MX156022A - Mejoras en aparato de deposicion para la produccion en serie de materiales semiconductores amorfos - Google Patents

Mejoras en aparato de deposicion para la produccion en serie de materiales semiconductores amorfos

Info

Publication number
MX156022A
MX156022A MX191770A MX19177082A MX156022A MX 156022 A MX156022 A MX 156022A MX 191770 A MX191770 A MX 191770A MX 19177082 A MX19177082 A MX 19177082A MX 156022 A MX156022 A MX 156022A
Authority
MX
Mexico
Prior art keywords
semiconducting materials
serial production
deposit apparatus
amorphous semiconducting
amorphous
Prior art date
Application number
MX191770A
Other languages
English (en)
Inventor
David A Gattuso
Masatsugu Izu
Original Assignee
Energy Conversion Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Energy Conversion Devices Inc filed Critical Energy Conversion Devices Inc
Publication of MX156022A publication Critical patent/MX156022A/es

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J15/00—Sealings
    • F16J15/16—Sealings between relatively-moving surfaces
    • F16J15/168—Sealings between relatively-moving surfaces which permits material to be continuously conveyed
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Photovoltaic Devices (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
MX191770A 1981-03-16 1982-03-11 Mejoras en aparato de deposicion para la produccion en serie de materiales semiconductores amorfos MX156022A (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US24438581A 1981-03-16 1981-03-16

Publications (1)

Publication Number Publication Date
MX156022A true MX156022A (es) 1988-06-16

Family

ID=22922517

Family Applications (1)

Application Number Title Priority Date Filing Date
MX191770A MX156022A (es) 1981-03-16 1982-03-11 Mejoras en aparato de deposicion para la produccion en serie de materiales semiconductores amorfos

Country Status (12)

Country Link
EP (1) EP0060626B1 (es)
JP (2) JPS57162328A (es)
AU (1) AU551636B2 (es)
BR (1) BR8201432A (es)
CA (1) CA1191107A (es)
DE (1) DE3272799D1 (es)
IE (1) IE53197B1 (es)
IL (1) IL65262A0 (es)
IN (1) IN157921B (es)
MX (1) MX156022A (es)
PH (1) PH19752A (es)
ZA (1) ZA821325B (es)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4450786A (en) * 1982-08-13 1984-05-29 Energy Conversion Devices, Inc. Grooved gas gate
US4480585A (en) * 1983-06-23 1984-11-06 Energy Conversion Devices, Inc. External isolation module
DE3901096C2 (de) * 1988-01-14 1993-09-30 Hitachi Koki Kk Vorrichtung zum Laden mindestens einer wiederaufladbaren Batterie
CH683662B5 (fr) * 1990-05-22 1994-10-31 Preci Coat Sa Procédé de traitement en continu d'un matériau allongé dans une enceinte de traitement, et dispositif pour la mise en oeuvre de ce procédé.
DE19857201A1 (de) 1998-12-11 2000-06-15 Leybold Systems Gmbh Schleusenventil
EP1518941A1 (en) * 2003-09-24 2005-03-30 Sidmar N.V. A method and apparatus for the production of metal coated steel products

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3658304A (en) * 1970-05-11 1972-04-25 Anchor Hocking Corp Means for vapor coating
GB1342972A (en) * 1971-08-28 1974-01-10 Wildt Mellor Bromley Ltd Knitting machine needle
US3785853A (en) * 1972-05-24 1974-01-15 Unicorp Inc Continuous deposition reactor
JPS5233895B2 (es) * 1972-06-07 1977-08-31
FR2307202A1 (fr) * 1975-04-07 1976-11-05 Sogeme Dispositif d'etancheite separant deux enceintes entre lesquelles circule un materiau en continu
DE2638269C2 (de) * 1976-08-25 1983-05-26 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zur Herstellung von substratgebundenem, großflächigem Silicium
JPS53105366A (en) * 1977-02-25 1978-09-13 Hitachi Ltd Manufacture for semiconductor element substrate
US4148196A (en) * 1977-04-25 1979-04-10 Sciex Inc. Multiple stage cryogenic pump and method of pumping
FR2409428A1 (fr) * 1977-11-19 1979-06-15 Dornier Gmbh Lindauer Dispositif d'etancheite destine a empecher des gaz oxydants, explosifs ou toxiques de s'echapper d'un tunnel de traitement d'une matiere en bande

Also Published As

Publication number Publication date
EP0060626A2 (en) 1982-09-22
IE820363L (en) 1982-09-16
EP0060626A3 (en) 1983-01-26
JPH0618177B2 (ja) 1994-03-09
IL65262A0 (en) 1982-05-31
JPH02216819A (ja) 1990-08-29
AU8154482A (en) 1982-11-04
DE3272799D1 (en) 1986-10-02
ZA821325B (en) 1983-02-23
CA1191107A (en) 1985-07-30
JPS57162328A (en) 1982-10-06
IN157921B (es) 1986-07-26
IE53197B1 (en) 1988-08-31
PH19752A (en) 1986-06-26
EP0060626B1 (en) 1986-08-27
BR8201432A (pt) 1983-02-01
AU551636B2 (en) 1986-05-08

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