IE39122B1 - Production of citric acid - Google Patents

Production of citric acid

Info

Publication number
IE39122B1
IE39122B1 IE00753/74A IE75374A IE39122B1 IE 39122 B1 IE39122 B1 IE 39122B1 IE 00753/74 A IE00753/74 A IE 00753/74A IE 75374 A IE75374 A IE 75374A IE 39122 B1 IE39122 B1 IE 39122B1
Authority
IE
Ireland
Prior art keywords
contact hole
metal
layer
metal layer
mask material
Prior art date
Application number
IE00753/74A
Other versions
IE39122L (en
Original Assignee
Pfizer
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pfizer filed Critical Pfizer
Publication of IE39122L publication Critical patent/IE39122L/en
Publication of IE39122B1 publication Critical patent/IE39122B1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
    • C12P—FERMENTATION OR ENZYME-USING PROCESSES TO SYNTHESISE A DESIRED CHEMICAL COMPOUND OR COMPOSITION OR TO SEPARATE OPTICAL ISOMERS FROM A RACEMIC MIXTURE
    • C12P7/00—Preparation of oxygen-containing organic compounds
    • C12P7/40—Preparation of oxygen-containing organic compounds containing a carboxyl group including Peroxycarboxylic acids
    • C12P7/44—Polycarboxylic acids
    • C12P7/48—Tricarboxylic acids, e.g. citric acid
    • C—CHEMISTRY; METALLURGY
    • C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
    • C12N—MICROORGANISMS OR ENZYMES; COMPOSITIONS THEREOF; PROPAGATING, PRESERVING, OR MAINTAINING MICROORGANISMS; MUTATION OR GENETIC ENGINEERING; CULTURE MEDIA
    • C12N1/00—Microorganisms, e.g. protozoa; Compositions thereof; Processes of propagating, maintaining or preserving microorganisms or compositions thereof; Processes of preparing or isolating a composition containing a microorganism; Culture media therefor
    • C12N1/14—Fungi; Culture media therefor
    • C12N1/16—Yeasts; Culture media therefor

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Zoology (AREA)
  • Health & Medical Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Genetics & Genomics (AREA)
  • Bioinformatics & Cheminformatics (AREA)
  • Biotechnology (AREA)
  • Biochemistry (AREA)
  • Mycology (AREA)
  • General Health & Medical Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Microbiology (AREA)
  • Medicinal Chemistry (AREA)
  • Botany (AREA)
  • Tropical Medicine & Parasitology (AREA)
  • Biomedical Technology (AREA)
  • Virology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Preparation Of Compounds By Using Micro-Organisms (AREA)

Abstract

PURPOSE: To maintain insulating property of a base metal consisting of polyimide and eliminate defective wirings of a semiconductor device by offering a manufacturing method for eliminating only a mask material in such a case that polyimde and mask material such as resist are used together. CONSTITUTION: The method comprises the steps of flattening the surface of a substrate 1 which has generated stepped areas with a wiring metal 2 using a polyimide layer 3, forming a metal layer 4 connected with the wiring metal 2 by burying a contact hole 3c with at least two kinds of layered metal materials, forming a mask material 5 on the upper surface of the metal layer 4 on the contact hole 3c, removing an upper layer 4b of a metal layer 4 arranged in the periphery of the contact hole 3c by the ion milling method, and removing the lower layer 4a of the metal layer 4 arranged in the periphery of the contact hole 3c by the anisotropic etching method with the metal layer 4 on the contact hole 3c used as the mask after the mask material 5 is removed by the ashing method[JPS5013585A]
IE00753/74A 1973-04-30 1974-04-08 Production of citric acid IE39122B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US35589473A 1973-04-30 1973-04-30

Publications (2)

Publication Number Publication Date
IE39122L IE39122L (en) 1974-10-30
IE39122B1 true IE39122B1 (en) 1978-08-02

Family

ID=23399243

Family Applications (1)

Application Number Title Priority Date Filing Date
IE00753/74A IE39122B1 (en) 1973-04-30 1974-04-08 Production of citric acid

Country Status (15)

Country Link
JP (1) JPS5013585A (en)
AR (1) AR198582A1 (en)
AT (1) AT327136B (en)
AU (1) AU476615B2 (en)
BE (1) BE814048A (en)
CS (1) CS174240B2 (en)
DE (1) DE2419605A1 (en)
FR (1) FR2227323B1 (en)
GB (1) GB1403336A (en)
IE (1) IE39122B1 (en)
IL (1) IL44601A0 (en)
IT (1) IT1011246B (en)
LU (1) LU69925A1 (en)
NL (1) NL7405449A (en)
YU (1) YU112074A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5037663A (en) * 1981-10-14 1991-08-06 Colorado State University Research Foundation Process for increasing the reactivity of cellulose-containing materials

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4128574A (en) * 1976-10-04 1978-12-05 General Electric Company Method for making organic polycarboxylic acids

Also Published As

Publication number Publication date
FR2227323A1 (en) 1974-11-22
AR198582A1 (en) 1974-06-28
FR2227323B1 (en) 1978-02-24
IT1011246B (en) 1977-01-20
CS174240B2 (en) 1977-03-31
LU69925A1 (en) 1974-11-21
AU6782174A (en) 1975-10-16
GB1403336A (en) 1975-08-28
ATA336074A (en) 1975-04-15
IE39122L (en) 1974-10-30
AT327136B (en) 1976-01-12
BE814048A (en) 1974-10-23
YU112074A (en) 1982-02-28
NL7405449A (en) 1974-11-01
JPS5013585A (en) 1975-02-13
DE2419605A1 (en) 1974-11-14
AU476615B2 (en) 1976-09-30
IL44601A0 (en) 1974-06-30

Similar Documents

Publication Publication Date Title
US5136354A (en) Semiconductor device wafer with interlayer insulating film covering the scribe lines
JPS6461934A (en) Semiconductor device and manufacture thereof
US5237199A (en) Semiconductor device with interlayer insulating film covering the chip scribe lines
JPS6489470A (en) Manufacture of semiconductor device
DE69105070D1 (en) A method of manufacturing an insulating substrate for semiconductor devices and a patterned metal plate used therefor.
IE39122L (en) Citric acid production
JPS5240968A (en) Process for production of semiconductor device
JP2782804B2 (en) Semiconductor device
EP0797251A3 (en) Semiconductor device planarization method
JPS5710249A (en) Manufacture of semiconductor device
JPS5717148A (en) Manufacture of semiconductor device
JPS6442842A (en) Manufacture of semiconductor device
JPS5249781A (en) Process for production of semiconductor device
JPS57181143A (en) Manufacture of semiconductor device
JPS6428825A (en) Manufacture of semiconductor device
JPS6477145A (en) Manufacture of semiconductor device
JPS56130951A (en) Manufacture of semiconductor device
JPS5679451A (en) Production of semiconductor device
JPS5690535A (en) Production of integrated multilayer wiring strcuture
JPS6459942A (en) Formation of multilayer interconnection
JPS6473718A (en) Manufacture of semiconductor integrated circuit device
JPS6235537A (en) Semiconductor device and manufacture thereof
JPS6419728A (en) Manufacture of semiconductor device
JPS62150757A (en) Semiconductor device
JPS6420658A (en) Manufacture of semiconductor device