HK1040823A1 - 形成電子射綫的裝置、製造裝置的方法和應用 - Google Patents
形成電子射綫的裝置、製造裝置的方法和應用Info
- Publication number
- HK1040823A1 HK1040823A1 HK02102222.4A HK02102222A HK1040823A1 HK 1040823 A1 HK1040823 A1 HK 1040823A1 HK 02102222 A HK02102222 A HK 02102222A HK 1040823 A1 HK1040823 A1 HK 1040823A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- electron beam
- shaping
- assistance
- producing
- ceramic body
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/18—Assembling together the component parts of electrode systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/10—Lenses
- H01J37/12—Lenses electrostatic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06375—Arrangement of electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/10—Lenses
- H01J2237/12—Lenses electrostatic
- H01J2237/1205—Microlenses
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Recrystallisation Techniques (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19824783A DE19824783A1 (de) | 1998-06-03 | 1998-06-03 | Vorrichtung zur Formung eines Elektronenstrahls, Verfahren zur Herstellung der Vorrichtung und Anwendung |
PCT/DE1999/001610 WO1999063566A2 (de) | 1998-06-03 | 1999-06-01 | Vorrichtung zur formung eines elektronenstrahls, verfahren zur herstellung der vorrichtung und anwendung |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1040823A1 true HK1040823A1 (zh) | 2002-06-21 |
Family
ID=7869769
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK02102222.4A HK1040823A1 (zh) | 1998-06-03 | 2002-03-22 | 形成電子射綫的裝置、製造裝置的方法和應用 |
Country Status (9)
Country | Link |
---|---|
US (1) | US6570320B1 (zh) |
EP (1) | EP1088319B1 (zh) |
JP (1) | JP2002517881A (zh) |
CN (1) | CN1315051A (zh) |
AT (1) | ATE256338T1 (zh) |
DE (2) | DE19824783A1 (zh) |
ES (1) | ES2212593T3 (zh) |
HK (1) | HK1040823A1 (zh) |
WO (1) | WO1999063566A2 (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE29823118U1 (de) | 1998-12-28 | 1999-02-25 | Siemens AG, 80333 München | Röhrenhals für eine Kathodenstrahlröhre |
DE10041338A1 (de) * | 2000-08-23 | 2002-03-14 | Epcos Ag | Verfahren zum Herstellen eines keramischen Vielschichtbauelements sowie Grünkörper für ein keramisches Vielschichtbauelement |
CN1258204C (zh) * | 2002-05-16 | 2006-05-31 | 中山大学 | 一种冷阴极电子枪 |
US6703784B2 (en) * | 2002-06-18 | 2004-03-09 | Motorola, Inc. | Electrode design for stable micro-scale plasma discharges |
US7394071B2 (en) * | 2004-12-20 | 2008-07-01 | Electronics And Telecommunications Research Institute | Micro column electron beam apparatus formed in low temperature co-fired ceramic substrate |
DE102006052027B4 (de) * | 2006-11-03 | 2009-06-25 | Metoxit Ag | Verfahren zum Bestimmen des Sinterschwunds eines vorgesinterten Körpers und Bearbeitungsmaschine zur Bearbeitung von Weißlingen |
US7668296B2 (en) * | 2007-06-14 | 2010-02-23 | General Electric Co. | X ray tube assembly and method of manufacturing and using the X ray tube assembly |
US7801277B2 (en) * | 2008-03-26 | 2010-09-21 | General Electric Company | Field emitter based electron source with minimized beam emittance growth |
US8588372B2 (en) * | 2009-12-16 | 2013-11-19 | General Electric Company | Apparatus for modifying electron beam aspect ratio for X-ray generation |
US9448327B2 (en) * | 2013-12-16 | 2016-09-20 | Schlumberger Technology Corporation | X-ray generator having multiple extractors with independently selectable potentials |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE275156C (de) | 1911-07-26 | 1914-06-11 | Basf Ag | Verfahren zur Ausführung chemischer Reaktionen mit Wasserstoff in heissen eisernen Gefässen |
FR935241A (fr) * | 1946-10-18 | 1948-06-14 | Csf | Perfectionnement aux lentilles électroniques électrostatiques à haute tension |
US3935500A (en) * | 1974-12-09 | 1976-01-27 | Texas Instruments Incorporated | Flat CRT system |
