HK1190228A1 - 用於背側照明圖像傳感器的黑色參考像素 - Google Patents
用於背側照明圖像傳感器的黑色參考像素Info
- Publication number
- HK1190228A1 HK1190228A1 HK14103165.7A HK14103165A HK1190228A1 HK 1190228 A1 HK1190228 A1 HK 1190228A1 HK 14103165 A HK14103165 A HK 14103165A HK 1190228 A1 HK1190228 A1 HK 1190228A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- image sensor
- reference pixel
- black reference
- illuminated image
- backside illuminated
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1462—Coatings
- H01L27/14621—Colour filter arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1464—Back illuminated imager structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
- H01L27/14685—Process for coatings or optical elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
- H01L27/14645—Colour imagers
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/028,590 US8482639B2 (en) | 2008-02-08 | 2008-02-08 | Black reference pixel for backside illuminated image sensor |
PCT/US2009/032897 WO2009100038A1 (en) | 2008-02-08 | 2009-02-02 | Black reference pixel for backside illuminated image sensor |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1190228A1 true HK1190228A1 (zh) | 2014-06-27 |
Family
ID=40481743
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK14103165.7A HK1190228A1 (zh) | 2008-02-08 | 2014-04-02 | 用於背側照明圖像傳感器的黑色參考像素 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8482639B2 (zh) |
EP (1) | EP2253016B1 (zh) |
CN (1) | CN103430311B (zh) |
HK (1) | HK1190228A1 (zh) |
TW (1) | TWI541986B (zh) |
WO (1) | WO2009100038A1 (zh) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8233066B2 (en) * | 2010-02-18 | 2012-07-31 | Omnivision Technologies, Inc. | Image sensor with improved black level calibration |
US8338856B2 (en) | 2010-08-10 | 2012-12-25 | Omnivision Technologies, Inc. | Backside illuminated image sensor with stressed film |
US8836835B2 (en) * | 2010-10-04 | 2014-09-16 | International Business Machines Corporation | Pixel sensor cell with hold node for leakage cancellation and methods of manufacture and design structure |
US8390712B2 (en) | 2010-12-08 | 2013-03-05 | Aptina Imaging Corporation | Image sensing pixels with feedback loops for imaging systems |
US8643750B2 (en) * | 2010-12-22 | 2014-02-04 | Omnivision Technologies, Inc. | Reducing noise in image sensors by concurrently reading reset and image signal levels from active and reference pixels |
US8455971B2 (en) * | 2011-02-14 | 2013-06-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Apparatus and method for improving charge transfer in backside illuminated image sensor |
US9232162B2 (en) | 2011-11-08 | 2016-01-05 | Semiconductor Components Industries, Llc | Optical isolation of optically black pixels in image sensors |
US9224773B2 (en) | 2011-11-30 | 2015-12-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Metal shielding layer in backside illumination image sensor chips and methods for forming the same |
FR2991083A1 (fr) * | 2012-05-24 | 2013-11-29 | St Microelectronics Grenoble 2 | Procede et dispositif de protection d'un circuit integre contre des attaques par sa face arriere |
JP6116878B2 (ja) * | 2012-12-03 | 2017-04-19 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
US9224782B2 (en) | 2013-04-19 | 2015-12-29 | Semiconductor Components Industries, Llc | Imaging systems with reference pixels for image flare mitigation |
JP6127869B2 (ja) * | 2013-09-25 | 2017-05-17 | ソニー株式会社 | 固体撮像素子及びその駆動方法、並びに電子機器 |
US9859326B2 (en) * | 2014-01-24 | 2018-01-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor devices, image sensors, and methods of manufacture thereof |
WO2015144972A1 (en) * | 2014-03-27 | 2015-10-01 | Nokia Technologies Oy | An apparatus with nanoparticle reference pixel and associated methods |
KR102155480B1 (ko) | 2014-07-07 | 2020-09-14 | 삼성전자 주식회사 | 이미지 센서, 이를 포함하는 이미지 처리 시스템, 및 이를 포함하는 휴대용 전자 장치 |
US9743027B2 (en) * | 2015-06-24 | 2017-08-22 | Semiconductor Components Industries, Llc | Image sensor with high dynamic range and method |
KR102593949B1 (ko) | 2018-07-25 | 2023-10-27 | 삼성전자주식회사 | 이미지 센서 |
KR20220126322A (ko) | 2021-03-08 | 2022-09-16 | 삼성전자주식회사 | 이미지 센서, 이미지 센서의 동작 방법, 그리고 이미지 센서를 포함하는 전자 장치 |
Family Cites Families (32)
