HUT77580A - Eljárás és berendezés falazatok, főleg belső falak nedvesség elleni szigetelésére - Google Patents

Eljárás és berendezés falazatok, főleg belső falak nedvesség elleni szigetelésére

Info

Publication number
HUT77580A
HUT77580A HU9702431A HU9702431A HUT77580A HU T77580 A HUT77580 A HU T77580A HU 9702431 A HU9702431 A HU 9702431A HU 9702431 A HU9702431 A HU 9702431A HU T77580 A HUT77580 A HU T77580A
Authority
HU
Hungary
Prior art keywords
channel
masonry
damp
waxy material
floor
Prior art date
Application number
HU9702431A
Other languages
English (en)
Other versions
HU220002B (hu
Inventor
Horst Becker
Original Assignee
Isotec Franchise-Systeme Gmbh.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Isotec Franchise-Systeme Gmbh. filed Critical Isotec Franchise-Systeme Gmbh.
Publication of HUT77580A publication Critical patent/HUT77580A/hu
Publication of HU220002B publication Critical patent/HU220002B/hu

Links

Classifications

    • E—FIXED CONSTRUCTIONS
    • E04—BUILDING
    • E04B—GENERAL BUILDING CONSTRUCTIONS; WALLS, e.g. PARTITIONS; ROOFS; FLOORS; CEILINGS; INSULATION OR OTHER PROTECTION OF BUILDINGS
    • E04B1/00—Constructions in general; Structures which are not restricted either to walls, e.g. partitions, or floors or ceilings or roofs
    • E04B1/62—Insulation or other protection; Elements or use of specified material therefor
    • E04B1/64—Insulation or other protection; Elements or use of specified material therefor for making damp-proof; Protection against corrosion
    • E04B1/644—Damp-proof courses
    • E04B1/648—Damp-proof courses obtained by injection or infiltration of water-proofing agents into an existing wall

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Civil Engineering (AREA)
  • Structural Engineering (AREA)
  • Building Environments (AREA)
  • Finishing Walls (AREA)
  • Aftertreatments Of Artificial And Natural Stones (AREA)
  • Semiconductor Memories (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Glass Compositions (AREA)
  • Moulds, Cores, Or Mandrels (AREA)
  • Chemical And Physical Treatments For Wood And The Like (AREA)
  • Drilling And Exploitation, And Mining Machines And Methods (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
HU9702431A 1994-11-23 1995-11-23 Eljárás és berendezés falazatok, főleg belső falak nedvesség elleni szigetelésére HU220002B (hu)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE4441643 1994-11-23
PCT/DE1995/001640 WO1996016237A1 (de) 1994-11-23 1995-11-23 Verfahren zur feuchtigkeitsabdichtung von mauerwerk
US08/851,689 US5885865A (en) 1994-11-23 1997-05-06 Method for making low-topography buried capacitor by a two stage etching process and device made

Publications (2)

Publication Number Publication Date
HUT77580A true HUT77580A (hu) 1998-06-29
HU220002B HU220002B (hu) 2001-10-28

Family

ID=25942208

Family Applications (1)

Application Number Title Priority Date Filing Date
HU9702431A HU220002B (hu) 1994-11-23 1995-11-23 Eljárás és berendezés falazatok, főleg belső falak nedvesség elleni szigetelésére

Country Status (11)

