IE20210001U1 - Nanoparticle modification-based diamond film and preparation method thereof - Google Patents

Nanoparticle modification-based diamond film and preparation method thereof

Info

Publication number
IE20210001U1
IE20210001U1 IE20210001U IE20210001U IE20210001U1 IE 20210001 U1 IE20210001 U1 IE 20210001U1 IE 20210001 U IE20210001 U IE 20210001U IE 20210001 U IE20210001 U IE 20210001U IE 20210001 U1 IE20210001 U1 IE 20210001U1
Authority
IE
Ireland
Prior art keywords
diamond film
substrate
preparation
transition layer
film
Prior art date
Application number
IE20210001U
Other languages
English (en)
Other versions
IES87295Y1 (en
Inventor
Man Weidong
Zhu Changzheng
Gong Chuang
Wu Jianbo
Jiang Jianhong
Jiang Meirong
Original Assignee
Shanghai Zhengshi Tech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Zhengshi Tech Co Ltd filed Critical Shanghai Zhengshi Tech Co Ltd
Publication of IES87295Y1 publication Critical patent/IES87295Y1/en
Publication of IE20210001U1 publication Critical patent/IE20210001U1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C23C16/0281—Deposition of sub-layers, e.g. to promote the adhesion of the main coating of metallic sub-layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/274—Diamond only using microwave discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Pinball Game Machines (AREA)
  • Adornments (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
IE20210001U 2020-12-01 2021-01-04 Nanoparticle modification-based diamond film and preparation method thereof IE20210001U1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202011387882.3A CN112647056A (zh) 2020-12-01 2020-12-01 一种基于纳米粒子修饰的金刚石薄膜及其制备方法

Publications (2)

Publication Number Publication Date
IES87295Y1 IES87295Y1 (en) 2022-04-13
IE20210001U1 true IE20210001U1 (en) 2022-04-13

Family

ID=75349793

Family Applications (1)

Application Number Title Priority Date Filing Date
IE20210001U IE20210001U1 (en) 2020-12-01 2021-01-04 Nanoparticle modification-based diamond film and preparation method thereof

Country Status (2)

Country Link
CN (1) CN112647056A (zh)
IE (1) IE20210001U1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113621965A (zh) * 2021-08-11 2021-11-09 无锡锐威精密刀具有限公司 一种合金刀具表面金刚石梯度膜及其制备方法
CN113755813A (zh) * 2021-09-10 2021-12-07 安徽光智科技有限公司 一种衬底的预处理方法和金刚石膜的制备方法
CN114863790B (zh) * 2022-04-13 2023-06-16 四川大学 一种手性纳米防伪标签
CN116247017A (zh) * 2023-02-06 2023-06-09 中国人民解放军国防科技大学 一种金刚石衬底sp3-sp2杂化成键网络层制备方法及应用

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2002337637A1 (en) * 2001-01-26 2003-01-08 Northwestern University Method and device utilizing driving force to deliver deposition compound
CN102553813B (zh) * 2012-02-17 2013-10-30 天津大学 一种在金属表面制备微纳米二氧化钛及其疏水薄膜的溶胶凝胶方法
CN102965666B (zh) * 2012-11-27 2014-10-01 郑州大学 一种柔性衬底纳米金刚石薄膜及其制备方法
CN104988476B (zh) * 2015-07-17 2018-01-23 燕山大学 一种金刚石微粉表面镀覆纳米银的方法
CN106436347B (zh) * 2016-09-21 2019-02-15 深圳东方逸尚服饰有限公司 一种基于铁氧体涂层整理的防辐射织物及其制备方法
CN106947994B (zh) * 2017-04-01 2019-03-12 江苏裕铭铜业有限公司 一种基于氧化铜纳米线的金属保护层

Also Published As

Publication number Publication date
IES87295Y1 (en) 2022-04-13
CN112647056A (zh) 2021-04-13

Similar Documents

Publication Publication Date Title
IE20210001U1 (en) Nanoparticle modification-based diamond film and preparation method thereof
ATE458839T1 (de) Verfahren für leicht zu reinigende substrate und artikel daraus
SG165338A1 (en) Large scale manufacturing of nanostructured material
HK1072279A1 (en) Corona-generated chemical vapor deposition on a substrate
UA99280C2 (ru) Способ нанесения покрытия на основу, устройство вакуумного осаждения и слиток на основе цинка
WO2008121478A3 (en) Roll-to-roll plasma enhanced chemical vapor deposition method of barrier layers comprising silicon and carbon
ATE519870T1 (de) Verfahren zur abscheidung von metallschichten aus metallcarbonylvorläufern
TW200736411A (en) Method of forming a metal carbide or metal carbonitride film having improved adhesion
WO2011041135A3 (en) Method of making coated metal articles
ATE476535T1 (de) Verfahren zur ausbildung dünner schichten aus siliziumnitrid auf substratoberflächen
WO2007002369A3 (en) Method for manufacture and coating of nanostructured components
WO2010068419A3 (en) Production of single crystal cvd diamond rapid growth rate
SG171631A1 (en) A method for the manufacture of a coating
TW200618066A (en) Deposition of ruthenium metal layers in a thermal chemical vapor deposition process
SE0402904D0 (sv) Coated product and method of production thereof
RU2012147544A (ru) Лопатка газовой турбины и способ нанесения связующего и защитного слоев на лопатку
WO2005098917A3 (en) Methods of processing a substrate with minimal scalloping
TW200724699A (en) Nonmetal compound and surface coating of the same
US8241757B2 (en) Multilayer substrate
ATE422562T1 (de) Einfaches cvd-system und verfahren zur abscheidung von multimetallaluminidüberzügen
IN2012DN00310A (zh)
SG154408A1 (en) Cathodic arc deposition coatings for turbine engine components
GB201215321D0 (en) A cutting insert with a titanium oxycarbonitride coating and method for making the same
WO2007130448A3 (en) Method of depositing zinc oxide coatings on a substrate
CN107267943A (zh) 深黑色金属薄膜及其制备方法和应用