DE3726571C1 - Screening and positioning frame - Google Patents

Screening and positioning frame

Info

Publication number
DE3726571C1
DE3726571C1 DE19873726571 DE3726571A DE3726571C1 DE 3726571 C1 DE3726571 C1 DE 3726571C1 DE 19873726571 DE19873726571 DE 19873726571 DE 3726571 A DE3726571 A DE 3726571A DE 3726571 C1 DE3726571 C1 DE 3726571C1
Authority
DE
Germany
Prior art keywords
positioning frame
panel
screening
ridge
roof
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE19873726571
Other languages
German (de)
Inventor
Hans Hofmann
Hans-Hermann Merkenschlager
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MERKENSCHLAGER, HANS-HERMANN, 86179 AUGSBURG, DE
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Priority to DE19873726571 priority Critical patent/DE3726571C1/en
Application granted granted Critical
Publication of DE3726571C1 publication Critical patent/DE3726571C1/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/008—Current shielding devices

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)

Abstract

The invention relates to a screening and positioning frame for printed-circuit boards in hot-dip galvanising installations, which has a panel (2) which is designed in the form of a roof, with the ridge (1) pointing downwards, and is guided in the vertical direction by laterally attached lugs (3) in vertical slits (4) of a securing means (6). In the basic position, the panel is on the surface of the bath.

Description

Die Erfindung betrifft einen Abschirmungs- und Positionierrah­ men für Leiterplatten in Tauchgalvanisieranlagen.The invention relates to a shielding and positioning frame for printed circuit boards in electroplating systems.

Beim Galvanisieren von Leiterplatten im Tauchverfahren ist die galvanische Abscheidung der Metalle im Randbereich der Nutzen häufig höher als im inneren Bereich und es kann bei Anwendung höherer Stromdichten zu Anbrennungen kommen.When electroplating printed circuit boards in the immersion process that is galvanic deposition of metals in the edge area of the panel often higher than the inner area and it can when used higher current densities lead to burns.

Bisher wurden Rahmen aus leitendem Material an den Warenträger um die Nutzen befestigt. Diese Rahmen werden metallisiert und müssen nachher wieder entmetallisiert werden.So far, frames made of conductive material have been attached to the goods carrier attached to the benefits. These frames are metallized and must be demetallized again afterwards.

Aufgabe der Erfindung ist es daher, einen Abschirmungs- und Po­ sitionierrahmen zu schaffen, durch den das Aufbringen zusätzli­ cher Rahmen um die Nutzen vermieden wird.The object of the invention is therefore a shield and butt to create sitioning frame by which the application additional framework around the benefits is avoided.

Zur Lösung dieser Aufgabe wird gemäß der Erfindung der Abschir­ mungs- und Positionierrahmen derart ausgebildet, daß eine mit dem First nach unten weisende dachförmig ausgebildete Blende, die in vertikaler Richtung durch seitlich angebrachte Lappen in senkrechten Schlitzen einer Halterung geführt ist, vorgesehen ist, die sich in ihrer Grundstellung auf der Badeoberfläche be­ findet, und die unterhalb des Galvanisiergutes angeordnet ist und beim Tauchvorgang von diesem mitgenommen wird.To solve this problem, according to the invention, the shield mungs- and positioning frame designed such that a roof-shaped panel facing downwards from the ridge, which in the vertical direction by rags in the side vertical slots of a holder is provided is in its basic position on the bathing surface finds, and which is arranged below the electroplating and is taken away by it during the diving process.

Durch diese Maßnahmen wird eine Abschirmung des unteren Nutzen­ randes gegenüber erhöhter Stromdichte erreicht. Außerdem er­ folgt eine exakte Positionierung des ganzen Nutzens beim Galva­ nisieren, da dieser nun nicht nur an der Ober- sondern auch an der Unterseite geführt ist. Auch dies trägt wesentlich zur gleichmäßigeren Metallabscheidung bei.These measures will shield the bottom benefit randes compared to increased current density. Besides, he follows an exact positioning of the whole benefit of the Galva nize, because this is now not only on the top but also on the bottom is guided. This also contributes significantly more even metal deposition.

Anhand der Ausführungsbeispiele nach den Fig. 1 bis 3 wird die Erfindung näher erläutert. Es zeigtThe invention is explained in more detail using the exemplary embodiments according to FIGS. 1 to 3. It shows

Fig. 1 die Blende des Abschirmungs- und Positionierrahmens in Vorderansicht, Fig. 1, the aperture of the shielding and positioning frame in front view,

Fig. 2 die Blende in Seitenansicht und Fig. 2, the panel in side view

Fig. 3 die Blende von unten gesehen. Fig. 3 seen the panel from below.

Die Blende 2 ist dachförmig ausgebildet und mit ihrem First 1 nach unten an der Badoberseite angeordnet. An beiden Seiten weist sie Lappen 3 auf, die in Schlitten 4 einer Halterung 6 geführt sind. Die Firstkante ist zu einer rechteckförmigen Nut erweitert. In Grundstellung befindet sich die Blende auf der Badoberfläche. Beim Eintauchen des an seiner oberen Seite befestigten Galvanisiergutes tauchen die Nutzen mit ihrer Unterseite in die Blende 2 ein und werden dort zugleich geführt und nehmen die Blende entsprechend der Eintauchtiefe in den Elektrolyten mit.The panel 2 is roof-shaped and arranged with its ridge 1 down on the top of the bathroom. It has tabs 3 on both sides, which are guided in the slide 4 of a holder 6 . The ridge edge is expanded to a rectangular groove. In the basic position, the cover is on the bathroom surface. When the electroplated material fastened to its upper side is immersed, the underside dips into the panel 2 and is guided there at the same time and takes the panel with it in accordance with the immersion depth in the electrolyte.

