HK70897A - Process for producing a developer having a low metal ion level - Google Patents

Process for producing a developer having a low metal ion level

Info

Publication number
HK70897A
HK70897A HK70897A HK70897A HK70897A HK 70897 A HK70897 A HK 70897A HK 70897 A HK70897 A HK 70897A HK 70897 A HK70897 A HK 70897A HK 70897 A HK70897 A HK 70897A
Authority
HK
Hong Kong
Prior art keywords
developer
producing
metal ion
low metal
ion level
Prior art date
Application number
HK70897A
Other languages
English (en)
Inventor
M Dalil Rahman
Dana L Durham
Original Assignee
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Celanese Corp filed Critical Hoechst Celanese Corp
Publication of HK70897A publication Critical patent/HK70897A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
HK70897A 1992-12-29 1997-05-29 Process for producing a developer having a low metal ion level HK70897A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/996,925 US5286606A (en) 1992-12-29 1992-12-29 Process for producing a developer having a low metal ion level
PCT/US1993/012405 WO1994015262A1 (en) 1992-12-29 1993-12-20 Process for producing a developer having a low metal ion level

Publications (1)

Publication Number Publication Date
HK70897A true HK70897A (en) 1997-06-06

Family

ID=25543432

Family Applications (1)

Application Number Title Priority Date Filing Date
HK70897A HK70897A (en) 1992-12-29 1997-05-29 Process for producing a developer having a low metal ion level

Country Status (8)

