HK1172377A1 - Cathode for electrolytic processes - Google Patents
Cathode for electrolytic processesInfo
- Publication number
- HK1172377A1 HK1172377A1 HK12113144.4A HK12113144A HK1172377A1 HK 1172377 A1 HK1172377 A1 HK 1172377A1 HK 12113144 A HK12113144 A HK 12113144A HK 1172377 A1 HK1172377 A1 HK 1172377A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- cathode
- electrolytic processes
- electrolytic
- processes
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1225—Deposition of multilayers of inorganic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1241—Metallic substrates
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/02—Hydrogen or oxygen
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/34—Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/097—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds comprising two or more noble metals or noble metal alloys
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Thermal Sciences (AREA)
- Physics & Mathematics (AREA)
- Electrochemistry (AREA)
- Ceramic Engineering (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Catalysts (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Secondary Cells (AREA)
- Electrolytic Production Of Metals (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT001719A ITMI20091719A1 (it) | 2009-10-08 | 2009-10-08 | Catodo per processi elettrolitici |
| PCT/EP2010/064964 WO2011042484A1 (en) | 2009-10-08 | 2010-10-07 | Cathode for electrolytic processes |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| HK1172377A1 true HK1172377A1 (en) | 2013-04-19 |
Family
ID=42237207
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| HK12113144.4A HK1172377A1 (en) | 2009-10-08 | 2012-12-20 | Cathode for electrolytic processes |
Country Status (22)
| Country | Link |
|---|---|
| US (1) | US8313623B2 (xx) |
| EP (1) | EP2486171B1 (xx) |
| JP (1) | JP5680655B2 (xx) |
| KR (1) | KR101710346B1 (xx) |
| CN (1) | CN102549197B (xx) |
| AR (1) | AR078562A1 (xx) |
| AU (1) | AU2010305403B2 (xx) |
| BR (1) | BR112012007988B1 (xx) |
| CA (1) | CA2773677C (xx) |
| CL (1) | CL2012000832A1 (xx) |
| DK (1) | DK2486171T3 (xx) |
| EA (1) | EA020651B1 (xx) |
| EC (1) | ECSP12011780A (xx) |
| EG (1) | EG26557A (xx) |
| ES (1) | ES2439319T3 (xx) |
| HK (1) | HK1172377A1 (xx) |
| IL (1) | IL218258A0 (xx) |
| IT (1) | ITMI20091719A1 (xx) |
| MX (1) | MX2012004026A (xx) |
| TW (1) | TWI525219B (xx) |
| WO (1) | WO2011042484A1 (xx) |
| ZA (1) | ZA201201829B (xx) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102010006415A1 (de) * | 2010-02-01 | 2011-08-04 | Schaeffler Technologies GmbH & Co. KG, 91074 | Vorrichtung zum Verändern der Steuerzeiten von Gaswechselventilen einer Brennkraftmaschine |
| WO2011099350A1 (en) * | 2010-02-10 | 2011-08-18 | Permelec Electrode Ltd. | Activated cathode for hydrogen evolution |
| ITMI20100268A1 (it) * | 2010-02-22 | 2011-08-23 | Industrie De Nora Spa | Elettrodo per processi elettrolitici e metodo per il suo ottenimento |
| EP2808424B1 (en) * | 2012-01-24 | 2018-05-02 | JX Nippon Oil & Energy Corporation | Electrochemical reduction device and method for producing hydride of nitrogen-containing-heterocyclic aromatic compound or aromatic hydrocarbon compound |
| ITMI20122030A1 (it) * | 2012-11-29 | 2014-05-30 | Industrie De Nora Spa | Catodo per evoluzione elettrolitica di idrogeno |
| KR20180128962A (ko) * | 2016-04-07 | 2018-12-04 | 코베스트로 도이칠란트 아게 | 클로르-알칼리 전기분해를 위한 이중기능성 전극 및 전기분해 장치 |
| CN106011923B (zh) * | 2016-07-05 | 2018-07-20 | 宋玉琴 | 含镧的电极及其制备方法 |
| CN106011922B (zh) * | 2016-07-05 | 2018-07-20 | 宋玉琴 | 含铈的电极及其制备方法 |
| CN106011924B (zh) * | 2016-07-05 | 2018-07-20 | 宋玉琴 | 含镧的电解用电极及其制备方法 |
| CN107815703B (zh) * | 2016-09-14 | 2019-09-10 | 蓝星(北京)化工机械有限公司 | 析氢活性阴极及其制备方法和包含所述析氢活性阴极的电解槽 |
| KR20180059354A (ko) | 2016-11-25 | 2018-06-04 | 주식회사 엘지화학 | 전기 분해용 전극 및 전기 분해용 전극의 제조방법 |
| US10815578B2 (en) * | 2017-09-08 | 2020-10-27 | Electrode Solutions, LLC | Catalyzed cushion layer in a multi-layer electrode |
