HK1145192A1 - Process for manufacturing multi-layered thin film by dry vacuum vapor deposition - Google Patents

Process for manufacturing multi-layered thin film by dry vacuum vapor deposition

Info

Publication number
HK1145192A1
HK1145192A1 HK10111725.7A HK10111725A HK1145192A1 HK 1145192 A1 HK1145192 A1 HK 1145192A1 HK 10111725 A HK10111725 A HK 10111725A HK 1145192 A1 HK1145192 A1 HK 1145192A1
Authority
HK
Hong Kong
Prior art keywords
thin film
vapor deposition
vacuum vapor
dry vacuum
layered thin
Prior art date
Application number
HK10111725.7A
Inventor
Hyun Joong Kim
Hong Chul Kim
Jeong Rae Kim
Original Assignee
Ceko Corp Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ceko Corp Ltd filed Critical Ceko Corp Ltd
Publication of HK1145192A1 publication Critical patent/HK1145192A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
    • C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

The present invention relates to a process for manufacturing multi-layered thin film by using dry vacuum vapor deposition, in particular, a process for manufacturing multi- layered thin film by using stable and simple dry vacuum vapor deposition, the process being capable of providing optical beautifulness and luxury impression to cases, windows, keypads, function key parts, various accessory parts or the like for mobile phone, MP3 player, portable multimedia player (PMP), digital multimedia broadcasting (DMB) receiver, car navigation system, notebook computer, etc.
HK10111725.7A 2007-08-02 2010-12-15 Process for manufacturing multi-layered thin film by dry vacuum vapor deposition HK1145192A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20070077906 2007-08-02
PCT/KR2008/004470 WO2009017376A2 (en) 2007-08-02 2008-07-31 Process for manufacturing multi-layered thin film by dry vacuum vapor deposition

Publications (1)

Publication Number Publication Date
HK1145192A1 true HK1145192A1 (en) 2011-04-08

Family

ID=40305064

Family Applications (1)

Application Number Title Priority Date Filing Date
HK10111725.7A HK1145192A1 (en) 2007-08-02 2010-12-15 Process for manufacturing multi-layered thin film by dry vacuum vapor deposition

Country Status (5)

Country Link
JP (1) JP2010535286A (en)
KR (2) KR101824017B1 (en)
CN (1) CN101784692B (en)
HK (1) HK1145192A1 (en)
WO (1) WO2009017376A2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101246022B1 (en) * 2010-08-19 2013-04-02 (주)에스아이티 Display window panel for anti-reflection and method thereof
US9339993B2 (en) 2010-09-14 2016-05-17 Corning Incorporated Appliance fascia and mounting therefore
KR101690091B1 (en) * 2015-04-16 2016-12-27 주식회사 쎄코 Antibacterial primer coating agent for vacuum deposition and method of multi-layered coating by using the same
KR102468988B1 (en) 2020-07-14 2022-11-22 주식회사 동남티에스 Method for forming decorative pattern by metal deposition layer and plastic decorative member including the decorative pattern by the same method

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03273201A (en) * 1990-03-23 1991-12-04 Asahi Optical Co Ltd Surface high-reflection mirror
JP2748066B2 (en) * 1992-04-23 1998-05-06 富士写真光機株式会社 Reflector
JP3352172B2 (en) * 1993-08-30 2002-12-03 キヤノン株式会社 Optical thin film of plastic optical component and method of forming the same
JP2000108262A (en) * 1998-10-09 2000-04-18 Toray Ind Inc Polypropylene film for metal deposition and metal- deposited polypropylene film
US6958748B1 (en) * 1999-04-20 2005-10-25 Matsushita Electric Industrial Co., Ltd. Transparent board with conductive multi-layer antireflection films, transparent touch panel using this transparent board with multi-layer antireflection films, and electronic equipment with this transparent touch panel
JP2000328231A (en) * 1999-05-20 2000-11-28 Toray Ind Inc Deposition method by organic material to be deposited by evaporation
JP4482971B2 (en) * 1999-09-08 2010-06-16 株式会社ニコン Reflector
JP3415801B2 (en) * 2000-02-21 2003-06-09 三容真空工業株式会社 Organic coating method and apparatus
JP4023065B2 (en) * 2000-03-23 2007-12-19 凸版印刷株式会社 Anti-reflective member
JP2003201596A (en) * 2002-01-10 2003-07-18 Nitto Denko Corp Method of depositing metallic layer and metallic foil stacked matter
JP2003255133A (en) * 2002-03-05 2003-09-10 Yazaki Corp Combiner and its manufacturing method, and display device for vehicle
KR20030073733A (en) * 2002-03-13 2003-09-19 주식회사 뮤렉스테크놀로지 Metal Sputtering and Evaporation Equipment and Method on Plastics
KR100514953B1 (en) * 2003-03-05 2005-09-14 주식회사 피앤아이 Method for fabricating plastic housing of electronic article
JP2005169995A (en) * 2003-12-15 2005-06-30 Dainippon Printing Co Ltd Gas barrier sheet and adhesiveness improved sheet
JP4888990B2 (en) * 2004-10-26 2012-02-29 尾池工業株式会社 Reflector for backlight device
JP3756171B1 (en) * 2004-10-28 2006-03-15 尾池工業株式会社 Method for producing metal-deposited film with antioxidant layer and metal-deposited film with antioxidant layer

Also Published As

Publication number Publication date
KR101824017B1 (en) 2018-02-01
KR20160064051A (en) 2016-06-07
CN101784692A (en) 2010-07-21
WO2009017376A3 (en) 2009-04-16
WO2009017376A2 (en) 2009-02-05
CN101784692B (en) 2013-03-20
KR20090013719A (en) 2009-02-05
JP2010535286A (en) 2010-11-18

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