HK1125741A1 - Device and method for holding a substrate - Google Patents
Device and method for holding a substrateInfo
- Publication number
- HK1125741A1 HK1125741A1 HK09104025.2A HK09104025A HK1125741A1 HK 1125741 A1 HK1125741 A1 HK 1125741A1 HK 09104025 A HK09104025 A HK 09104025A HK 1125741 A1 HK1125741 A1 HK 1125741A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- holding
- substrate
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68728—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of separate clamping members, e.g. clamping fingers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Weting (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US73912805P | 2005-11-23 | 2005-11-23 | |
PCT/US2006/045353 WO2007062199A2 (en) | 2005-11-23 | 2006-11-22 | Device and method for holding a substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1125741A1 true HK1125741A1 (en) | 2009-08-14 |
Family
ID=38067946
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK09104025.2A HK1125741A1 (en) | 2005-11-23 | 2009-04-30 | Device and method for holding a substrate |
Country Status (9)
Country | Link |
---|---|
US (1) | US9011064B2 (zh) |
EP (1) | EP1955369B1 (zh) |
JP (1) | JP4943448B2 (zh) |
CN (1) | CN101366110B (zh) |
CA (1) | CA2630807A1 (zh) |
DK (1) | DK1955369T3 (zh) |
ES (1) | ES2401845T3 (zh) |
HK (1) | HK1125741A1 (zh) |
WO (1) | WO2007062199A2 (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8852383B2 (en) * | 1999-09-29 | 2014-10-07 | Materials And Technologies Corporation | Wet processing using a fluid meniscus apparatus |
EP2244987A4 (en) * | 2008-02-22 | 2013-07-31 | Materials And Technologies Corp | HIGH EFFICIENCY MONOFACE WET ENGRAVING AND WET TREATMENT APPARATUS AND METHOD |
CN102059225A (zh) * | 2010-11-23 | 2011-05-18 | 南通富士通微电子股份有限公司 | 清洗机圆片保护装置 |
CN103600954B (zh) * | 2013-10-11 | 2015-10-07 | 京东方科技集团股份有限公司 | 一种掩模板搬运治具 |
CN107492508A (zh) * | 2016-06-12 | 2017-12-19 | 奇勗科技股份有限公司 | 一种基板处理设备 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09107023A (ja) * | 1995-10-13 | 1997-04-22 | Toshiba Microelectron Corp | 被処理物の回転保持装置 |
US5669977A (en) * | 1995-12-22 | 1997-09-23 | Lam Research Corporation | Shape memory alloy lift pins for semiconductor processing equipment |
CN1272956A (zh) | 1997-09-30 | 2000-11-08 | 塞米图尔公司 | 在微电子元件的制造过程中用于控制工件表面暴露于处理液的装置和方法 |
KR20010024368A (ko) * | 1997-09-30 | 2001-03-26 | 세미툴 인코포레이티드 | 접촉식 세정 작업을 위한 주 반응 챔버 외측에 보조전극을 구비하는 전기도금 시스템 |
JP2001110771A (ja) | 1999-10-08 | 2001-04-20 | Ebara Corp | 基板洗浄装置及び基板処理装置 |
JP3958572B2 (ja) * | 2001-12-26 | 2007-08-15 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理方法 |
US7078344B2 (en) * | 2003-03-14 | 2006-07-18 | Lam Research Corporation | Stress free etch processing in combination with a dynamic liquid meniscus |
-
2006
- 2006-11-22 CN CN200680050316.5A patent/CN101366110B/zh not_active Expired - Fee Related
- 2006-11-22 WO PCT/US2006/045353 patent/WO2007062199A2/en active Application Filing
- 2006-11-22 DK DK06838362.9T patent/DK1955369T3/da active
- 2006-11-22 CA CA002630807A patent/CA2630807A1/en not_active Abandoned
- 2006-11-22 JP JP2008542468A patent/JP4943448B2/ja not_active Expired - Fee Related
- 2006-11-22 EP EP06838362A patent/EP1955369B1/en not_active Not-in-force
- 2006-11-22 ES ES06838362T patent/ES2401845T3/es active Active
- 2006-11-22 US US11/603,571 patent/US9011064B2/en not_active Expired - Fee Related
-
2009
- 2009-04-30 HK HK09104025.2A patent/HK1125741A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
ES2401845T3 (es) | 2013-04-25 |
WO2007062199A3 (en) | 2007-12-27 |
CN101366110B (zh) | 2011-04-13 |
EP1955369A2 (en) | 2008-08-13 |
US9011064B2 (en) | 2015-04-21 |
DK1955369T3 (da) | 2013-01-28 |
EP1955369A4 (en) | 2011-11-02 |
JP4943448B2 (ja) | 2012-05-30 |
WO2007062199A2 (en) | 2007-05-31 |
US20070116551A1 (en) | 2007-05-24 |
EP1955369B1 (en) | 2012-10-24 |
JP2009517866A (ja) | 2009-04-30 |
CN101366110A (zh) | 2009-02-11 |
CA2630807A1 (en) | 2007-05-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20161122 |