HK1210872A1 - Thin-film formation device and thin-film formation method - Google Patents

Thin-film formation device and thin-film formation method

Info

Publication number
HK1210872A1
HK1210872A1 HK15111466.5A HK15111466A HK1210872A1 HK 1210872 A1 HK1210872 A1 HK 1210872A1 HK 15111466 A HK15111466 A HK 15111466A HK 1210872 A1 HK1210872 A1 HK 1210872A1
Authority
HK
Hong Kong
Prior art keywords
thin
film formation
formation method
formation device
film
Prior art date
Application number
HK15111466.5A
Other languages
Chinese (zh)
Inventor
宮地章
奈良圭
小泉翔平
宮本健司
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1210872A1 publication Critical patent/HK1210872A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133305—Flexible substrates, e.g. plastics, organic film
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02—Bonding areas; Manufacturing methods related thereto
    • H01L2224/03—Manufacturing methods
    • H01L2224/033—Manufacturing methods by local deposition of the material of the bonding area
    • H01L2224/0331—Manufacturing methods by local deposition of the material of the bonding area in liquid form
    • H01L2224/03318—Manufacturing methods by local deposition of the material of the bonding area in liquid form by dispensing droplets

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Electroluminescent Light Sources (AREA)
  • Thin Film Transistor (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
HK15111466.5A 2012-10-19 2015-11-20 Thin-film formation device and thin-film formation method HK1210872A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012231877 2012-10-19
JP2012231876 2012-10-19
PCT/JP2013/076813 WO2014061451A1 (en) 2012-10-19 2013-10-02 Thin-film formation device and thin-film formation method

Publications (1)

Publication Number Publication Date
HK1210872A1 true HK1210872A1 (en) 2016-05-06

Family

ID=50488022

Family Applications (1)

Application Number Title Priority Date Filing Date
HK15111466.5A HK1210872A1 (en) 2012-10-19 2015-11-20 Thin-film formation device and thin-film formation method

Country Status (5)

Country Link
JP (1) JP6119762B2 (en)
KR (2) KR102015163B1 (en)
CN (2) CN104737279B (en)
HK (1) HK1210872A1 (en)
WO (1) WO2014061451A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106915158B (en) * 2016-06-01 2019-03-12 广东聚华印刷显示技术有限公司 Printing system and method
CN107046097B (en) * 2017-05-11 2019-05-14 京东方科技集团股份有限公司 Display panel manufacturing method, the manufacturing equipment of display panel and display panel
JP7280787B2 (en) * 2019-09-20 2023-05-24 株式会社Ｓｃｒｅｅｎホールディングス Substrate processing equipment

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005019955A (en) * 2003-05-30 2005-01-20 Seiko Epson Corp Method for forming thin film pattern and method for manufacturing corresponding devices, electro-optic device and electronic instrument
JP2008500151A (en) * 2004-05-28 2008-01-10 独立行政法人科学技術振興機構 Pattern film forming method, apparatus, material and product
JP4593190B2 (en) * 2004-07-15 2010-12-08 日東電工株式会社 Alignment film for aligning liquid crystal material, manufacturing method thereof, alignment liquid crystal film, optical film, and image display device
JPWO2006137233A1 (en) * 2005-06-21 2009-01-08 コニカミノルタホールディングス株式会社 Method for forming organic semiconductor material thin film and method for producing organic thin film transistor
JP4493697B2 (en) * 2006-01-26 2010-06-30 シャープ株式会社 Method for manufacturing liquid crystal display device and liquid crystal display device
JP4961819B2 (en) * 2006-04-26 2012-06-27 株式会社日立製作所 Field effect transistor and manufacturing method thereof
EP2138992B1 (en) 2007-04-13 2017-08-02 Nikon Corporation Display element manufacturing method
JP2009295678A (en) * 2008-06-03 2009-12-17 Seiko Epson Corp Method for manufacturing semiconductor device, method for manufacturing ferroelectric element, and method for manufacturing electronic apparatus
CN102598232B (en) * 2009-10-02 2015-06-24 国立大学法人大阪大学 Method for manufacturing organic semiconductor film, and organic semiconductor film array
US9145605B2 (en) * 2010-09-29 2015-09-29 Ulvac, Inc. Thin-film forming method and thin-film forming apparatus

Also Published As

Publication number Publication date
KR102015163B1 (en) 2019-08-27
JPWO2014061451A1 (en) 2016-09-05
KR102081141B1 (en) 2020-02-25
KR20150067191A (en) 2015-06-17
JP6119762B2 (en) 2017-04-26
CN104737279B (en) 2017-07-04
KR20180100715A (en) 2018-09-11
CN104737279A (en) 2015-06-24
CN107255870A (en) 2017-10-17
WO2014061451A1 (en) 2014-04-24

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20211007