HK47197A - Polymers containing N,N-disubstituted sulfonamide side groups and their use in radiation-sensitive compositions - Google Patents
Polymers containing N,N-disubstituted sulfonamide side groups and their use in radiation-sensitive compositionsInfo
- Publication number
- HK47197A HK47197A HK47197A HK47197A HK47197A HK 47197 A HK47197 A HK 47197A HK 47197 A HK47197 A HK 47197A HK 47197 A HK47197 A HK 47197A HK 47197 A HK47197 A HK 47197A
- Authority
- HK
- Hong Kong
- Prior art keywords
- radiation
- polymers containing
- side groups
- sensitive compositions
- disubstituted sulfonamide
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/38—Esters containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C311/00—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
- C07C311/50—Compounds containing any of the groups, X being a hetero atom, Y being any atom
- C07C311/52—Y being a hetero atom
- C07C311/53—X and Y not being nitrogen atoms, e.g. N-sulfonylcarbamic acid
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/107—Polyamide or polyurethane
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4242050A DE4242050A1 (de) | 1992-12-14 | 1992-12-14 | Polymere mit N,N-disubstituierten Sulfonamid-Seitengruppen und deren Verwendung |
Publications (1)
Publication Number | Publication Date |
---|---|
HK47197A true HK47197A (en) | 1997-04-18 |
Family
ID=6475161
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK47197A HK47197A (en) | 1992-12-14 | 1997-04-10 | Polymers containing N,N-disubstituted sulfonamide side groups and their use in radiation-sensitive compositions |
Country Status (7)
Country | Link |
---|---|
US (2) | US5442087A (fr) |
EP (1) | EP0602377B1 (fr) |
JP (1) | JP3556256B2 (fr) |
KR (1) | KR100293041B1 (fr) |
BR (1) | BR9305037A (fr) |
DE (2) | DE4242050A1 (fr) |
HK (1) | HK47197A (fr) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4242051A1 (de) * | 1992-12-14 | 1994-06-16 | Hoechst Ag | N,N-Disubstituierte Sulfonamide und damit hergestelltes strahlungsempfindliches Gemisch |
DE69706773T2 (de) * | 1996-06-20 | 2002-07-04 | Fuji Photo Film Co., Ltd. | Positiv arbeitende, bilderzeugende Zusammensetzung |
FR2755009B1 (fr) * | 1996-10-24 | 1998-11-27 | Bergerac Nc | Vernis a ongles aqueux |
TWI269940B (en) * | 1999-10-29 | 2007-01-01 | Shinetsu Chemical Co | Resist composition |
JP4081677B2 (ja) * | 2003-05-21 | 2008-04-30 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
JP4009852B2 (ja) * | 2003-05-21 | 2007-11-21 | 信越化学工業株式会社 | 塩基性化合物、レジスト材料及びパターン形成方法 |
JP4029288B2 (ja) * | 2003-05-21 | 2008-01-09 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
US7276324B2 (en) | 2003-11-14 | 2007-10-02 | Shin-Etsu Chemical Co., Ltd. | Nitrogen-containing organic compound, resist composition and patterning process |
JP4784760B2 (ja) | 2006-10-20 | 2011-10-05 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
WO2008099727A1 (fr) * | 2007-02-15 | 2008-08-21 | Kuraray.Co., Ltd. | Dérivé d'acrylate substitué en alpha et procédé de fabrication de celui-ci |
JP5617339B2 (ja) * | 2010-03-08 | 2014-11-05 | Jsr株式会社 | 感放射線性樹脂組成物、重合体及び化合物 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3933894A (en) * | 1966-05-03 | 1976-01-20 | Monsanto Company | N-arylsulfonyl carbamates |
DE2027466A1 (de) * | 1970-06-04 | 1971-12-09 | Kalle Ag | Polymere N-Carbonylsulfonamide und Verfahren zu ihrer Herstellung |
US3779778A (en) * | 1972-02-09 | 1973-12-18 | Minnesota Mining & Mfg | Photosolubilizable compositions and elements |
US3971650A (en) * | 1973-06-29 | 1976-07-27 | Chevron Research Company | Herbicidal N1 -methoxycarbonyl-N1 -alkyl-3,5-dinitro-N4 -N4 -dialkylsulfanilamide |
CH621416A5 (fr) * | 1975-03-27 | 1981-01-30 | Hoechst Ag | |
DE2718254C3 (de) * | 1977-04-25 | 1980-04-10 | Hoechst Ag, 6000 Frankfurt | Strahlungsempfindliche Kopiermasse |
IT1109386B (it) * | 1977-11-08 | 1985-12-16 | Nippon Soda Co | Composizione acaricida |
DE2829511A1 (de) * | 1978-07-05 | 1980-01-24 | Hoechst Ag | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern |
DE2829512A1 (de) * | 1978-07-05 | 1980-01-17 | Hoechst Ag | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern |
DE2928636A1 (de) * | 1979-07-16 | 1981-02-12 | Hoechst Ag | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern |
US4491628A (en) * | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
DE3445276A1 (de) * | 1984-12-12 | 1986-06-19 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform |
EP0249139B2 (fr) * | 1986-06-13 | 1998-03-11 | MicroSi, Inc. (a Delaware corporation) | Composition formant réserve et utilisation |
JPH0769605B2 (ja) * | 1988-02-25 | 1995-07-31 | 富士写真フイルム株式会社 | 感光性組成物 |
EP0366590B2 (fr) * | 1988-10-28 | 2001-03-21 | International Business Machines Corporation | Composition photoréserve positive à haute sensibilité |
EP0421388A3 (en) * | 1989-10-03 | 1991-12-18 | Mitsubishi Petrochemical Co., Ltd. | Positive-acting photoresist composition |
DE3935875A1 (de) * | 1989-10-27 | 1991-05-02 | Basf Ag | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefmustern |
JP2779982B2 (ja) * | 1991-06-19 | 1998-07-23 | 富士写真フイルム株式会社 | 感光性組成物 |
-
1992
- 1992-12-14 DE DE4242050A patent/DE4242050A1/de not_active Withdrawn
-
1993
- 1993-11-05 DE DE59304118T patent/DE59304118D1/de not_active Expired - Fee Related
- 1993-11-05 EP EP93117980A patent/EP0602377B1/fr not_active Expired - Lifetime
- 1993-12-10 US US08/165,148 patent/US5442087A/en not_active Expired - Fee Related
- 1993-12-13 JP JP31177393A patent/JP3556256B2/ja not_active Expired - Fee Related
- 1993-12-13 BR BR9305037A patent/BR9305037A/pt not_active Application Discontinuation
- 1993-12-13 KR KR1019930027527A patent/KR100293041B1/ko not_active IP Right Cessation
-
1995
- 1995-05-01 US US08/432,229 patent/US5529886A/en not_active Expired - Lifetime
-
1997
- 1997-04-10 HK HK47197A patent/HK47197A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US5529886A (en) | 1996-06-25 |
DE4242050A1 (de) | 1994-06-16 |
JPH06263717A (ja) | 1994-09-20 |
KR100293041B1 (ko) | 2001-09-17 |
DE59304118D1 (de) | 1996-11-14 |
US5442087A (en) | 1995-08-15 |
KR940014323A (ko) | 1994-07-18 |
EP0602377A1 (fr) | 1994-06-22 |
JP3556256B2 (ja) | 2004-08-18 |
EP0602377B1 (fr) | 1996-10-09 |
BR9305037A (pt) | 1994-06-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |