IL104001A - Device and method for measuring the thickness of thin membranes - Google Patents
Device and method for measuring the thickness of thin membranesInfo
- Publication number
- IL104001A IL104001A IL10400192A IL10400192A IL104001A IL 104001 A IL104001 A IL 104001A IL 10400192 A IL10400192 A IL 10400192A IL 10400192 A IL10400192 A IL 10400192A IL 104001 A IL104001 A IL 104001A
- Authority
- IL
- Israel
- Prior art keywords
- layer
- thickness
- radiation
- reflected
- wafer
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 38
- 239000010409 thin film Substances 0.000 title claims description 11
- 239000010703 silicon Substances 0.000 claims description 32
- 229910052710 silicon Inorganic materials 0.000 claims description 31
- 239000000463 material Substances 0.000 claims description 23
- 230000003287 optical effect Effects 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 10
- 239000000945 filler Substances 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 2
- 230000005855 radiation Effects 0.000 claims 32
- 230000001678 irradiating effect Effects 0.000 claims 17
- 238000001914 filtration Methods 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 90
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 29
- 239000010408 film Substances 0.000 description 12
- 230000003595 spectral effect Effects 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 238000005259 measurement Methods 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 230000003993 interaction Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 230000001427 coherent effect Effects 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000013507 mapping Methods 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 230000005226 mechanical processes and functions Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 238000012634 optical imaging Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/804,872 US5333049A (en) | 1991-12-06 | 1991-12-06 | Apparatus and method for interferometrically measuring the thickness of thin films using full aperture irradiation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IL104001A0 IL104001A0 (en) | 1993-05-13 |
| IL104001A true IL104001A (en) | 1995-01-24 |
Family
ID=25190073
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL10400192A IL104001A (en) | 1991-12-06 | 1992-12-06 | Device and method for measuring the thickness of thin membranes |
Country Status (7)
Families Citing this family (56)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5956355A (en) * | 1991-04-29 | 1999-09-21 | Massachusetts Institute Of Technology | Method and apparatus for performing optical measurements using a rapidly frequency-tuned laser |
| IL109589A0 (en) * | 1993-05-14 | 1994-08-26 | Hughes Aircraft Co | Apparatus and method for performing high spatial resolution thin film layer thickness metrology |
| US5452953A (en) * | 1993-10-12 | 1995-09-26 | Hughes Aircraft Company | Film thickness measurement of structures containing a scattering surface |
| US5471303A (en) * | 1994-04-29 | 1995-11-28 | Wyko Corporation | Combination of white-light scanning and phase-shifting interferometry for surface profile measurements |
| US5515167A (en) | 1994-09-13 | 1996-05-07 | Hughes Aircraft Company | Transparent optical chuck incorporating optical monitoring |
| US5563709A (en) * | 1994-09-13 | 1996-10-08 | Integrated Process Equipment Corp. | Apparatus for measuring, thinning and flattening silicon structures |
| US5555474A (en) * | 1994-12-21 | 1996-09-10 | Integrated Process Equipment Corp. | Automatic rejection of diffraction effects in thin film metrology |
| US5729343A (en) * | 1995-11-16 | 1998-03-17 | Nikon Precision Inc. | Film thickness measurement apparatus with tilting stage and method of operation |
| US5640242A (en) * | 1996-01-31 | 1997-06-17 | International Business Machines Corporation | Assembly and method for making in process thin film thickness measurments |
| KR20000016177A (ko) * | 1996-05-31 | 2000-03-25 | 브룬닝 존 에이치. | 반도체 웨이퍼의 두께 변화를 측정하는 간섭계 |
| GB9616853D0 (en) | 1996-08-10 | 1996-09-25 | Vorgem Limited | An improved thickness monitor |
| US5717490A (en) * | 1996-10-17 | 1998-02-10 | Lsi Logic Corporation | Method for identifying order skipping in spectroreflective film measurement equipment |
| US6184974B1 (en) * | 1999-07-01 | 2001-02-06 | Wavefront Sciences, Inc. | Apparatus and method for evaluating a target larger than a measuring aperture of a sensor |
| US6624896B1 (en) * | 1999-10-18 | 2003-09-23 | Wavefront Sciences, Inc. | System and method for metrology of surface flatness and surface nanotopology of materials |
| RU2198379C2 (ru) * | 2000-05-03 | 2003-02-10 | Олейников Анатолий Александрович | Оптический микроинтерферометр |
| US7151609B2 (en) * | 2000-07-06 | 2006-12-19 | Filmetrics, Inc. | Determining wafer orientation in spectral imaging |
| US7255833B2 (en) | 2000-07-25 | 2007-08-14 | Cepheid | Apparatus and reaction vessel for controlling the temperature of a sample |
| US7286242B2 (en) * | 2001-09-21 | 2007-10-23 | Kmac | Apparatus for measuring characteristics of thin film by means of two-dimensional detector and method of measuring the same |
| IL150438A0 (en) * | 2002-06-26 | 2002-12-01 | Nova Measuring Instr Ltd | Method of thin films measurement |
| WO2005038877A2 (en) * | 2003-10-14 | 2005-04-28 | Rudolph Technologies, Inc. | MOLECULAR AIRBORNE CONTAMINANTS (MACs) REMOVAL AND WAFER SURFACE SUSTAINING SYSTEM AND METHOD |
| US20050112853A1 (en) * | 2003-11-26 | 2005-05-26 | Raymond Kuzbyt | System and method for non-destructive implantation characterization of quiescent material |
| KR100984697B1 (ko) * | 2003-12-24 | 2010-10-01 | 동부일렉트로닉스 주식회사 | 웨이퍼의 필름 두께 측정 시스템의 레퍼런스 블록 |
| WO2006078471A2 (en) * | 2005-01-07 | 2006-07-27 | Filmetrics, Inc. | Determining wafer orientation in spectral imaging |
| JP2009532668A (ja) * | 2006-03-30 | 2009-09-10 | オーボテック リミテッド | 連続する角度範囲に渡って選択可能な照明を利用する検査システム |
| AU2007235239B2 (en) * | 2006-04-07 | 2013-01-17 | Amo Wavefront Sciences, Llc | Geometric measurement system and method of measuring a geometric characteristic of an object |
| JP5444823B2 (ja) * | 2009-05-01 | 2014-03-19 | 信越半導体株式会社 | Ｓｏｉウェーハの検査方法 |
| RU2523773C2 (ru) | 2009-05-13 | 2014-07-20 | СиО2 Медикал Продактс, Инк., | Способ по выделению газа для инспектирования поверхности с покрытием |
| US9545360B2 (en) | 2009-05-13 | 2017-01-17 | Sio2 Medical Products, Inc. | Saccharide protective coating for pharmaceutical package |
| US7985188B2 (en) * | 2009-05-13 | 2011-07-26 | Cv Holdings Llc | Vessel, coating, inspection and processing apparatus |
| US9458536B2 (en) | 2009-07-02 | 2016-10-04 | Sio2 Medical Products, Inc. | PECVD coating methods for capped syringes, cartridges and other articles |
| JP5387451B2 (ja) * | 2010-03-04 | 2014-01-15 | 信越半導体株式会社 | Ｓｏｉウェーハの設計方法及び製造方法 |
| US11624115B2 (en) | 2010-05-12 | 2023-04-11 | Sio2 Medical Products, Inc. | Syringe with PECVD lubrication |
| JP5365581B2 (ja) * | 2010-05-28 | 2013-12-11 | 信越半導体株式会社 | 薄膜付ウェーハの評価方法 |
| US9878101B2 (en) | 2010-11-12 | 2018-01-30 | Sio2 Medical Products, Inc. | Cyclic olefin polymer vessels and vessel coating methods |
| US9272095B2 (en) | 2011-04-01 | 2016-03-01 | Sio2 Medical Products, Inc. | Vessels, contact surfaces, and coating and inspection apparatus and methods |
| US11116695B2 (en) | 2011-11-11 | 2021-09-14 | Sio2 Medical Products, Inc. | Blood sample collection tube |
| JP6095678B2 (ja) | 2011-11-11 | 2017-03-15 | エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド | 薬剤パッケージ用の不動態化、ｐＨ保護又は滑性皮膜、被覆プロセス及び装置 |
| US9554968B2 (en) | 2013-03-11 | 2017-01-31 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging |
| US20150297800A1 (en) | 2012-07-03 | 2015-10-22 | Sio2 Medical Products, Inc. | SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS |
| CN104854257B (zh) | 2012-11-01 | 2018-04-13 | Sio2医药产品公司 | 涂层检查方法 |
| WO2014078666A1 (en) | 2012-11-16 | 2014-05-22 | Sio2 Medical Products, Inc. | Method and apparatus for detecting rapid barrier coating integrity characteristics |
| AU2013352436B2 (en) | 2012-11-30 | 2018-10-25 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like |
| US9764093B2 (en) | 2012-11-30 | 2017-09-19 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition |
| WO2014134577A1 (en) | 2013-03-01 | 2014-09-04 | Sio2 Medical Products, Inc. | Plasma or cvd pre-treatment for lubricated pharmaceutical package, coating process and apparatus |
| US9937099B2 (en) | 2013-03-11 | 2018-04-10 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging with low oxygen transmission rate |
| US9863042B2 (en) | 2013-03-15 | 2018-01-09 | Sio2 Medical Products, Inc. | PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases |
| JP6107353B2 (ja) * | 2013-04-12 | 2017-04-05 | 株式会社島津製作所 | 表面処理状況モニタリング装置 |
| WO2015148471A1 (en) | 2014-03-28 | 2015-10-01 | Sio2 Medical Products, Inc. | Antistatic coatings for plastic vessels |
| US10132612B2 (en) | 2015-07-30 | 2018-11-20 | Hseb Dresden Gmbh | Method and assembly for determining the thickness of a layer in a sample stack |
| EP3124912B1 (en) | 2015-07-30 | 2019-01-16 | Unity Semiconductor GmbH | Method and assembly for determining the thickness of a layer in a stack of layers |
| BR112018003051B1 (pt) | 2015-08-18 | 2022-12-06 | Sio2 Medical Products, Inc | Tubo de coleta de sangue submetido a vácuo |
| TWI600876B (zh) | 2015-11-23 | 2017-10-01 | 財團法人工業技術研究院 | 量測系統 |
| US10563973B2 (en) * | 2016-03-28 | 2020-02-18 | Kla-Tencor Corporation | All surface film metrology system |
| CN112461838B (zh) * | 2019-09-09 | 2023-03-10 | 芯恩（青岛）集成电路有限公司 | 晶圆缺陷检测装置及方法 |
| DE102020100565A1 (de) | 2020-01-13 | 2021-07-15 | Aixtron Se | Verfahren zum Abscheiden von Schichten |
| CN112697080A (zh) * | 2020-12-16 | 2021-04-23 | 长江存储科技有限责任公司 | 薄膜层厚度的测量方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5031852A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1973-07-20 | 1975-03-28 | ||
| JPS5245455U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1975-09-27 | 1977-03-31 | ||
| JPS5535214A (en) * | 1978-09-04 | 1980-03-12 | Asahi Chem Ind Co Ltd | Method and device for film-thickness measurement making use of infrared-ray interference |
| JPS6175203A (ja) * | 1984-09-20 | 1986-04-17 | Oak Seisakusho:Kk | 膜厚測定装置 |
| JPS6176904A (ja) * | 1984-09-21 | 1986-04-19 | Oak Seisakusho:Kk | 膜厚測定方法 |
| JPS6453101A (en) * | 1987-05-25 | 1989-03-01 | Kurashiki Boseki Kk | Equal tilt angle interference type film thickness gauge |
| US4909631A (en) * | 1987-12-18 | 1990-03-20 | Tan Raul Y | Method for film thickness and refractive index determination |
| JPH01206203A (ja) * | 1988-02-12 | 1989-08-18 | Toshiba Corp | 膜厚不良検査方法 |
| US5042949A (en) * | 1989-03-17 | 1991-08-27 | Greenberg Jeffrey S | Optical profiler for films and substrates |
-
1991
- 1991-12-06 US US07/804,872 patent/US5333049A/en not_active Expired - Lifetime
-
1992
- 1992-12-05 KR KR1019920023425A patent/KR960013677B1/ko not_active Expired - Lifetime
- 1992-12-06 IL IL10400192A patent/IL104001A/en not_active IP Right Cessation
- 1992-12-07 JP JP4327018A patent/JP2788158B2/ja not_active Expired - Lifetime
- 1992-12-07 EP EP92311118A patent/EP0545738B1/en not_active Expired - Lifetime
- 1992-12-07 DE DE69225117T patent/DE69225117T2/de not_active Expired - Lifetime
- 1992-12-24 TW TW081110366A patent/TW244391B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| US5333049A (en) | 1994-07-26 |
| IL104001A0 (en) | 1993-05-13 |
| DE69225117D1 (de) | 1998-05-20 |
| EP0545738A2 (en) | 1993-06-09 |
| DE69225117T2 (de) | 1998-08-06 |
| EP0545738A3 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1994-01-05 |
| KR960013677B1 (ko) | 1996-10-10 |
| EP0545738B1 (en) | 1998-04-15 |
| KR930013681A (ko) | 1993-07-22 |
| JP2788158B2 (ja) | 1998-08-20 |
| TW244391B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1995-04-01 |
| JPH05248825A (ja) | 1993-09-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| HP | Change in proprietorship | ||
| KB | Patent renewed | ||
| MM9K | Patent not in force due to non-payment of renewal fees |