HK53397A - Device for screening off lines of electric flux in an installation for electrolytically processing essentially flat elements - Google Patents
Device for screening off lines of electric flux in an installation for electrolytically processing essentially flat elementsInfo
- Publication number
- HK53397A HK53397A HK53397A HK53397A HK53397A HK 53397 A HK53397 A HK 53397A HK 53397 A HK53397 A HK 53397A HK 53397 A HK53397 A HK 53397A HK 53397 A HK53397 A HK 53397A
- Authority
- HK
- Hong Kong
- Prior art keywords
- screen
- rods
- goods carrier
- pct
- screening
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
- C25D7/0621—In horizontal cells
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/008—Current shielding devices
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/12—Semiconductors
- C25D7/123—Semiconductors first coated with a seed layer or a conductive layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/241—Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S204/00—Chemistry: electrical and wave energy
- Y10S204/07—Current distribution within the bath
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrolytic Production Of Metals (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Pretreatment Of Seeds And Plants (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4106733A DE4106733A1 (de) | 1991-03-02 | 1991-03-02 | Vorrichtung zum abblenden von feldlinien in einer galvanikanlage (iii) |
PCT/DE1992/000182 WO1992015727A1 (fr) | 1991-03-02 | 1992-02-28 | Dispositif d'arret de lignes de champ au moyen d'un ecran pour installations de traitement electrolytique d'elements essentiellement plats |
Publications (1)
Publication Number | Publication Date |
---|---|
HK53397A true HK53397A (en) | 1997-05-02 |
Family
ID=6426361
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK53397A HK53397A (en) | 1991-03-02 | 1997-04-24 | Device for screening off lines of electric flux in an installation for electrolytically processing essentially flat elements |
Country Status (8)
Country | Link |
---|---|
US (1) | US5391276A (fr) |
EP (1) | EP0574451B1 (fr) |
AT (1) | ATE114174T1 (fr) |
CA (1) | CA2105389A1 (fr) |
DE (2) | DE4106733A1 (fr) |
ES (1) | ES2065174T3 (fr) |
HK (1) | HK53397A (fr) |
WO (1) | WO1992015727A1 (fr) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AT399074B (de) * | 1991-12-23 | 1995-03-27 | Lenhard Ges M B H | Vorrichtung zum halten von leiterplatten |
GB9325297D0 (en) | 1993-12-10 | 1994-02-16 | Process Automation Internation | Improvements in or relating to clamps and the use thereof |
US5720813A (en) | 1995-06-07 | 1998-02-24 | Eamon P. McDonald | Thin sheet handling system |
DE19736352C1 (de) * | 1997-08-21 | 1998-12-10 | Atotech Deutschland Gmbh | Vorrichtung zur Kontaktierung von flachem Behandlungsgut in Durchlaufgalvanisieranlagen |
US6274010B1 (en) | 1997-10-07 | 2001-08-14 | Process Automation International Limited | Electroplating apparatus |
GB2330151A (en) * | 1997-10-07 | 1999-04-14 | Process Automation Internation | An electroplating apparatus with movable diaphragms |
DE19932785C1 (de) * | 1999-07-14 | 2000-11-16 | Atotech Deutschland Gmbh | Verfahren und Vorrichtung zum präzisen Justieren von Abschirmmasken bei der elektrochemischen Behandlung von stabförmigem Behandlungsgut |
US6818115B2 (en) * | 2001-10-19 | 2004-11-16 | Viasystems Group, Inc. | System and method for electrolytic plating |
US20050061660A1 (en) * | 2002-10-18 | 2005-03-24 | Kempen Hein Van | System and method for electrolytic plating |
US20060037865A1 (en) * | 2004-08-19 | 2006-02-23 | Rucker Michael H | Methods and apparatus for fabricating gas turbine engines |
CN101437365B (zh) * | 2007-11-15 | 2011-05-11 | 富葵精密组件(深圳)有限公司 | 固持装置及固持方法 |
CN102162119B (zh) * | 2011-04-11 | 2012-07-04 | 衢州威盛精密电子科技有限公司 | 电镀薄板浮架装置及其使用方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55145199A (en) * | 1979-04-25 | 1980-11-12 | Hitachi Ltd | Shielding board for plating |
DE3726571C1 (en) * | 1987-08-10 | 1989-03-23 | Siemens Ag | Screening and positioning frame |
US4879007B1 (en) * | 1988-12-12 | 1999-05-25 | Process Automation Int L Ltd | Shield for plating bath |
DE9007542U1 (de) * | 1990-02-20 | 1992-06-25 | Schering Ag Berlin Und Bergkamen, 1000 Berlin | Vorrichtung zum Abblenden von Feldlinien in einer Galvanikanlage |
-
1991
- 1991-03-02 DE DE4106733A patent/DE4106733A1/de active Granted
-
1992
- 1992-02-28 DE DE59200793T patent/DE59200793D1/de not_active Expired - Lifetime
- 1992-02-28 ES ES92905631T patent/ES2065174T3/es not_active Expired - Lifetime
- 1992-02-28 EP EP92905631A patent/EP0574451B1/fr not_active Expired - Lifetime
- 1992-02-28 US US08/108,690 patent/US5391276A/en not_active Expired - Lifetime
- 1992-02-28 CA CA002105389A patent/CA2105389A1/fr not_active Abandoned
- 1992-02-28 WO PCT/DE1992/000182 patent/WO1992015727A1/fr active IP Right Grant
- 1992-02-28 AT AT92905631T patent/ATE114174T1/de not_active IP Right Cessation
-
1997
- 1997-04-24 HK HK53397A patent/HK53397A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE4106733C2 (fr) | 1993-07-29 |
EP0574451B1 (fr) | 1994-11-17 |
US5391276A (en) | 1995-02-21 |
CA2105389A1 (fr) | 1992-09-03 |
WO1992015727A1 (fr) | 1992-09-17 |
EP0574451A1 (fr) | 1993-12-22 |
DE59200793D1 (de) | 1994-12-22 |
DE4106733A1 (de) | 1992-09-03 |
ATE114174T1 (de) | 1994-12-15 |
ES2065174T3 (es) | 1995-02-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PF | Patent in force | ||
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20110228 |