| CN108070877B (zh) * | 2017-11-09 | 2020-07-07 | 江苏安凯特科技股份有限公司 | 一种用于电解生产的阴极及其制备方法 |
| CN112080756B (zh) * | 2019-06-14 | 2021-07-06 | 中国科学院大连化学物理研究所 | 一种析氢电极及其制备和应用 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4075070A (en) * | 1976-06-09 | 1978-02-21 | Ppg Industries, Inc. | Electrode material |
| US4545883A (en) * | 1982-07-19 | 1985-10-08 | Energy Conversion Devices, Inc. | Electrolytic cell cathode |
| ES2134792T3 (es) * | 1991-12-13 | 1999-10-16 | Ici Plc | Catodo para cuba electrolitica. |
| IT1263898B (it) * | 1993-02-12 | 1996-09-05 | Permelec Spa Nora | Catodo attivato per celle cloro-soda e relativo metodo di preparazione |
| JP3319887B2 (ja) * | 1994-10-05 | 2002-09-03 | クロリンエンジニアズ株式会社 | 次亜塩素酸塩の製造方法 |
| FR2824846B1 (fr) * | 2001-05-16 | 2004-04-02 | Saint Gobain | Substrat a revetement photocatalytique |
| JP4341838B2 (ja) * | 2004-10-01 | 2009-10-14 | ペルメレック電極株式会社 | 電解用陰極 |
| ITMI20061947A1 (it) * | 2006-10-11 | 2008-04-12 | Industrie De Nora Spa | Catodo per processi elettrolitici |
| IT1391767B1 (it) * | 2008-11-12 | 2012-01-27 | Industrie De Nora Spa | Elettrodo per cella elettrolitica |
| WO2011099350A1 (en) * | 2010-02-10 | 2011-08-18 | Permelec Electrode Ltd. | Activated cathode for hydrogen evolution |
-
2009
- 2009-10-08 IT IT001719A patent/ITMI20091719A1/it unknown
-
2010
- 2010-09-16 TW TW099131342A patent/TWI525219B/zh active
- 2010-10-07 KR KR1020127011753A patent/KR101710346B1/ko active IP Right Grant
- 2010-10-07 CA CA2773677A patent/CA2773677C/en active Active
- 2010-10-07 MX MX2012004026A patent/MX2012004026A/es active IP Right Grant
- 2010-10-07 JP JP2012532586A patent/JP5680655B2/ja active Active
- 2010-10-07 AR ARP100103665A patent/AR078562A1/es active IP Right Grant
- 2010-10-07 ES ES10762916.4T patent/ES2439319T3/es active Active
- 2010-10-07 EA EA201270514A patent/EA020651B1/ru not_active IP Right Cessation
- 2010-10-07 EP EP10762916.4A patent/EP2486171B1/en active Active
- 2010-10-07 BR BR112012007988-3A patent/BR112012007988B1/pt active IP Right Grant
- 2010-10-07 WO PCT/EP2010/064964 patent/WO2011042484A1/en active Application Filing
- 2010-10-07 CN CN201080044876.6A patent/CN102549197B/zh active Active
- 2010-10-07 AU AU2010305403A patent/AU2010305403B2/en active Active
- 2010-10-07 DK DK10762916.4T patent/DK2486171T3/da active
-
2012
- 2012-02-22 IL IL218258A patent/IL218258A0/en active IP Right Grant
- 2012-03-13 ZA ZA2012/01829A patent/ZA201201829B/en unknown
- 2012-04-03 EC ECSP12011780 patent/ECSP12011780A/es unknown
- 2012-04-03 CL CL2012000832A patent/CL2012000832A1/es unknown
- 2012-04-05 US US13/440,292 patent/US8313623B2/en active Active
- 2012-04-08 EG EG2012040651A patent/EG26557A/en active
- 2012-12-20 HK HK12113144.4A patent/HK1172377A1/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| AR078562A1 (es) | 2011-11-16 |
| US20120199473A1 (en) | 2012-08-09 |
| AU2010305403B2 (en) | 2014-06-26 |
| CL2012000832A1 (es) | 2012-07-13 |
| ITMI20091719A1 (it) | 2011-04-09 |
| JP2013507520A (ja) | 2013-03-04 |
| TW201113398A (en) | 2011-04-16 |
| CN102549197B (zh) | 2014-11-26 |
| EP2486171B1 (en) | 2013-09-11 |
| WO2011042484A1 (en) | 2011-04-14 |
| ZA201201829B (en) | 2013-05-29 |
| ES2439319T3 (es) | 2014-01-22 |
| JP5680655B2 (ja) | 2015-03-04 |
| BR112012007988B1 (pt) | 2021-01-12 |
| CA2773677A1 (en) | 2011-04-14 |
| DK2486171T3 (da) | 2013-11-04 |
| EP2486171A1 (en) | 2012-08-15 |
| AU2010305403A1 (en) | 2012-03-29 |
| IL218258A0 (en) | 2012-04-30 |
| MX2012004026A (es) | 2012-06-27 |
| EA020651B1 (ru) | 2014-12-30 |
| KR101710346B1 (ko) | 2017-02-27 |
| EA201270514A1 (ru) | 2012-09-28 |
| KR20120093930A (ko) | 2012-08-23 |
| US8313623B2 (en) | 2012-11-20 |
| CA2773677C (en) | 2016-11-22 |
| ECSP12011780A (es) | 2012-07-31 |
| EG26557A (en) | 2014-02-16 |
| CN102549197A (zh) | 2012-07-04 |
| TWI525219B (zh) | 2016-03-11 |
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