Claims (1)

Abschirmungs- und Positionierrahmen für Leiterplatten in Tauch­ galvanikanlagen, dadurch gekennzeichnet, daß eine mit dem First (1) nach unten weisende dachförmig ausgebildete Blen­ de (2), die in vertikaler Richtung durch seitlich angebrachte Lappen (3) in senkrechten Schlitzen (4) einer Halterung (6) ge­ führt ist, vorgesehen ist, die sich in ihrer Grundstellung auf der Badoberfläche befindet, und die unterhalb des Galvanisier­ gutes angeordnet ist und beim Tauchvorgang von diesem mitge­ nommen wird.Shielding and positioning frame for printed circuit boards in immersion electroplating systems, characterized in that a roof-shaped blen de ( 2 ) with the ridge ( 1 ) pointing downward, which in the vertical direction by laterally attached tabs ( 3 ) in vertical slots ( 4 ) Bracket ( 6 ) leads, is provided, which is in its basic position on the bath surface, and which is well arranged below the electroplating and entrained by this during the dipping process.
DE19873726571 1987-08-10 1987-08-10 Screening and positioning frame Expired DE3726571C1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE19873726571 DE3726571C1 (en) 1987-08-10 1987-08-10 Screening and positioning frame

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19873726571 DE3726571C1 (en) 1987-08-10 1987-08-10 Screening and positioning frame

Publications (1)

Publication Number Publication Date
DE3726571C1 true DE3726571C1 (en) 1989-03-23

Family

ID=6333446

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19873726571 Expired DE3726571C1 (en) 1987-08-10 1987-08-10 Screening and positioning frame

Country Status (1)

Country Link
DE (1) DE3726571C1 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3937926A1 (en) * 1989-11-15 1991-05-16 Schering Ag DEVICE FOR DIMMING FIELD LINES IN A GALVANIC SYSTEM
DE4005209A1 (en) * 1990-02-20 1991-08-22 Schering Ag Masking screens for plate-shaped workpiece in electroplating unit - comprise upper floating pair and lower immersible pair of screens able to mask upper and lower sides of workpiece
DE4106733A1 (en) * 1991-03-02 1992-09-03 Schering Ag DEVICE FOR DIMMING FIELD LINES IN A GALVANIC SYSTEM (III)
DE19736352C1 (en) * 1997-08-21 1998-12-10 Atotech Deutschland Gmbh Apparatus for contacting flat items in continuous galvanising installations
EP0915189A2 (en) * 1997-10-07 1999-05-12 Process Automation International Limited An electroplating apparatus
US6274010B1 (en) 1997-10-07 2001-08-14 Process Automation International Limited Electroplating apparatus

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NICHTS ERMITTELT *

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3937926A1 (en) * 1989-11-15 1991-05-16 Schering Ag DEVICE FOR DIMMING FIELD LINES IN A GALVANIC SYSTEM
DE4005209A1 (en) * 1990-02-20 1991-08-22 Schering Ag Masking screens for plate-shaped workpiece in electroplating unit - comprise upper floating pair and lower immersible pair of screens able to mask upper and lower sides of workpiece
WO1991013190A1 (en) * 1990-02-20 1991-09-05 Schering Aktiengesellschaft Device for masking off the flux lines in a galvanic bath
DE4106733A1 (en) * 1991-03-02 1992-09-03 Schering Ag DEVICE FOR DIMMING FIELD LINES IN A GALVANIC SYSTEM (III)
US5391276A (en) * 1991-03-02 1995-02-21 Atotech Deutschland Gmh Device for screening off lines of electric flux in an installation for electrolytically processing essentially flat elements (III)
WO1999010568A2 (en) * 1997-08-21 1999-03-04 Atotech Deutschland Gmbh Device and method for evening out the thickness of metal layers on electrical contact points on items that are to be treated
DE19736352C1 (en) * 1997-08-21 1998-12-10 Atotech Deutschland Gmbh Apparatus for contacting flat items in continuous galvanising installations
WO1999010568A3 (en) * 1997-08-21 1999-08-19 Atotech Deutschland Gmbh Device and method for evening out the thickness of metal layers on electrical contact points on items that are to be treated
US6319383B1 (en) 1997-08-21 2001-11-20 Atotech Deutschland Gmbh Device and method for evening out the thickness of metal layers on electrical contact points on items that are to be treated
US6887113B1 (en) 1997-08-21 2005-05-03 Atotech Deutschland Gmbh Contact element for use in electroplating
EP0915189A2 (en) * 1997-10-07 1999-05-12 Process Automation International Limited An electroplating apparatus
EP0915189A3 (en) * 1997-10-07 2000-05-10 Process Automation International Limited An electroplating apparatus
US6274010B1 (en) 1997-10-07 2001-08-14 Process Automation International Limited Electroplating apparatus

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Legal Events

Date Code Title Description
8100 Publication of the examined application without publication of unexamined application
D1 Grant (no unexamined application published) patent law 81
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: SIEMENS NIXDORF INFORMATIONSSYSTEME AG, 33106 PADE

8327 Change in the person/name/address of the patent owner

Owner name: MERKENSCHLAGER, HANS-HERMANN, 86179 AUGSBURG, DE

8339 Ceased/non-payment of the annual fee