Country Link
US (1) US5286606A (de)
EP (1) EP0677183B1 (de)
JP (1) JP3381922B2 (de)
KR (1) KR100280757B1 (de)
DE (1) DE69308326T2 (de)
HK (1) HK70897A (de)
SG (1) SG47545A1 (de)
WO (1) WO1994015262A1 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5580949A (en) * 1991-12-18 1996-12-03 Hoechst Celanese Corporation Metal ion reduction in novolak resins and photoresists
SG48902A1 (en) * 1991-12-18 1998-05-18 Hoechst Celanese Corp Metal ion reduction in novolak resins
JP3184530B2 (ja) * 1992-03-06 2001-07-09 クラリアント・ファイナンス・（ビーブイアイ）・リミテッド 金属イオンレベルが低いフォトレジスト
SG52770A1 (en) * 1992-07-10 1998-09-28 Hoechst Celanese Corp Metal ion reduction in top anti-reflective coatings for photoresists
US5830990A (en) * 1992-07-10 1998-11-03 Clariant Finance (Bvi) Limited Low metals perfluorooctanoic acid and top anti-reflective coatings for photoresists
JP3727335B2 (ja) * 1992-11-25 2005-12-14 Ａｚエレクトロニックマテリアルズ株式会社 フォトレジスト用底部反射防止塗料における金属イオンの低減
US5614349A (en) * 1992-12-29 1997-03-25 Hoechst Celanese Corporation Using a Lewis base to control molecular weight of novolak resins
US5476750A (en) * 1992-12-29 1995-12-19 Hoechst Celanese Corporation Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists
DE4419166A1 (de) * 1994-06-01 1995-12-07 Hoechst Ag Entwickler für Photoresistschichten
GB9418743D0 (en) * 1994-09-16 1994-11-02 Dupont Uk Limited Fount solutions for printing processes
US5614352A (en) * 1994-12-30 1997-03-25 Hoechst Celanese Corporation Metal ion reduction in novolak resins solution in PGMEA by chelating ion exchange resin
US5837417A (en) * 1994-12-30 1998-11-17 Clariant Finance (Bvi) Limited Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition
US5521052A (en) * 1994-12-30 1996-05-28 Hoechst Celanese Corporation Metal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefrom
US5693749A (en) * 1995-09-20 1997-12-02 Hoechst Celanese Corporation Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom
US5750031A (en) * 1995-09-26 1998-05-12 Clariant Finance (Bvi) Limited Process for producing surfactant having a low metal ion level and developer produced therefrom
US5656413A (en) * 1995-09-28 1997-08-12 Hoechst Celanese Corporation Low metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]ethylidene]bisphe nol and photoresist compositions therefrom
US5962183A (en) * 1995-11-27 1999-10-05 Clariant Finance (Bvi) Limited Metal ion reduction in photoresist compositions by chelating ion exchange resin
US5665517A (en) * 1996-01-11 1997-09-09 Hoechst Celanese Corporation Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom
JP3029571B2 (ja) * 1996-06-18 2000-04-04 ナガセ電子化学株式会社 フォトレジスト剥離剤からＮａイオンを除去する方法
US6174501B1 (en) * 1997-10-31 2001-01-16 The Board Of Regents Of The University Of Nebraska System and process for producing biodiesel fuel with reduced viscosity and a cloud point below thirty-two (32) degrees fahrenheit
US5936071A (en) * 1998-02-02 1999-08-10 Clariant Finance (Bvi) Limited Process for making a photoactive compound and photoresist therefrom
WO2002023598A2 (en) * 2000-09-15 2002-03-21 Infineon Technologies North America Corp. A method to reduce post-development defects without sacrificing throughput
US6531267B2 (en) * 2001-04-11 2003-03-11 Clariant Finance (Bvi) Limited Process for producing acid sensitive liquid composition containing a carbonate
CA2544209C (en) * 2003-10-28 2011-10-18 Sachem, Inc. Cleaning solutions and etchants and methods for using same
KR20050101458A (ko) * 2004-04-19 2005-10-24 주식회사 하이닉스반도체 포토레지스트 세정액 조성물 및 이를 이용한 패턴 형성방법
CN114706271A (zh) * 2016-03-31 2022-07-05 富士胶片株式会社 半导体制造用处理液及图案形成方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH063549B2 (ja) * 1984-12-25 1994-01-12 株式会社東芝 ポジ型フォトレジスト現像液組成物
US4784937A (en) * 1985-08-06 1988-11-15 Tokyo Ohka Kogyo Co., Ltd. Developing solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactant
JPS6232453A (ja) * 1985-08-06 1987-02-12 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト用現像液
JPS6472155A (en) * 1987-09-12 1989-03-17 Tama Kagaku Kogyo Kk Developing solution for positive type photoresist
US5175078A (en) * 1988-10-20 1992-12-29 Mitsubishi Gas Chemical Company, Inc. Positive type photoresist developer
SG48902A1 (en) * 1991-12-18 1998-05-18 Hoechst Celanese Corp Metal ion reduction in novolak resins
JP3184530B2 (ja) * 1992-03-06 2001-07-09 クラリアント・ファイナンス・（ビーブイアイ）・リミテッド 金属イオンレベルが低いフォトレジスト

Also Published As

Publication number Publication date
DE69308326D1 (de) 1997-04-03
US5286606A (en) 1994-02-15
DE69308326T2 (de) 1998-01-15
EP0677183A1 (de) 1995-10-18
JPH08505241A (ja) 1996-06-04
EP0677183B1 (de) 1997-02-26
KR100280757B1 (ko) 2001-03-02
KR960700464A (ko) 1996-01-20
JP3381922B2 (ja) 2003-03-04
WO1994015262A1 (en) 1994-07-07
SG47545A1 (en) 1998-04-17

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Legal Events

Date Code Title Description
PF Patent in force
AS Change of ownership

Owner name: AZ ELECTRONIC MATERIALS (JAPAN) K.K

Free format text: FORMER OWNER(S): HOECHST CELANESE CORPORATION ?

CHPA Change of a particular in the register (except of change of ownership)
AS Change of ownership

Owner name: AZ ELECTRONIC MATERIALS (JAPAN) K.K.

Free format text: FORMER OWNER(S): CLARIANT FINANCE (BVI) LIMITED

PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20051220