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US4760031A (en) * | 1986-03-03 | 1988-07-26 | California Institute Of Technology | Producing CCD imaging sensor with flashed backside metal film |
JP2917361B2 (ja) | 1990-02-17 | 1999-07-12 | ソニー株式会社 | 固体撮像素子 |
US5688715A (en) * | 1990-03-29 | 1997-11-18 | The United States Of America As Represented By The Secretary Of The Navy | Excimer laser dopant activation of backside illuminated CCD's |
US5880777A (en) * | 1996-04-15 | 1999-03-09 | Massachusetts Institute Of Technology | Low-light-level imaging and image processing |
JP3571924B2 (ja) * | 1998-07-09 | 2004-09-29 | 株式会社東芝 | 固体撮像装置 |
JP2000196060A (ja) * | 1998-12-24 | 2000-07-14 | Nec Corp | 固体撮像装置およびその製造方法 |
JP4284752B2 (ja) | 1999-05-31 | 2009-06-24 | ソニー株式会社 | 固体撮像素子 |
US6168965B1 (en) * | 1999-08-12 | 2001-01-02 | Tower Semiconductor Ltd. | Method for making backside illuminated image sensor |
JP2001339643A (ja) * | 2000-05-30 | 2001-12-07 | Nec Corp | 固体撮像装置用黒レベル発生回路及び固体撮像装置 |
US7064785B2 (en) * | 2002-02-07 | 2006-06-20 | Eastman Kodak Company | Apparatus and method of correcting for dark current in a solid state image sensor |
JP3737466B2 (ja) * | 2002-09-09 | 2006-01-18 | Necエレクトロニクス株式会社 | 固体撮像装置及びその製造方法 |
US6960796B2 (en) * | 2002-11-26 | 2005-11-01 | Micron Technology, Inc. | CMOS imager pixel designs with storage capacitor |
US20040169248A1 (en) * | 2003-01-31 | 2004-09-02 | Intevac, Inc. | Backside thinning of image array devices |
US7005637B2 (en) * | 2003-01-31 | 2006-02-28 | Intevac, Inc. | Backside thinning of image array devices |
US7385636B2 (en) * | 2004-04-30 | 2008-06-10 | Eastman Kodak Company | Low noise sample and hold circuit for image sensors |
JP4211696B2 (ja) | 2004-06-30 | 2009-01-21 | ソニー株式会社 | 固体撮像装置の製造方法 |
US7615808B2 (en) * | 2004-09-17 | 2009-11-10 | California Institute Of Technology | Structure for implementation of back-illuminated CMOS or CCD imagers |
CN100536151C (zh) | 2005-03-11 | 2009-09-02 | 富士通微电子株式会社 | 具有嵌入式光电二极管区域的图像传感器及其制造方法 |
US7247829B2 (en) * | 2005-04-20 | 2007-07-24 | Fujifilm Corporation | Solid-state image sensor with an optical black area having pixels for detecting black level |
JP4944399B2 (ja) * | 2005-07-04 | 2012-05-30 | キヤノン株式会社 | 固体撮像装置 |
US20070259463A1 (en) * | 2006-05-02 | 2007-11-08 | Youssef Abedini | Wafer-level method for thinning imaging sensors for backside illumination |
US7781715B2 (en) * | 2006-09-20 | 2010-08-24 | Fujifilm Corporation | Backside illuminated imaging device, semiconductor substrate, imaging apparatus and method for manufacturing backside illuminated imaging device |
KR100791346B1 (ko) * | 2006-12-05 | 2008-01-03 | 삼성전자주식회사 | 이미지 센서 제조 방법 및 이에 따라 제조된 이미지 센서 |
JP4619375B2 (ja) * | 2007-02-21 | 2011-01-26 | ソニー株式会社 | 固体撮像装置および撮像装置 |
JP4659783B2 (ja) * | 2007-06-14 | 2011-03-30 | 富士フイルム株式会社 | 裏面照射型撮像素子の製造方法 |
JP4881833B2 (ja) * | 2007-10-29 | 2012-02-22 | 富士フイルム株式会社 | カラー画像撮像用固体撮像素子 |
JP5047243B2 (ja) * | 2008-09-26 | 2012-10-10 | シャープ株式会社 | 光学素子ウエハモジュール、光学素子モジュール、光学素子モジュールの製造方法、電子素子ウエハモジュール、電子素子モジュールの製造方法、電子素子モジュールおよび電子情報機器 |
JP5521312B2 (ja) * | 2008-10-31 | 2014-06-11 | ソニー株式会社 | 固体撮像装置及びその製造方法、並びに電子機器 |
KR101550067B1 (ko) * | 2008-12-24 | 2015-09-03 | 인텔렉추얼디스커버리 주식회사 | 이미지 센서 및 이의 제조 방법 |
JP5453832B2 (ja) * | 2009-02-20 | 2014-03-26 | ソニー株式会社 | 固体撮像装置および撮像装置 |
JP5445147B2 (ja) * | 2010-01-07 | 2014-03-19 | 富士通株式会社 | リスト構造制御回路 |
US8233066B2 (en) * | 2010-02-18 | 2012-07-31 | Omnivision Technologies, Inc. | Image sensor with improved black level calibration |
-
2008
- 2008-02-08 US US12/028,590 patent/US8482639B2/en active Active
-
2009
- 2009-02-02 WO PCT/US2009/032897 patent/WO2009100038A1/en active Application Filing
- 2009-02-02 EP EP09708928.8A patent/EP2253016B1/en active Active
- 2009-02-02 CN CN200980104591.4A patent/CN103430311B/zh active Active
- 2009-02-06 TW TW098103971A patent/TWI541986B/zh active
-
2014
- 2014-04-02 HK HK14103165.7A patent/HK1190228A1/zh unknown
Also Published As
Publication number | Publication date |
---|---|
EP2253016A1 (en) | 2010-11-24 |
US8482639B2 (en) | 2013-07-09 |
CN103430311B (zh) | 2016-02-17 |
US20090201393A1 (en) | 2009-08-13 |
WO2009100038A1 (en) | 2009-08-13 |
TWI541986B (zh) | 2016-07-11 |
TW200952162A (en) | 2009-12-16 |
CN103430311A (zh) | 2013-12-04 |
EP2253016B1 (en) | 2014-04-09 |
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