HK1210872A1 - 薄膜形成裝置及薄膜形成方法 - Google Patents

薄膜形成裝置及薄膜形成方法

Info

Publication number
HK1210872A1
HK1210872A1 HK15111466.5A HK15111466A HK1210872A1 HK 1210872 A1 HK1210872 A1 HK 1210872A1 HK 15111466 A HK15111466 A HK 15111466A HK 1210872 A1 HK1210872 A1 HK 1210872A1
Authority
HK
Hong Kong
Prior art keywords
thin
film formation
formation method
formation device
film
Prior art date
Application number
HK15111466.5A
Other languages
English (en)
Inventor
宮地章
奈良圭
小泉翔平
宮本健司
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1210872A1 publication Critical patent/HK1210872A1/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133305—Flexible substrates, e.g. plastics, organic film
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02—Bonding areas; Manufacturing methods related thereto
    • H01L2224/03—Manufacturing methods
    • H01L2224/033—Manufacturing methods by local deposition of the material of the bonding area
    • H01L2224/0331—Manufacturing methods by local deposition of the material of the bonding area in liquid form
    • H01L2224/03318—Manufacturing methods by local deposition of the material of the bonding area in liquid form by dispensing droplets

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mathematical Physics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Electroluminescent Light Sources (AREA)
  • Thin Film Transistor (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
HK15111466.5A 2012-10-19 2015-11-20 薄膜形成裝置及薄膜形成方法 HK1210872A1 (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012231877 2012-10-19
JP2012231876 2012-10-19
PCT/JP2013/076813 WO2014061451A1 (ja) 2012-10-19 2013-10-02 薄膜形成装置及び薄膜形成方法

Publications (1)

Publication Number Publication Date
HK1210872A1 true HK1210872A1 (zh) 2016-05-06

Family

ID=50488022

Family Applications (1)

Application Number Title Priority Date Filing Date
HK15111466.5A HK1210872A1 (zh) 2012-10-19 2015-11-20 薄膜形成裝置及薄膜形成方法

Country Status (5)

Country Link
JP (1) JP6119762B2 (zh)
KR (2) KR102015163B1 (zh)
CN (2) CN104737279B (zh)
HK (1) HK1210872A1 (zh)
WO (1) WO2014061451A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106915158B (zh) * 2016-06-01 2019-03-12 广东聚华印刷显示技术有限公司 印刷系统和方法
CN107046097B (zh) * 2017-05-11 2019-05-14 京东方科技集团股份有限公司 显示面板制造方法、显示面板的制造设备和显示面板
JP7280787B2 (ja) * 2019-09-20 2023-05-24 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005019955A (ja) * 2003-05-30 2005-01-20 Seiko Epson Corp 薄膜パターンの形成方法及びデバイスの製造方法、電気光学装置及び電子機器
JP2008500151A (ja) * 2004-05-28 2008-01-10 独立行政法人科学技術振興機構 パターン膜形成方法、装置と材料および製品
JP4593190B2 (ja) * 2004-07-15 2010-12-08 日東電工株式会社 液晶材料を配向させるための配向膜、その製造方法、配向液晶膜、光学フィルムおよび画像表示装置
GB2441702B (en) * 2005-06-21 2010-10-27 Konica Minolta Holdings Inc Method for forming thin organic semiconductor material film and method for producing organic thin-film transistor
CN102298235B (zh) * 2006-01-26 2015-05-27 夏普株式会社 液晶显示装置的制造方法和液晶显示装置
JP4961819B2 (ja) * 2006-04-26 2012-06-27 株式会社日立製作所 電界効果トランジスタ及びその製造方法
WO2008129819A1 (ja) 2007-04-13 2008-10-30 Nikon Corporation 表示素子の製造方法、表示素子の製造装置、及び表示素子
JP2009295678A (ja) * 2008-06-03 2009-12-17 Seiko Epson Corp 半導体装置の製造方法、強誘電体素子の製造方法および電子機器の製造方法
KR101323018B1 (ko) * 2009-10-02 2013-10-29 오사카 유니버시티 유기 반도체막의 제조 방법 및 유기 반도체막 어레이
EP2624285B1 (en) * 2010-09-29 2020-08-26 ULVAC, Inc. Thin film manufacturing method and thin film manufacturing apparatus

Also Published As

Publication number Publication date
JP6119762B2 (ja) 2017-04-26
KR20180100715A (ko) 2018-09-11
WO2014061451A1 (ja) 2014-04-24
KR102015163B1 (ko) 2019-08-27
CN107255870A (zh) 2017-10-17
JPWO2014061451A1 (ja) 2016-09-05
KR102081141B1 (ko) 2020-02-25
CN104737279A (zh) 2015-06-24
KR20150067191A (ko) 2015-06-17
CN104737279B (zh) 2017-07-04

Similar Documents

Publication Publication Date Title
HK1205921A1 (zh) 排泄物處理裝置及其方法
PL2696754T3 (pl) Urządzenie i sposób pomiaru stresu
EP2696428A4 (en) DEVICE AND METHOD FOR STRATIFICATION
EP2696421A4 (en) LAMINATION DEVICE AND LAMINATION METHOD
EP2696423A4 (en) LAMINATION DEVICE AND LAMINATION METHOD
EP2824417A4 (en) DISTANCE MEASUREMENT DEVICE AND DISTANCE CALCULATION METHOD
HK1201695A1 (zh) 麵條蒸製方法及麵條蒸製裝置
EP2672606A4 (en) DEVICE FOR CHARGING CHECK AND METHOD FOR CHARGING CHECK
EP2700357A4 (en) CONCENTRATION MEASUREMENT DEVICE AND CONCENTRATION METHOD
EP2824416A4 (en) DISTANCE CALCULATING DEVICE AND DISTANCE CALCULATING METHOD
EP2696419A4 (en) DEVICE AND METHOD FOR STRATIFICATION
EP2907896A4 (en) FILM FORMATION METHOD AND FILM FORMING DEVICE
EP2755363A4 (en) METHOD AND DEVICE FOR FAST DATA DISTRIBUTION
EP2806084A4 (en) SHAPING DEVICE AND CONSTRUCTION PROCESS WITH THE FORMING DEVICE
HK1207461A1 (zh) 圖形繪製設備和圖形繪製方法
EP2891535A4 (en) TURNING METHOD AND TURNING DEVICE
GB201101862D0 (en) Method and device
HK1180734A1 (zh) 薄膜形成方法和薄膜形成裝置
EP2827471A4 (en) CIRCULAR RECEIVING DEVICE AND CURRENT RECEIVING METHOD
EP2804539A4 (en) DEVICE AND METHOD FOR ACQUIRING TISSUE
GB201217606D0 (en) Neurosurgical device and method
EP2835742A4 (en) ADMINISTRATIVE APPROACH AND ADMINISTRATIVE PROCEDURE
EP2908487A4 (en) NETWORKING METHOD AND NETWORKING DEVICE
GB201222362D0 (en) Device and method
HK1210872A1 (zh) 薄膜形成裝置及薄膜形成方法

Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20211007