IE53197B1 - Isolation valve - Google Patents
Isolation valveInfo
- Publication number
- IE53197B1 IE53197B1 IE363/82A IE36382A IE53197B1 IE 53197 B1 IE53197 B1 IE 53197B1 IE 363/82 A IE363/82 A IE 363/82A IE 36382 A IE36382 A IE 36382A IE 53197 B1 IE53197 B1 IE 53197B1
- Authority
- IE
- Ireland
- Prior art keywords
- chamber
- inert gas
- substrate
- groove
- plasma
- Prior art date
Links
- 238000002955 isolation Methods 0.000 title description 3
- 239000007789 gas Substances 0.000 claims abstract description 65
- 239000011261 inert gas Substances 0.000 claims abstract description 33
- 239000000758 substrate Substances 0.000 claims description 83
- 239000000463 material Substances 0.000 claims description 32
- 239000000126 substance Substances 0.000 claims description 5
- 239000000314 lubricant Substances 0.000 claims description 2
- 230000008021 deposition Effects 0.000 abstract description 33
- 238000006243 chemical reaction Methods 0.000 abstract description 13
- 239000000376 reactant Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 40
- 210000002381 plasma Anatomy 0.000 description 38
- 238000000151 deposition Methods 0.000 description 36
- 239000012495 reaction gas Substances 0.000 description 24
- 239000004065 semiconductor Substances 0.000 description 19
- 238000000034 method Methods 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 12
- 230000008569 process Effects 0.000 description 9
- 238000012545 processing Methods 0.000 description 9
- 210000004027 cell Anatomy 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- 238000009826 distribution Methods 0.000 description 5
- 239000002019 doping agent Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 230000005684 electric field Effects 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 230000001105 regulatory effect Effects 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000005137 deposition process Methods 0.000 description 4
- 230000002349 favourable effect Effects 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000000873 masking effect Effects 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000010924 continuous production Methods 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000002178 crystalline material Substances 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 229910001092 metal group alloy Inorganic materials 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910004014 SiF4 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000012864 cross contamination Methods 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- JCYWCSGERIELPG-UHFFFAOYSA-N imes Chemical class CC1=CC(C)=CC(C)=C1N1C=CN(C=2C(=CC(C)=CC=2C)C)[C]1 JCYWCSGERIELPG-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000005424 photoluminescence Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 238000000985 reflectance spectrum Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000009718 spray deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16J—PISTONS; CYLINDERS; SEALINGS
- F16J15/00—Sealings
- F16J15/16—Sealings between relatively-moving surfaces
- F16J15/168—Sealings between relatively-moving surfaces which permits material to be continuously conveyed
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Photovoltaic Devices (AREA)
- Drying Of Semiconductors (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US24438581A | 1981-03-16 | 1981-03-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IE820363L IE820363L (en) | 1982-09-16 |
| IE53197B1 true IE53197B1 (en) | 1988-08-31 |
Family
ID=22922517
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IE363/82A IE53197B1 (en) | 1981-03-16 | 1982-02-22 | Isolation valve |
Country Status (12)
| Country | Link |
|---|---|
| EP (1) | EP0060626B1 (enExample) |
| JP (2) | JPS57162328A (enExample) |
| AU (1) | AU551636B2 (enExample) |
| BR (1) | BR8201432A (enExample) |
| CA (1) | CA1191107A (enExample) |
| DE (1) | DE3272799D1 (enExample) |
| IE (1) | IE53197B1 (enExample) |
| IL (1) | IL65262A0 (enExample) |
| IN (1) | IN157921B (enExample) |
| MX (1) | MX156022A (enExample) |
| PH (1) | PH19752A (enExample) |
| ZA (1) | ZA821325B (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4450786A (en) * | 1982-08-13 | 1984-05-29 | Energy Conversion Devices, Inc. | Grooved gas gate |
| US4480585A (en) * | 1983-06-23 | 1984-11-06 | Energy Conversion Devices, Inc. | External isolation module |
| DE3901096C2 (de) * | 1988-01-14 | 1993-09-30 | Hitachi Koki Kk | Vorrichtung zum Laden mindestens einer wiederaufladbaren Batterie |
| CH683662B5 (fr) * | 1990-05-22 | 1994-10-31 | Preci Coat Sa | Procédé de traitement en continu d'un matériau allongé dans une enceinte de traitement, et dispositif pour la mise en oeuvre de ce procédé. |
| DE19857201A1 (de) * | 1998-12-11 | 2000-06-15 | Leybold Systems Gmbh | Schleusenventil |
| EP1518941A1 (en) | 2003-09-24 | 2005-03-30 | Sidmar N.V. | A method and apparatus for the production of metal coated steel products |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3658304A (en) * | 1970-05-11 | 1972-04-25 | Anchor Hocking Corp | Means for vapor coating |
| GB1342972A (en) * | 1971-08-28 | 1974-01-10 | Wildt Mellor Bromley Ltd | Knitting machine needle |
| US3785853A (en) * | 1972-05-24 | 1974-01-15 | Unicorp Inc | Continuous deposition reactor |
| JPS5233895B2 (enExample) * | 1972-06-07 | 1977-08-31 | ||
| FR2307202A1 (fr) * | 1975-04-07 | 1976-11-05 | Sogeme | Dispositif d'etancheite separant deux enceintes entre lesquelles circule un materiau en continu |
| DE2638269C2 (de) * | 1976-08-25 | 1983-05-26 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen | Verfahren zur Herstellung von substratgebundenem, großflächigem Silicium |
| JPS53105366A (en) * | 1977-02-25 | 1978-09-13 | Hitachi Ltd | Manufacture for semiconductor element substrate |
| US4148196A (en) * | 1977-04-25 | 1979-04-10 | Sciex Inc. | Multiple stage cryogenic pump and method of pumping |
| FR2409428A1 (fr) * | 1977-11-19 | 1979-06-15 | Dornier Gmbh Lindauer | Dispositif d'etancheite destine a empecher des gaz oxydants, explosifs ou toxiques de s'echapper d'un tunnel de traitement d'une matiere en bande |
-
1982
- 1982-02-22 CA CA000396699A patent/CA1191107A/en not_active Expired
- 1982-02-22 IE IE363/82A patent/IE53197B1/en not_active IP Right Cessation
- 1982-02-23 EP EP82300918A patent/EP0060626B1/en not_active Expired
- 1982-02-23 DE DE8282300918T patent/DE3272799D1/de not_active Expired
- 1982-03-01 IN IN232/CAL/82A patent/IN157921B/en unknown
- 1982-03-01 ZA ZA821325A patent/ZA821325B/xx unknown
- 1982-03-02 PH PH26934A patent/PH19752A/en unknown
- 1982-03-11 MX MX191770A patent/MX156022A/es unknown
- 1982-03-15 JP JP57040659A patent/JPS57162328A/ja active Pending
- 1982-03-16 AU AU81544/82A patent/AU551636B2/en not_active Expired
- 1982-03-16 BR BR8201432A patent/BR8201432A/pt unknown
- 1982-03-16 IL IL65262A patent/IL65262A0/xx unknown
-
1989
- 1989-04-05 JP JP1086699A patent/JPH0618177B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02216819A (ja) | 1990-08-29 |
| CA1191107A (en) | 1985-07-30 |
| EP0060626A2 (en) | 1982-09-22 |
| IE820363L (en) | 1982-09-16 |
| JPS57162328A (en) | 1982-10-06 |
| PH19752A (en) | 1986-06-26 |
| EP0060626B1 (en) | 1986-08-27 |
| AU551636B2 (en) | 1986-05-08 |
| IN157921B (enExample) | 1986-07-26 |
| JPH0618177B2 (ja) | 1994-03-09 |
| BR8201432A (pt) | 1983-02-01 |
| AU8154482A (en) | 1982-11-04 |
| DE3272799D1 (en) | 1986-10-02 |
| IL65262A0 (en) | 1982-05-31 |
| MX156022A (es) | 1988-06-16 |
| ZA821325B (en) | 1983-02-23 |
| EP0060626A3 (en) | 1983-01-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Patent lapsed |