Country Link
US (1) US5885865A (hu)
EP (1) EP0793758B1 (hu)
AT (1) ATE172510T1 (hu)
CZ (1) CZ292440B6 (hu)
DE (1) DE59504019D1 (hu)
DK (1) DK0793758T3 (hu)
ES (1) ES2124025T3 (hu)
HU (1) HU220002B (hu)
PL (1) PL321190A1 (hu)
RU (1) RU2135716C1 (hu)
WO (1) WO1996016237A1 (hu)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5652170A (en) * 1996-01-22 1997-07-29 Micron Technology, Inc. Method for etching sloped contact openings in polysilicon
US6143276A (en) 1997-03-21 2000-11-07 Imarx Pharmaceutical Corp. Methods for delivering bioactive agents to regions of elevated temperatures
TW421849B (en) * 1998-02-23 2001-02-11 Winbond Electronics Corp Structure of multi-layered dielectric opening and its fabricating method
AT408221B (de) * 1999-06-08 2001-09-25 Niv Spezial Grundbaugesellscha Spezialmörtel zur feuchtigkeitsabdichtung
US6130168A (en) * 1999-07-08 2000-10-10 Taiwan Semiconductor Manufacturing Company Using ONO as hard mask to reduce STI oxide loss on low voltage device in flash or EPROM process
US6258729B1 (en) 1999-09-02 2001-07-10 Micron Technology, Inc. Oxide etching method and structures resulting from same
US6551923B1 (en) 1999-11-01 2003-04-22 Advanced Micro Devices, Inc. Dual width contact for charge gain reduction
US6441418B1 (en) * 1999-11-01 2002-08-27 Advanced Micro Devices, Inc. Spacer narrowed, dual width contact for charge gain reduction
US6242331B1 (en) * 1999-12-20 2001-06-05 Taiwan Semiconductor Manufacturing Company Method to reduce device contact resistance using a hydrogen peroxide treatment
KR100388682B1 (ko) 2001-03-03 2003-06-25 삼성전자주식회사 반도체 메모리 장치의 스토리지 전극층 및 그 형성방법
US6410955B1 (en) 2001-04-19 2002-06-25 Micron Technology, Inc. Comb-shaped capacitor for use in integrated circuits
US6888217B2 (en) * 2001-08-30 2005-05-03 Micron Technology, Inc. Capacitor for use in an integrated circuit
GB2386471B (en) * 2001-12-11 2004-04-07 Samsung Electronics Co Ltd A method for fabricating a one-cylinder stack capacitor
KR100434496B1 (ko) * 2001-12-11 2004-06-05 삼성전자주식회사 단일 실린더 스택형 커패시터 및 이중 몰드를 이용한 제조방법
US7875547B2 (en) * 2005-01-12 2011-01-25 Taiwan Semiconductor Manufacturing Co., Ltd. Contact hole structures and contact structures and fabrication methods thereof
KR100855992B1 (ko) * 2007-04-02 2008-09-02 삼성전자주식회사 경사진 측벽을 갖는 활성 필라를 구비하는 비휘발성 메모리트랜지스터, 이를 구비하는 비휘발성 메모리 어레이 및상기 비휘발성 메모리 트랜지스터의 제조방법
DE102017114282A1 (de) * 2017-06-27 2018-12-27 BKM.Mannesmann AG Verfahren zum zerstörungsfreien nachträglichen Einbau einer Horizontalsperre in eine gemauerte Denkmalswand

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE195381C (hu) *
GB852938A (en) * 1958-05-20 1960-11-02 Richardson & Starling Ltd Improvements in and relating to the reduction or prevention of dampness in walls andother permeable surfaces of building structures
DE1962974A1 (de) * 1969-12-16 1971-06-24 Lasthaus Josef Wilhelm Verfahren zur Isolierung von Bauwerken gegen aufsteigende Mauerfeuchtigkeit
SU643600A1 (ru) * 1977-10-25 1979-01-25 Полтавский инженерно-строительный институт Способ устройсва гидроизол ции
DE3535654A1 (de) * 1985-10-05 1987-04-23 Friedrich Roehrmann Verfahren zum trocknen und isolieren von feuchtem mauerwerk
DE4208798C2 (de) * 1992-03-19 2002-09-26 Isotec Franchise Systeme Gmbh Vorrichtung zum Einbringen von heißem Paraffin in Mauerwerk
US5401681A (en) * 1993-02-12 1995-03-28 Micron Technology, Inc. Method of forming a bit line over capacitor array of memory cells
US5494841A (en) * 1993-10-15 1996-02-27 Micron Semiconductor, Inc. Split-polysilicon CMOS process for multi-megabit dynamic memories incorporating stacked container capacitor cells
US5604147A (en) * 1995-05-12 1997-02-18 Micron Technology, Inc. Method of forming a cylindrical container stacked capacitor

Also Published As

Publication number Publication date
RU2135716C1 (ru) 1999-08-27
ES2124025T3 (es) 1999-01-16
EP0793758B1 (de) 1998-10-21
CZ292440B6 (cs) 2003-09-17
CZ143697A3 (en) 1997-10-15
HU220002B (hu) 2001-10-28
WO1996016237A1 (de) 1996-05-30
US5885865A (en) 1999-03-23
PL321190A1 (en) 1997-11-24
EP0793758A1 (de) 1997-09-10
ATE172510T1 (de) 1998-11-15
DK0793758T3 (da) 1999-06-28
DE59504019D1 (de) 1998-11-26

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Legal Events

Date Code Title Description
HMM4 Cancellation of final prot. due to non-payment of fee
HMM4 Cancellation of final prot. due to non-payment of fee