ID27889A - Komposisi-komposisi kopolimer polisiklik - Google Patents

Komposisi-komposisi kopolimer polisiklik

Info

Publication number
ID27889A
ID27889A IDW20002703A ID20002703A ID27889A ID 27889 A ID27889 A ID 27889A ID W20002703 A IDW20002703 A ID W20002703A ID 20002703 A ID20002703 A ID 20002703A ID 27889 A ID27889 A ID 27889A
Authority
ID
Indonesia
Prior art keywords
coopolymer
polyclic
compositions
polyclic coopolymer
coopolymer compositions
Prior art date
Application number
IDW20002703A
Other languages
English (en)
Inventor
Brian L Goodall
Lerter H Mcintosh Iii
Original Assignee
Goodrich Co B F
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Goodrich Co B F filed Critical Goodrich Co B F
Publication of ID27889A publication Critical patent/ID27889A/id

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
IDW20002703A 1998-07-01 1999-06-18 Komposisi-komposisi kopolimer polisiklik ID27889A (id)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US9136198P 1998-07-01 1998-07-01

Publications (1)

Publication Number Publication Date
ID27889A true ID27889A (id) 2001-05-03

Family

ID=22227385

Family Applications (1)

Application Number Title Priority Date Filing Date
IDW20002703A ID27889A (id) 1998-07-01 1999-06-18 Komposisi-komposisi kopolimer polisiklik

Country Status (8)

Country Link
US (1) US6303724B1 (id)
EP (1) EP1093480A1 (id)
JP (1) JP2002519487A (id)
KR (1) KR100546472B1 (id)
CN (1) CN1307603A (id)
AU (1) AU4826399A (id)
ID (1) ID27889A (id)
WO (1) WO2000001747A1 (id)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6232417B1 (en) * 1996-03-07 2001-05-15 The B. F. Goodrich Company Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
US6406828B1 (en) * 2000-02-24 2002-06-18 Shipley Company, L.L.C. Polymer and photoresist compositions
TW594410B (en) * 2000-09-07 2004-06-21 Shinetsu Chemical Co Resist compositions and patterning process
KR100604751B1 (ko) * 2001-08-24 2006-07-26 주식회사 하이닉스반도체 산 확산 방지용 포토레지스트 공중합체 및 이를 함유하는포토레지스트 조성물
WO2003102006A1 (en) * 2002-05-30 2003-12-11 Exxonmobil Chemical Patents Inc. Soluble late transition metal catalysts for olefin oligomerizations iii
US7022790B2 (en) * 2002-07-03 2006-04-04 Sumitomo Bakelite Company, Ltd. Photosensitive compositions based on polycyclic polymers
US6677419B1 (en) 2002-11-13 2004-01-13 International Business Machines Corporation Preparation of copolymers
US7160834B2 (en) * 2003-03-18 2007-01-09 Exxonmobil Chemical Patents Inc. Soluble group-10 α-diimine catalyst precursors, catalysts and methods for dimerizing and oligomerizing olefins
US7087687B2 (en) * 2003-08-21 2006-08-08 Rohm And Haas Company Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers
US7408013B2 (en) * 2003-09-23 2008-08-05 Commonwealth Scientific And Industrial Research Organization Low-polydispersity photoimageable polymers and photoresists and processes for microlithography
US6956003B2 (en) * 2003-12-03 2005-10-18 Formosa Plastics Corporation, U.S.A. Catalyst system for ethylene (co)-polymerization
US7199074B2 (en) * 2004-06-14 2007-04-03 Rohm And Haas Company Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers
US7172986B2 (en) * 2004-06-14 2007-02-06 Rohm And Haas Company Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers
JP4752211B2 (ja) * 2004-08-13 2011-08-17 Ｊｓｒ株式会社 環状オレフィン系付加共重合体の製造方法、環状オレフィン系付加共重合体およびその用途
WO2006031067A1 (en) * 2004-09-16 2006-03-23 Lg Chem, Ltd. Catalyst system for polymerizing cyclic olefin having polar functional group, polymerizing method using the catalyst system, olefin polymer produced by the method and optical anisotropic film comprising the olefin polymer
US7595369B2 (en) * 2004-11-10 2009-09-29 Lg Chem, Ltd. Method of polymerizing cyclic olefins and vinyl olefins, copolymer produced by the method and optical anisotropic film comprising the same
US7749934B2 (en) * 2005-02-22 2010-07-06 Rohm And Haas Company Protected catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers
US7799883B2 (en) 2005-02-22 2010-09-21 Promerus Llc Norbornene-type polymers, compositions thereof and lithographic process using such compositions
JP4794293B2 (ja) * 2005-07-14 2011-10-19 株式会社クラレ 金属化合物、それを用いたビニル系モノマー重合用触媒組成物および該組成物を用いたビニル系モノマーの重合への使用
KR102486898B1 (ko) * 2021-02-09 2023-01-10 경북대학교 산학협력단 환형올레핀계 단량체 중합용 이민계 리간드 함유 코발트 착체 촉매 및 이를 이용한 환형올레핀계 중합체의 제조방법

