HK1119784A1 - Exposure device and object to be exposed - Google Patents
Exposure device and object to be exposedInfo
- Publication number
- HK1119784A1 HK1119784A1 HK08111633.2A HK08111633A HK1119784A1 HK 1119784 A1 HK1119784 A1 HK 1119784A1 HK 08111633 A HK08111633 A HK 08111633A HK 1119784 A1 HK1119784 A1 HK 1119784A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- exposed
- exposure device
- exposure
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005227675A JP4309874B2 (ja) | 2005-08-05 | 2005-08-05 | 露光装置 |
PCT/JP2006/314545 WO2007018029A1 (ja) | 2005-08-05 | 2006-07-24 | 露光装置及び被露光体 |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1119784A1 true HK1119784A1 (en) | 2009-03-13 |
Family
ID=37727218
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK08111633.2A HK1119784A1 (en) | 2005-08-05 | 2008-10-22 | Exposure device and object to be exposed |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP4309874B2 (ko) |
KR (1) | KR101308691B1 (ko) |
CN (1) | CN101238416B (ko) |
HK (1) | HK1119784A1 (ko) |
TW (1) | TWI391796B (ko) |
WO (1) | WO2007018029A1 (ko) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009251290A (ja) * | 2008-04-07 | 2009-10-29 | V Technology Co Ltd | 露光装置 |
JP5282515B2 (ja) * | 2008-10-01 | 2013-09-04 | 大日本印刷株式会社 | カラーフィルタの製造装置 |
JP5261847B2 (ja) * | 2009-06-16 | 2013-08-14 | 株式会社ブイ・テクノロジー | アライメント方法、アライメント装置及び露光装置 |
JP5382456B2 (ja) * | 2010-04-08 | 2014-01-08 | 株式会社ブイ・テクノロジー | 露光方法及び露光装置 |
TWI571710B (zh) * | 2014-12-30 | 2017-02-21 | 力晶科技股份有限公司 | 曝光機台對準光源裝置內的模組作動監控方法及監控系統 |
JP6904662B2 (ja) * | 2016-01-29 | 2021-07-21 | 株式会社アドテックエンジニアリング | 露光装置 |
JP6298108B2 (ja) * | 2016-07-08 | 2018-03-20 | キヤノントッキ株式会社 | アライメントマークの検出方法、アライメント方法及び蒸着方法 |
JP7344047B2 (ja) * | 2019-08-22 | 2023-09-13 | 株式会社ジェーイーエル | 基板の位置合わせ方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0766113A (ja) * | 1993-08-31 | 1995-03-10 | Sanyo Electric Co Ltd | レチクル及び位置合わせ用バーニアの形成方法 |
JPH09127702A (ja) * | 1995-10-30 | 1997-05-16 | Dainippon Printing Co Ltd | 大サイズ基板用露光装置および露光方法 |
US6798516B1 (en) * | 1996-11-14 | 2004-09-28 | Nikon Corporation | Projection exposure apparatus having compact substrate stage |
JP2003043939A (ja) * | 2001-08-01 | 2003-02-14 | Sanyo Electric Co Ltd | 画像表示装置 |
TW200301848A (en) * | 2002-01-09 | 2003-07-16 | Nikon Corp | Exposure apparatus and exposure method |
JP2004012903A (ja) * | 2002-06-07 | 2004-01-15 | Fuji Photo Film Co Ltd | 露光装置 |
CN1480985A (zh) * | 2002-09-04 | 2004-03-10 | 旺宏电子股份有限公司 | 确定晶片对准标记外围辅助图形的方法及所用光刻胶掩模 |
EP1482373A1 (en) * | 2003-05-30 | 2004-12-01 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP4214849B2 (ja) * | 2003-06-30 | 2009-01-28 | 株式会社ニコン | 露光方法及び露光装置 |
-
2005
- 2005-08-05 JP JP2005227675A patent/JP4309874B2/ja active Active
-
2006
- 2006-07-24 KR KR1020087003346A patent/KR101308691B1/ko active IP Right Grant
- 2006-07-24 WO PCT/JP2006/314545 patent/WO2007018029A1/ja active Application Filing
- 2006-07-24 CN CN2006800288313A patent/CN101238416B/zh active Active
- 2006-07-28 TW TW95127838A patent/TWI391796B/zh not_active IP Right Cessation
-
2008
- 2008-10-22 HK HK08111633.2A patent/HK1119784A1/xx unknown
Also Published As
Publication number | Publication date |
---|---|
CN101238416A (zh) | 2008-08-06 |
KR20080032175A (ko) | 2008-04-14 |
TW200707139A (en) | 2007-02-16 |
CN101238416B (zh) | 2010-08-18 |
KR101308691B1 (ko) | 2013-09-13 |
JP4309874B2 (ja) | 2009-08-05 |
JP2007041447A (ja) | 2007-02-15 |
TWI391796B (zh) | 2013-04-01 |
WO2007018029A1 (ja) | 2007-02-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP2042853A4 (en) | ANALYZER AND USE THEREOF | |
GB0601183D0 (en) | Improvements in and relating to imaging | |
EP2068349A4 (en) | STAGE EQUIPMENT AND EXPOSURE DEVICE | |
GB0526483D0 (en) | Computing device and socket protection mechanism therefor | |
EP1890120A4 (en) | IMAGE CONVERSION DEVICE AND PROGRAM | |
PL2043786T3 (pl) | Zestaw do analizy przeznaczony do użytku w urządzeniach do analizy | |
EP1909510A4 (en) | IMAGE OUTPUT DEVICE AND PROGRAM | |
EP2033567A4 (en) | IMAGE PROCESSING DEVICE AND IMAGE PROCESSING PROGRAM | |
EP1964506A4 (en) | IN VIVO IMAGE CAPTURE DEVICE | |
EP2023298A4 (en) | IMAGE PROCESSING DEVICE AND IMAGE PROCESSING PROGRAM | |
EP1986101A4 (en) | DEVICE AND METHOD FOR MAINTAINING COHERENCE | |
HK1119784A1 (en) | Exposure device and object to be exposed | |
EP1857036A4 (en) | DEVICE AND SYSTEM TO BE INTRODUCED IN A SUBJECT | |
EP2149330A4 (en) | IMAGE PROCESSING DEVICE AND IMAGE PROCESSING PROGRAM | |
EP1729524A4 (en) | ELEMENT AND DEVICE FOR SHOOTING | |
AU321356S (en) | Mask and/or components thereof | |
EP2204710A4 (en) | PROGRAM AND DEVICE FOR DETECTING A MOBILE PROGRAM | |
TWI350997B (en) | Image processing program and image processing device | |
HK1111773A1 (en) | Pellicle and pellicle stripping device | |
EP1975980A4 (en) | EXPOSURE DEVICE AND MANUFACTURING METHOD THEREFOR | |
EP1912600A4 (en) | METHOD AND DEVICE FOR PROVIDING AN INCREASE IN PENIS | |
IL178495A0 (en) | Composition comprising crustacean gastrolith components and its use | |
EP2040218A4 (en) | IMAGE PROCESSING DEVICE AND IMAGE PROCESSING PROGRAM | |
EP2002357A4 (en) | PROCESSOR AND DOCUMENTAL COLLECTOR | |
EP1874039A4 (en) | IMAGE PROCESSING DEVICE AND PICTURE PROCESSING PROGRAM |