HK141294A - Coating metallic substrates by the pvd process - Google Patents
Coating metallic substrates by the pvd processInfo
- Publication number
- HK141294A HK141294A HK141294A HK141294A HK141294A HK 141294 A HK141294 A HK 141294A HK 141294 A HK141294 A HK 141294A HK 141294 A HK141294 A HK 141294A HK 141294 A HK141294 A HK 141294A
- Authority
- HK
- Hong Kong
- Prior art keywords
- alloy
- nickel
- copper
- palladium
- pvd
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/567—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
- C25D5/611—Smooth layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Electrochemistry (AREA)
- Mechanical Engineering (AREA)
- Electroplating Methods And Accessories (AREA)
- Laminated Bodies (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3809139A DE3809139A1 (de) | 1988-03-18 | 1988-03-18 | Verwendung einer palladium/nickel-legierungsschicht als zwischenschicht zwischen einem nichtkorrosionsbestaendigen oder wenig korrosionsbestaendigen metallischen grundmaterial und einer nach dem pvd-verfahren aufgebrachten beschichtung |
Publications (1)
Publication Number | Publication Date |
---|---|
HK141294A true HK141294A (en) | 1994-12-23 |
Family
ID=6350105
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK141294A HK141294A (en) | 1988-03-18 | 1994-12-15 | Coating metallic substrates by the pvd process |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPH0277585A (enrdf_load_stackoverflow) |
CH (1) | CH677366A5 (enrdf_load_stackoverflow) |
DE (1) | DE3809139A1 (enrdf_load_stackoverflow) |
GB (1) | GB2218111B (enrdf_load_stackoverflow) |
HK (1) | HK141294A (enrdf_load_stackoverflow) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4006550C1 (en) * | 1990-02-15 | 1991-06-27 | Anke Gmbh & Co. Kg Oberflaechentechnik, 4300 Essen, De | Textured rolls for processing steel etc. - have electrolytical treated, surface deposited with chromium coated with nitride by PVD or CVD |
DE4008254A1 (de) * | 1990-03-15 | 1991-09-19 | Huettl & Vester Gmbh | Verfahren zum herstellen von gravierten walzen oder platten |
US5252360A (en) * | 1990-03-15 | 1993-10-12 | Huettl Wolfgang | Process for the protection of an engraved roll or plate by coating an engraved surface with an interlayer and thereafter applying a wear-resistant layer to the interlayer by PVD |
US5384201A (en) * | 1991-05-31 | 1995-01-24 | Robert Bosch Gmbh | Tool for treating surfaces of structural parts and carrier material for the same |
DE4232429A1 (de) * | 1992-09-28 | 1994-03-31 | Bosch Gmbh Robert | Werkzeug zur Behandlung von Oberflächen von Bauteilen und Trägerwerkstoff für dieses Werkzeug |
AT400040B (de) * | 1993-06-02 | 1995-09-25 | Andritz Patentverwaltung | Verfahren und vorrichtung zur beschichtung von metallsubstraten, insbesondere stahl- oder aluminiumbblechen in bandform |
US5879532A (en) * | 1997-07-09 | 1999-03-09 | Masco Corporation Of Indiana | Process for applying protective and decorative coating on an article |
AU2001240599A1 (en) * | 2000-02-07 | 2001-08-14 | Cis Solartechnik Gmbh | Flexible metal substrate for cis solar cells, and method for producing the same |
US6489035B1 (en) * | 2000-02-08 | 2002-12-03 | Gould Electronics Inc. | Applying resistive layer onto copper |
DE10303650A1 (de) * | 2003-01-27 | 2004-07-29 | Hansgrohe Ag | Beschichtungsverfahren |
DE102004010762B4 (de) * | 2004-03-05 | 2006-06-29 | Daimlerchrysler Ag | Verbundbauteil |
EP1876268B1 (de) | 2006-06-13 | 2013-05-15 | Wolf-Dieter Franz | Cr-VI-freie Schwarzverchromung |
RU2329337C1 (ru) * | 2006-11-27 | 2008-07-20 | Вячеслав Вячеславович Рогожин | Электролит для электрохимического осаждения покрытий никель-бор |
DE202019104533U1 (de) * | 2019-08-16 | 2019-09-03 | Ec Europ Coating Gmbh | Beschichteter, metallischer Gebrauchsgegenstand oder beschichtete, metallische Komponente eines Gebrauchsgegenstandes |
CN110885996A (zh) * | 2019-12-25 | 2020-03-17 | 东莞立德精密工业有限公司 | 一种五金件表面处理工艺及五金件 |
CN114540813A (zh) * | 2022-02-24 | 2022-05-27 | 瑞鼎机电科技(昆山)有限公司 | 一种咖啡机按压板pvd镀膜工艺 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3647643A (en) * | 1969-09-29 | 1972-03-07 | Ibm | Process of fabricating a hybrid magnetic film |
CH539130A (de) * | 1970-02-27 | 1973-08-31 | Egyesuelt Izzolampa | Verfahren zur Aufdampfung von Schichten durch Vakuumaufdampfen |
DE2118977C3 (de) * | 1971-04-20 | 1974-06-20 | Vereinigte Flugtechnische Werkefokker Gmbh, 2800 Bremen | Verfahren zum Aufdampfen haftfester Silberschichten auf Titan oder Titanlegierungen |
DE3108508C2 (de) * | 1981-03-06 | 1983-06-30 | Langbein-Pfanhauser Werke Ag, 4040 Neuss | Bad zur galvanischen Abscheidung einer Palladium/Nickel-Legierung |
DE3232735C2 (de) * | 1981-09-11 | 1984-04-26 | LPW-Chemie GmbH, 4040 Neuss | Verwendung einer als Glanzbildnerzusatz zu Nickelbädern bekannten Verbindung als Korrosionsschutzadditiv |
GB2123039B (en) * | 1982-03-23 | 1985-10-23 | Atomic Energy Authority Uk | Coatings for cutting implements |
JPS60248892A (ja) * | 1984-05-24 | 1985-12-09 | Electroplating Eng Of Japan Co | 高純度パラジウム・ニッケル合金メッキ液及び方法 |
GB2168381B (en) * | 1984-12-12 | 1988-03-09 | Stc Plc | Gold plated electrical contacts |
US4628165A (en) * | 1985-09-11 | 1986-12-09 | Learonal, Inc. | Electrical contacts and methods of making contacts by electrodeposition |
-
1988
- 1988-03-18 DE DE3809139A patent/DE3809139A1/de active Granted
-
1989
- 1989-02-20 CH CH592/89A patent/CH677366A5/de not_active IP Right Cessation
- 1989-03-13 GB GB8905734A patent/GB2218111B/en not_active Expired - Lifetime
- 1989-03-15 JP JP1061083A patent/JPH0277585A/ja active Pending
-
1994
- 1994-12-15 HK HK141294A patent/HK141294A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE3809139C2 (enrdf_load_stackoverflow) | 1990-04-05 |
GB2218111B (en) | 1992-05-06 |
GB8905734D0 (en) | 1989-04-26 |
DE3809139A1 (de) | 1989-09-28 |
JPH0277585A (ja) | 1990-03-16 |
GB2218111A (en) | 1989-11-08 |
CH677366A5 (enrdf_load_stackoverflow) | 1991-05-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |