HK1210566A1 - 等離子體產生裝置 - Google Patents
等離子體產生裝置Info
- Publication number
- HK1210566A1 HK1210566A1 HK15111179.3A HK15111179A HK1210566A1 HK 1210566 A1 HK1210566 A1 HK 1210566A1 HK 15111179 A HK15111179 A HK 15111179A HK 1210566 A1 HK1210566 A1 HK 1210566A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- plasma generator
- plasma
- generator
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32348—Dielectric barrier discharge
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2439—Surface discharges, e.g. air flow control
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2441—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes characterised by the physical-chemical properties of the dielectric, e.g. porous dielectric
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/335—Cleaning
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2245/00—Applications of plasma devices
- H05H2245/30—Medical applications
- H05H2245/36—Sterilisation of objects, liquids, volumes or surfaces
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013019918 | 2013-02-04 | ||
| PCT/JP2014/050262 WO2014119349A1 (ja) | 2013-02-04 | 2014-01-09 | プラズマ発生装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| HK1210566A1 true HK1210566A1 (zh) | 2016-04-22 |
Family
ID=51262064
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| HK15111179.3A HK1210566A1 (zh) | 2013-02-04 | 2015-11-12 | 等離子體產生裝置 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US9536709B2 (zh) |
| EP (1) | EP2953431B1 (zh) |
| JP (1) | JP6277493B2 (zh) |
| KR (1) | KR102094056B1 (zh) |
| CN (1) | CN104938038B (zh) |
| HK (1) | HK1210566A1 (zh) |
| SG (1) | SG11201505669TA (zh) |
| TW (1) | TW201436649A (zh) |
| WO (1) | WO2014119349A1 (zh) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2529173B (en) * | 2014-08-12 | 2016-08-24 | Novaerus Patents Ltd | Flexible electrode assembly for plasma generation and air ducting system including the electrode assembly |
| ES2870123T3 (es) | 2014-08-18 | 2021-10-26 | Creative Tech Corp | Dispositivo de captación de polvo |
| KR101657895B1 (ko) * | 2015-05-14 | 2016-09-19 | 광운대학교 산학협력단 | 플라즈마 패드 |
| US10034363B2 (en) * | 2015-05-15 | 2018-07-24 | University Of Florida Research Foundation, Inc. | Nitrophobic surface for extreme thrust gain |
| EP3299034B1 (en) * | 2015-05-21 | 2020-09-23 | Creative Technology Corporation | Sterilization case |
| SG11201708672PA (en) * | 2015-05-27 | 2017-11-29 | Creative Tech Corp | Sterilizing sheet |
| EP3118884A1 (en) * | 2015-07-15 | 2017-01-18 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO | Electrode assembly for a dielectric barrier discharge plasma source and method of manufacturing such an electrode assembly |
| US10793953B2 (en) * | 2016-01-18 | 2020-10-06 | Toshiba Mitsubishi-Electric Industrial Systems Corporation | Activated gas generation apparatus and film-formation treatment apparatus |
| KR101795944B1 (ko) | 2016-07-05 | 2017-11-08 | 광운대학교 산학협력단 | 플라즈마 패드 |
| WO2018026025A1 (ko) * | 2016-08-02 | 2018-02-08 | 주식회사 피글 | 플라즈마 치료 장치 |
| ES2875845T3 (es) * | 2016-08-26 | 2021-11-11 | Creative Tech Corp | Limpiador de zapatos |
| DE102016118569A1 (de) * | 2016-09-30 | 2018-04-05 | Cinogy Gmbh | Elektrodenanordnung zur Ausbildung einer dielektrisch behinderten Plasmaentladung |
| TWI609834B (zh) * | 2016-10-24 | 2018-01-01 | 龍華科技大學 | 手扶梯殺菌裝置 |
| NL2017822B1 (en) * | 2016-11-18 | 2018-05-25 | Plasmacure B V | Non-Thermal Plasma Device with electromagnetic compatibility control |
| US10262836B2 (en) * | 2017-04-28 | 2019-04-16 | Seongsik Chang | Energy-efficient plasma processes of generating free charges, ozone, and light |
| DE102017111902B4 (de) * | 2017-05-31 | 2020-12-31 | Cinogy Gmbh | Flächige Auflageanordnung |
| CN107949137A (zh) * | 2017-11-02 | 2018-04-20 | 大连民族大学 | 一种自适应柔性放电等离子体装置 |
| KR102127038B1 (ko) * | 2017-11-16 | 2020-06-25 | 광운대학교 산학협력단 | 착용성 플라즈마 의류 |
| US10925144B2 (en) * | 2019-06-14 | 2021-02-16 | NanoGuard Technologies, LLC | Electrode assembly, dielectric barrier discharge system and use thereof |
| KR102168275B1 (ko) * | 2020-06-19 | 2020-10-21 | 광운대학교 산학협력단 | 착용성 플라즈마 의류 |
| DE102021128964B3 (de) * | 2021-11-08 | 2023-03-09 | Hochschule für angewandte Wissenschaft und Kunst Hildesheim/Holzminden/Göttingen, Körperschaft des öffentlichen Rechts | Verfahren und Vorrichtung zur Erzeugung von Plasmen mit erhöhter Pulsenergie durch dielektrisch behinderte elektrische Entladungen |
| FR3139997A1 (fr) * | 2022-09-28 | 2024-03-29 | Prodea Depolluting | Dispositif de traitement d’une phase gazeuse par plasma et procédé associé |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0997926B1 (en) * | 1998-10-26 | 2006-01-04 | Matsushita Electric Works, Ltd. | Plasma treatment apparatus and method |
| JP4763974B2 (ja) * | 2003-05-27 | 2011-08-31 | パナソニック電工株式会社 | プラズマ処理装置及びプラズマ処理方法 |
| US7543546B2 (en) * | 2003-05-27 | 2009-06-09 | Matsushita Electric Works, Ltd. | Plasma processing apparatus, method for producing reaction vessel for plasma generation, and plasma processing method |
| JP4579522B2 (ja) * | 2003-09-29 | 2010-11-10 | 株式会社イー・スクエア | プラズマ表面処理装置 |
| JP2005243905A (ja) | 2004-02-26 | 2005-09-08 | Kansai Tlo Kk | プラズマ処理方法およびプラズマ処理装置 |
| JP4320637B2 (ja) | 2004-04-08 | 2009-08-26 | 三菱電機株式会社 | オゾン発生装置およびオゾン発生方法 |
| JP4946860B2 (ja) * | 2005-02-17 | 2012-06-06 | コニカミノルタホールディングス株式会社 | ガスバリアフィルム及びその製造方法、並びに該ガスバリアフィルムを用いた、有機ｅｌ素子用樹脂基材、有機ｅｌ素子 |
| JP2006331664A (ja) | 2005-05-23 | 2006-12-07 | Sharp Corp | プラズマ処理装置 |
| DE102005029360B4 (de) * | 2005-06-24 | 2011-11-10 | Softal Corona & Plasma Gmbh | Zwei Verfahren zur kontinuierlichen Atmosphärendruck Plasmabehandlung von Werkstücken, insbesondere Materialplatten oder -bahnen |
| EP1933605B1 (en) * | 2005-09-16 | 2019-05-15 | Toyo Advanced Technologies Co., Ltd. | Plasma generating device and plasma generating method |
| SK51082006A3 (sk) | 2006-12-05 | 2008-07-07 | Fakulta Matematiky, Fyziky A Informatiky Univerzitfakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Hoy Komensk�Ho | Zariadenie a spôsob úpravy povrchov kovov a metaloZariadenie a spôsob úpravy povrchov kovov a metaloidov, oxidov kovov a oxidov metaloidov a nitridovidov, oxidov kovov a oxidov metaloidov a nitridovkovov a nitridov metaloidovkovov a nitridov metaloidov |
| US7999173B1 (en) * | 2007-03-21 | 2011-08-16 | The United States Of America As Represented By The Administrator Of National Aeronautics And Space Administration | Dust removal from solar cells |
| CN101279101A (zh) | 2007-04-02 | 2008-10-08 | 张涉 | 一种常压低温等离子体除臭器 |
| WO2009005895A2 (en) * | 2007-05-08 | 2009-01-08 | University Of Florida Research Foundation, Inc. | Method and apparatus for multibarrier plasma actuated high performance flow control |
| JP2009064993A (ja) | 2007-09-07 | 2009-03-26 | Kawai Musical Instr Mfg Co Ltd | 溶液層の処理方法 |
| WO2009098622A2 (en) * | 2008-02-08 | 2009-08-13 | Koninklijke Philips Electronics N.V. | Autostereoscopic display device |
| CN201805613U (zh) * | 2010-05-31 | 2011-04-20 | 中国航空工业空气动力研究院 | 柔性带状等离子体发生器 |
| US20130075382A1 (en) * | 2010-06-07 | 2013-03-28 | University Of Florida Research Foundation, Inc. | Dielectric barrier discharge wind tunnel |
| CN102036460B (zh) * | 2010-12-10 | 2013-01-02 | 西安交通大学 | 平板式等离子体发生装置 |
| GB201107692D0 (en) | 2011-05-09 | 2011-06-22 | Snowball Malcolm R | Sterilisation of packed articles |
-
2014
- 2014-01-09 WO PCT/JP2014/050262 patent/WO2014119349A1/ja active Application Filing
- 2014-01-09 EP EP14746259.2A patent/EP2953431B1/en active Active
- 2014-01-09 US US14/763,931 patent/US9536709B2/en active Active
- 2014-01-09 KR KR1020157019668A patent/KR102094056B1/ko active IP Right Grant
- 2014-01-09 JP JP2014559606A patent/JP6277493B2/ja active Active
- 2014-01-09 SG SG11201505669TA patent/SG11201505669TA/en unknown
- 2014-01-09 CN CN201480005750.6A patent/CN104938038B/zh active Active
- 2014-01-23 TW TW103102420A patent/TW201436649A/zh unknown
-
2015
- 2015-11-12 HK HK15111179.3A patent/HK1210566A1/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| US20150371829A1 (en) | 2015-12-24 |
| KR102094056B1 (ko) | 2020-03-26 |
| JP6277493B2 (ja) | 2018-02-14 |
| CN104938038A (zh) | 2015-09-23 |
| EP2953431A4 (en) | 2015-12-09 |
| EP2953431B1 (en) | 2018-04-18 |
| CN104938038B (zh) | 2017-06-16 |
| WO2014119349A1 (ja) | 2014-08-07 |
| SG11201505669TA (en) | 2015-09-29 |
| EP2953431A1 (en) | 2015-12-09 |
| KR20150114474A (ko) | 2015-10-12 |
| US9536709B2 (en) | 2017-01-03 |
| JPWO2014119349A1 (ja) | 2017-01-26 |
| TW201436649A (zh) | 2014-09-16 |
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