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3313785A (en) * 1963-06-11 1967-04-11 Union Carbide Corp Polysulfones and method for their production
US3536681A (en) 1967-12-13 1970-10-27 Goodrich Co B F Substituted norbornene compounds
US3697490A (en) 1971-06-21 1972-10-10 Goodrich Co B F Polymers of alkoxy alkyl acrylates, alkyl acrylates and substituted norbornene
AU6145373A (en) 1972-11-29 1975-04-17 American Cyanamid Co Vulcanizable polyacrylate elastomer
EP0409291B1 (en) * 1987-11-17 1996-02-14 Japan Synthetic Rubber Co., Ltd. Thermoplastic resin composition
JPH0463810A (ja) 1990-07-03 1992-02-28 Kuraray Co Ltd アクリル―ノルボルネン系共重合体およびその製造法
JP3000745B2 (ja) 1991-09-19 2000-01-17 富士通株式会社 レジスト組成物とレジストパターンの形成方法
DE4319178C2 (de) 1992-06-10 1997-07-17 Fujitsu Ltd Resist-Zusammensetzung enthaltend ein Polymermaterial und einen Säuregenerator
US5468819A (en) 1993-11-16 1995-11-21 The B.F. Goodrich Company Process for making polymers containing a norbornene repeating unit by addition polymerization using an organo (nickel or palladium) complex
KR100418168B1 (ko) 1995-01-24 2004-02-14 이.아이,듀우판드네모아앤드캄파니 중합 방법
US5677405A (en) * 1995-05-24 1997-10-14 The B.F. Goodrich Company Homopolymers and copolymers of cationically polymerizable monomers and method of their preparation
US5705503A (en) 1995-05-25 1998-01-06 Goodall; Brian Leslie Addition polymers of polycycloolefins containing functional substituents
US5843624A (en) 1996-03-08 1998-12-01 Lucent Technologies Inc. Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
KR100261022B1 (ko) * 1996-10-11 2000-09-01 윤종용 화학증폭형 레지스트 조성물
KR100265597B1 (ko) 1996-12-30 2000-09-15 김영환 Arf 감광막 수지 및 그 제조방법
EP0878738B1 (en) * 1997-05-12 2002-01-09 Fuji Photo Film Co., Ltd. Positive resist composition

Also Published As

Publication number Publication date
AU4826399A (en) 2000-01-24
WO2000001747A1 (en) 2000-01-13
CN1307603A (zh) 2001-08-08
EP1093480A1 (en) 2001-04-25
KR20010053311A (ko) 2001-06-25
US6303724B1 (en) 2001-10-16
JP2002519487A (ja) 2002-07-02
KR100546472B1 (ko) 2006-01-26

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