | 2011-01-11 | Eastman Kodak Company | Laser ablation resist |
US7879685B2 (en) * | 2006-08-04 | 2011-02-01 | Solyndra, Inc. | System and method for creating electric isolation between layers comprising solar cells |
US20080090396A1 (en) * | 2006-10-06 | 2008-04-17 | Semiconductor Energy Laboratory Co., Ltd. | Light exposure apparatus and method for making semiconductor device formed using the same |
US20080216304A1 (en) * | 2007-03-06 | 2008-09-11 | Chien Ming Lin | Method of manufacturing antenna module by laser carving |
ATE523286T1 (de) * | 2007-10-11 | 2011-09-15 | Raytheon Co | System, code und verfahren zum bilden von mustern auf einer mehrfach gekrümmten fläche unter verwendung eines profilometers, strukturierungswerkzeug und musterbildungswerkzeug |
JP5337432B2 (ja) | 2007-11-30 | 2013-11-06 | 株式会社エヌ・ティ・ティ・ドコモ | 無線通信システム |
CN102694269B (zh) * | 2012-04-13 | 2015-11-04 | 深圳光启创新技术有限公司 | 超材料人工微结构的制造方法和超材料天线罩及其制造方法 |
WO2014079298A1 (zh) | 2012-11-20 | 2014-05-30 | 深圳光启创新技术有限公司 | 超材料、超材料的制备方法及超材料的设计方法 |
JP6142522B2 (ja) * | 2012-12-20 | 2017-06-07 | 横浜ゴム株式会社 | 周波数選択部材および曲面への周波数選択素子の配列決定方法 |
US9427909B2 (en) | 2013-03-15 | 2016-08-30 | Ii-Vi Incorporated | Method of generating patterns on doubly-curved surfaces |
JP6186016B2 (ja) | 2013-04-04 | 2017-08-23 | エル・ピー・ケー・エフ・レーザー・ウント・エレクトロニクス・アクチエンゲゼルシヤフト | 基板に貫通穴を開ける方法及び装置 |
CN106033837A (zh) * | 2015-03-20 | 2016-10-19 | 深圳光启高等理工研究院 | 曲面基体超材料及其制造方法 |
DE102017006362A1 (de) * | 2017-07-05 | 2019-01-10 | Mbda Deutschland Gmbh | Verfahren zur Herstellung eines Flugkörpersystembauteils, insbesondere Lenkflugkörperbauteils, Flugkörpersystembauteil, insbesondere Lenkflugkörperbauteil und Flugkörpersystemanordnung |
JP7013834B2 (ja) * | 2017-12-13 | 2022-02-01 | 中国電力株式会社 | 異常点検装置 |
CN108933335B (zh) * | 2018-08-18 | 2020-12-22 | 南昌大学 | 一种调控雷达吸波材料吸收频率的新方法 |
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US3220331A (en) * | 1965-01-27 | 1965-11-30 | Kulicke And Soffa Mfg Company | Contact printing mask alignment apparatus for semiconductor wafer geometry |
US3591285A (en) * | 1967-09-13 | 1971-07-06 | Nihom Kykumen Insatsuki Kk | Method and apparatus for photo printing on curved surface article |
US3578862A (en) * | 1968-10-07 | 1971-05-18 | Time Inc | Photographic exposing apparatus |
US3649394A (en) * | 1969-04-03 | 1972-03-14 | Hughes Aircraft Co | 3-dimensional cone antenna method |
US3694080A (en) * | 1970-03-09 | 1972-09-26 | Massachusetts Inst Technology | Method of and apparatus for photoprinting conductor patterns on the curved surfaces of transducers |
US3815993A (en) * | 1972-02-15 | 1974-06-11 | M Tarabocchia | Light projection apparatus and method for photoprinting |
FR2214934B1 (xx) * | 1973-01-18 | 1978-03-24 | Thomson Csf | |
US3988066A (en) * | 1974-01-12 | 1976-10-26 | Canon Kabushiki Kaisha | Light exposure apparatus for printing |
US4102734A (en) * | 1976-10-05 | 1978-07-25 | Mbi, Inc. | Method for producing a design on an arcuate surface |
US4587205A (en) * | 1984-04-05 | 1986-05-06 | The United States Of America As Represented By The United States Department Of Energy | Method of using polysilane positive photoresist materials |
US4588801A (en) * | 1984-04-05 | 1986-05-13 | The United States Of America As Represented By The United States Department Of Energy | Polysilane positive photoresist materials and methods for their use |
GB8531830D0 (en) * | 1985-12-30 | 1986-02-05 | Davies H J | Photo fabrication |
FR2598339B1 (fr) * | 1986-05-06 | 1990-12-14 | Europ Agence Spatiale | Antennes a reflecteurs paraboliques et leur procede d'obtention |
IT1195120B (it) * | 1986-08-04 | 1988-10-12 | Cselt Centro Studi Lab Telecom | Procedimento per la fabbricazione di strutture dicroiche d antenna |
DE3860511D1 (de) * | 1987-04-24 | 1990-10-04 | Siemens Ag | Verfahren zur herstellung von leiterplatten. |
US4842677A (en) * | 1988-02-05 | 1989-06-27 | General Electric Company | Excimer laser patterning of a novel resist using masked and maskless process steps |
US4780177A (en) * | 1988-02-05 | 1988-10-25 | General Electric Company | Excimer laser patterning of a novel resist |
US4999277A (en) * | 1988-02-22 | 1991-03-12 | Trw Inc. | Production of precision patterns on curved surfaces |
FR2639567B1 (fr) * | 1988-11-25 | 1991-01-25 | France Etat | Machine a microfaisceau laser d'intervention sur des objets a couche mince, en particulier pour la gravure ou le depot de matiere par voie chimique en presence d'un gaz reactif |
US4940881A (en) * | 1989-09-28 | 1990-07-10 | Tamarack Scientific Co., Inc. | Method and apparatus for effecting selective ablation of a coating from a substrate, and controlling the wall angle of coating edge portions |
US5106455A (en) * | 1991-01-28 | 1992-04-21 | Sarcos Group | Method and apparatus for fabrication of micro-structures using non-planar, exposure beam lithography |
-
1993
- 1993-06-07 IL IL10592593A patent/IL105925A/xx not_active IP Right Cessation
- 1993-06-14 EP EP93109454A patent/EP0575848B1/en not_active Expired - Lifetime
- 1993-06-14 DE DE69306178T patent/DE69306178T2/de not_active Expired - Fee Related
- 1993-06-21 JP JP5148754A patent/JPH06226477A/ja active Pending
- 1993-07-19 TW TW082105719A patent/TW223732B/zh active
-
1994
- 1994-02-07 US US08/193,660 patent/US5472828A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TW223732B (xx) | 1994-05-11 |
IL105925A0 (en) | 1993-10-20 |
US5472828A (en) | 1995-12-05 |
DE69306178D1 (de) | 1997-01-09 |
EP0575848A2 (en) | 1993-12-29 |
JPH06226477A (ja) | 1994-08-16 |
EP0575848A3 (en) | 1994-09-07 |
EP0575848B1 (en) | 1996-11-27 |
DE69306178T2 (de) | 1997-03-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FF | Patent granted | ||
KB | Patent renewed | ||
KB | Patent renewed | ||
RH1 | Patent not in force |