HK33378A - Polymeric etch resist strippers - Google Patents

Polymeric etch resist strippers

Info

Publication number
HK33378A
HK33378A HK333/78A HK33378A HK33378A HK 33378 A HK33378 A HK 33378A HK 333/78 A HK333/78 A HK 333/78A HK 33378 A HK33378 A HK 33378A HK 33378 A HK33378 A HK 33378A
Authority
HK
Hong Kong
Prior art keywords
etch resist
resist strippers
polymeric etch
polymeric
strippers
Prior art date
Application number
HK333/78A
Other languages
English (en)
Original Assignee
Allied Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allied Chem filed Critical Allied Chem
Publication of HK33378A publication Critical patent/HK33378A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31127—Etching organic layers
    • H01L21/31133—Etching organic layers by chemical means
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D9/00—Chemical paint or ink removers
    • C09D9/005—Chemical paint or ink removers containing organic solvents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
HK333/78A 1974-01-30 1978-06-29 Polymeric etch resist strippers HK33378A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US438127A US3871929A (en) 1974-01-30 1974-01-30 Polymeric etch resist strippers and method of using same

Publications (1)

Publication Number Publication Date
HK33378A true HK33378A (en) 1978-07-07

Family

ID=23739341

Family Applications (1)

Application Number Title Priority Date Filing Date
HK333/78A HK33378A (en) 1974-01-30 1978-06-29 Polymeric etch resist strippers

Country Status (10)

Country Link
US (1) US3871929A (ja)
JP (1) JPS5852578B2 (ja)
AU (1) AU7687074A (ja)
CA (1) CA1024867A (ja)
DE (1) DE2501187C2 (ja)
FR (1) FR2259128B3 (ja)
GB (1) GB1485545A (ja)
HK (1) HK33378A (ja)
IT (1) IT1027234B (ja)
MY (1) MY8100095A (ja)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2447225C2 (de) * 1974-10-03 1983-12-22 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zum Ablösen von positiven Photolack
JPS5241002A (en) * 1975-09-29 1977-03-30 Chubu Rika Kk Regeneration method of ps plate material and regenerated plate
US4042387A (en) * 1976-05-05 1977-08-16 Rockwell International Corp Photolithographic method of making microcircuits using glycerine in photoresist stripping solution
US4169068A (en) * 1976-08-20 1979-09-25 Japan Synthetic Rubber Company Limited Stripping liquor composition for removing photoresists comprising hydrogen peroxide
US4140572A (en) * 1976-09-07 1979-02-20 General Electric Company Process for selective etching of polymeric materials embodying silicones therein
US4165295A (en) * 1976-10-04 1979-08-21 Allied Chemical Corporation Organic stripping compositions and method for using same
US4078102A (en) * 1976-10-29 1978-03-07 International Business Machines Corporation Process for stripping resist layers from substrates
US4242218A (en) * 1976-11-08 1980-12-30 Allied Chemical Corporation Phenol-free photoresist stripper
US4165294A (en) * 1976-11-08 1979-08-21 Allied Chemical Corporation Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids
US4215005A (en) * 1978-01-30 1980-07-29 Allied Chemical Corporation Organic stripping compositions and method for using same
US4187191A (en) * 1978-07-26 1980-02-05 General Motors Corporation Photoresist stripper with dodecylsulfonic acid and chlorinated solvents
US4386175A (en) * 1979-02-08 1983-05-31 Kokoku Rubber Industrial Company Limited Resin composition
FR2455075A1 (fr) * 1979-04-24 1980-11-21 Rhone Poulenc Ind Composition a base de solvants chlores pour l'elimination de resines photoresistantes
US4345022A (en) * 1979-11-13 1982-08-17 Matrix Unlimited, Inc. Process of recovering unpolymerized photopolymer from printing plates
JPS58204100A (ja) * 1982-05-24 1983-11-28 ダイキン工業株式会社 表面清浄化用組成物
US4608086A (en) * 1983-01-19 1986-08-26 Tennant Company Membrane remover/etchant
US4469525A (en) * 1983-01-19 1984-09-04 Tennant Company Membrane remover/etchant
US4617251A (en) * 1985-04-11 1986-10-14 Olin Hunt Specialty Products, Inc. Stripping composition and method of using the same
JPS6235357A (ja) * 1985-08-09 1987-02-16 Tokyo Ohka Kogyo Co Ltd ホトレジスト用剥離液
US4971715A (en) * 1988-11-18 1990-11-20 International Business Machines Corporation Phenolic-free stripping composition and use thereof
US5417802A (en) * 1994-03-18 1995-05-23 At&T Corp. Integrated circuit manufacturing
US5728664A (en) * 1996-04-15 1998-03-17 Ashland, Inc. Photoresist stripping compositions
US6348100B1 (en) * 1999-07-01 2002-02-19 International Business Machines Corporation Resist bowl cleaning
US6403286B1 (en) 1999-11-04 2002-06-11 Corning Incorporated High aspect ratio patterning of glass film
US6422246B1 (en) * 2000-02-29 2002-07-23 United Microelectronics Corp. Method removing residual photoresist
US6475292B1 (en) * 2000-07-31 2002-11-05 Shipley Company, L.L.C. Photoresist stripping method
US9487480B2 (en) 2010-05-21 2016-11-08 Siemens Healthcare Diagnostics Inc. Zwitterionic reagents

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3582401A (en) * 1967-11-15 1971-06-01 Mallinckrodt Chemical Works Photosensitive resist remover compositions and methods
US3813309A (en) * 1969-12-23 1974-05-28 Ibm Method for stripping resists from substrates
FR2109127A5 (en) * 1970-10-02 1972-05-26 Radiotechnique Compelec Solvent for photopolymerised acrylics -used eg in printed - circuit mfr contains methylene chloride and phenolics in emulsion

Also Published As

Publication number Publication date
FR2259128B3 (ja) 1977-09-16
AU7687074A (en) 1976-06-24
US3871929A (en) 1975-03-18
IT1027234B (it) 1978-11-20
CA1024867A (en) 1978-01-24
FR2259128A1 (ja) 1975-08-22
DE2501187C2 (de) 1984-04-19
GB1485545A (en) 1977-09-14
DE2501187A1 (de) 1975-07-31
JPS5852578B2 (ja) 1983-11-24
JPS50109730A (ja) 1975-08-29
MY8100095A (en) 1981-12-31

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