HK1205279A1 - Liquid immersion member and exposure apparatus - Google Patents

Liquid immersion member and exposure apparatus

Info

Publication number
HK1205279A1
HK1205279A1 HK15105595.1A HK15105595A HK1205279A1 HK 1205279 A1 HK1205279 A1 HK 1205279A1 HK 15105595 A HK15105595 A HK 15105595A HK 1205279 A1 HK1205279 A1 HK 1205279A1
Authority
HK
Hong Kong
Prior art keywords
exposure apparatus
liquid immersion
immersion member
liquid
exposure
Prior art date
Application number
HK15105595.1A
Other languages
English (en)
Chinese (zh)
Inventor
Sato Shinji
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1205279A1 publication Critical patent/HK1205279A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
HK15105595.1A 2012-04-10 2015-06-12 Liquid immersion member and exposure apparatus HK1205279A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261622182P 2012-04-10 2012-04-10
US13/800,448 US9268231B2 (en) 2012-04-10 2013-03-13 Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
PCT/JP2013/059432 WO2013153965A1 (en) 2012-04-10 2013-03-22 Liquid immersion member and exposure apparatus

Publications (1)

Publication Number Publication Date
HK1205279A1 true HK1205279A1 (en) 2015-12-11

Family

ID=49292051

Family Applications (3)

Application Number Title Priority Date Filing Date
HK15105595.1A HK1205279A1 (en) 2012-04-10 2015-06-12 Liquid immersion member and exposure apparatus
HK15108507.2A HK1207908A1 (en) 2012-04-10 2015-09-01 Liquid immersion member and exposure apparatus
HK18116511.6A HK1257550A1 (zh) 2012-04-10 2018-12-24 液浸構件及曝光裝置

Family Applications After (2)

Application Number Title Priority Date Filing Date
HK15108507.2A HK1207908A1 (en) 2012-04-10 2015-09-01 Liquid immersion member and exposure apparatus
HK18116511.6A HK1257550A1 (zh) 2012-04-10 2018-12-24 液浸構件及曝光裝置

Country Status (8)

Country Link
US (5) US9268231B2 (ja)
EP (1) EP2836876B1 (ja)
JP (3) JP6447131B2 (ja)
KR (1) KR102147071B1 (ja)
CN (2) CN104508560B (ja)
HK (3) HK1205279A1 (ja)
TW (3) TWI668520B (ja)
WO (1) WO2013153965A1 (ja)

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US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9494870B2 (en) * 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
JP6369472B2 (ja) 2013-10-08 2018-08-08 株式会社ニコン 液浸部材、露光装置及び露光方法、並びにデバイス製造方法
US10268121B2 (en) * 2015-09-30 2019-04-23 Nikon Corporation Exposure apparatus and exposure method, and flat panel display manufacturing method
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JP6610726B2 (ja) * 2018-07-11 2019-11-27 株式会社ニコン 液浸部材、露光装置及び露光方法、並びにデバイス製造方法

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US6452292B1 (en) 2000-06-26 2002-09-17 Nikon Corporation Planar motor with linear coil arrays
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KR100651579B1 (ko) * 2005-11-15 2006-11-29 매그나칩 반도체 유한회사 이에스디 보호회로
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SG2014011563A (en) 2006-01-19 2014-05-29 Nippon Kogaku Kk Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method
US8477283B2 (en) * 2006-05-10 2013-07-02 Nikon Corporation Exposure apparatus and device manufacturing method
US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
US8068209B2 (en) 2007-03-23 2011-11-29 Nikon Corporation Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
JP2009088037A (ja) * 2007-09-28 2009-04-23 Nikon Corp 露光方法及びデバイス製造方法、並びに露光装置
JP5084432B2 (ja) * 2007-10-05 2012-11-28 キヤノン株式会社 露光方法、露光装置およびデバイス製造方法
US8610873B2 (en) 2008-03-17 2013-12-17 Nikon Corporation Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
US8289497B2 (en) 2008-03-18 2012-10-16 Nikon Corporation Apparatus and methods for recovering fluid in immersion lithography
KR20090124179A (ko) * 2008-05-29 2009-12-03 삼성전자주식회사 노광 장치의 빔위치 오차 측정 방법 및 이를 이용한 노광장치
JP2010016166A (ja) * 2008-07-03 2010-01-21 Canon Inc 走査型露光装置および露光方法、ならびにデバイス製造方法
NL2003835A (en) * 2008-12-22 2010-06-23 Asml Netherlands Bv Lithographic apparatus and control method.
US8896806B2 (en) * 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP2010157726A (ja) * 2008-12-29 2010-07-15 Nikon Corp 露光装置、露光方法、及びデバイス製造方法
EP2523210A1 (en) 2010-01-08 2012-11-14 Nikon Corporation Liquid-immersion member, exposing device, exposing method, and device manufacturing method
JP5495948B2 (ja) * 2010-05-27 2014-05-21 キヤノン株式会社 ステージ装置、露光装置及びデバイスの製造方法
US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

Also Published As

Publication number Publication date
TWI668520B (zh) 2019-08-11
US9268231B2 (en) 2016-02-23
CN104508560A (zh) 2015-04-08
JP6593493B2 (ja) 2019-10-23
HK1207908A1 (en) 2016-02-12
CN104508560B (zh) 2018-05-22
JP6447131B2 (ja) 2019-01-09
TW201935146A (zh) 2019-09-01
US20160161860A1 (en) 2016-06-09
US9927724B2 (en) 2018-03-27
US9557654B2 (en) 2017-01-31
US20170108786A1 (en) 2017-04-20
HK1257550A1 (zh) 2019-10-25
US20190391503A1 (en) 2019-12-26
TW201348890A (zh) 2013-12-01
TWI606305B (zh) 2017-11-21
EP2836876B1 (en) 2020-08-05
CN108614393A (zh) 2018-10-02
WO2013153965A1 (en) 2013-10-17
US10768537B2 (en) 2020-09-08
TW201740219A (zh) 2017-11-16
US10409177B2 (en) 2019-09-10
US20180217511A1 (en) 2018-08-02
JP2015514304A (ja) 2015-05-18
JP2019215586A (ja) 2019-12-19
KR102147071B1 (ko) 2020-08-24
JP2018136581A (ja) 2018-08-30
EP2836876A1 (en) 2015-02-18
KR20150003276A (ko) 2015-01-08
US20130265556A1 (en) 2013-10-10

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