DD275156A3 (de) * | 1987-12-09 | 1990-01-17 | Mikroelektronik Friedrich Engels Veb | Glaslotsiebdruckpaste |
NL8800194A (nl) * | 1988-01-27 | 1989-08-16 | Philips Nv | Kathodestraalbuis. |
EP0351444A1 (en) * | 1988-07-22 | 1990-01-24 | International Business Machines Corporation | Method for making self-aligned apertures |
DE3837300A1 (de) * | 1988-11-03 | 1990-05-23 | Messerschmitt Boelkow Blohm | Verfahren zur herstellung von mikroelektronischen schaltungen und hybriden |
US4870539A (en) * | 1989-01-17 | 1989-09-26 | International Business Machines Corporation | Doped titanate glass-ceramic for grain boundary barrier layer capacitors |
JPH02249294A (ja) * | 1989-03-23 | 1990-10-05 | Mitsubishi Mining & Cement Co Ltd | Lc内蔵形セラミックス基板 |
US5443786A (en) * | 1989-09-19 | 1995-08-22 | Fujitsu Limited | Composition for the formation of ceramic vias |
FR2676862B1 (fr) | 1991-05-21 | 1997-01-03 | Commissariat Energie Atomique | Structure multiplicatrice d'electrons en ceramique notamment pour photomultiplicateur et son procede de fabrication. |
US5744898A (en) * | 1992-05-14 | 1998-04-28 | Duke University | Ultrasound transducer array with transmitter/receiver integrated circuitry |
DE9213965U1 (de) * | 1992-10-16 | 1993-02-25 | Dr. Johannes Heidenhain Gmbh, 83301 Traunreut | Mikrostruktur |
US5657199A (en) * | 1992-10-21 | 1997-08-12 | Devoe; Daniel F. | Close physical mounting of leaded amplifier/receivers to through holes in monolithic, buried-substrate, multiple capacitors simultaneous with electrical connection to dual capacitors otherwise transpiring, particularly for hearing aid filters |
US5534743A (en) | 1993-03-11 | 1996-07-09 | Fed Corporation | Field emission display devices, and field emission electron beam source and isolation structure components therefor |
DE4419764C1 (de) * | 1994-06-06 | 1995-12-21 | Netzsch Erich Holding | Stapelvorrichtung, insbesondere für Kapseln zum Brennen keramischer Artikel |
JPH0831336A (ja) * | 1994-07-13 | 1996-02-02 | Sony Corp | 電子銃用の主レンズ部材及び電子銃 |
US5617865A (en) * | 1995-03-31 | 1997-04-08 | Siemens Medical Systems, Inc. | Multi-dimensional ultrasonic array interconnect |
DE19646369B4 (de) * | 1996-11-09 | 2008-07-31 | Robert Bosch Gmbh | Keramische Mehrlagenschaltung und Verfahren zu ihrer Herstellung |
DE69633338T2 (de) * | 1996-11-19 | 2005-02-24 | Advantest Corp. | Elektrostatische Vorrichtung zur Einwirkung auf einen Korpuskularstrahl |
US6025609A (en) * | 1996-12-05 | 2000-02-15 | Quick; Nathaniel R. | Laser synthesized ceramic electronic devices and circuits and method for making |
US5855995A (en) * | 1997-02-21 | 1999-01-05 | Medtronic, Inc. | Ceramic substrate for implantable medical devices |
US6146743A (en) * | 1997-02-21 | 2000-11-14 | Medtronic, Inc. | Barrier metallization in ceramic substrate for implantable medical devices |
-
1998
- 1998-06-03 DE DE19824783A patent/DE19824783A1/de not_active Withdrawn
-
1999
- 1999-06-01 CN CN99809370A patent/CN1315051A/zh active Pending
- 1999-06-01 US US09/701,894 patent/US6570320B1/en not_active Expired - Fee Related
- 1999-06-01 WO PCT/DE1999/001610 patent/WO1999063566A2/de active IP Right Grant
- 1999-06-01 AT AT99936378T patent/ATE256338T1/de not_active IP Right Cessation
- 1999-06-01 EP EP99936378A patent/EP1088319B1/de not_active Expired - Lifetime
- 1999-06-01 JP JP2000552697A patent/JP2002517881A/ja not_active Withdrawn
- 1999-06-01 ES ES99936378T patent/ES2212593T3/es not_active Expired - Lifetime
- 1999-06-01 DE DE59908030T patent/DE59908030D1/de not_active Expired - Fee Related
-
2002
- 2002-03-22 HK HK02102222.4A patent/HK1040823A1/zh unknown
Also Published As
Publication number | Publication date |
---|---|
WO1999063566A3 (de) | 2000-08-24 |
WO1999063566A2 (de) | 1999-12-09 |
EP1088319B1 (de) | 2003-12-10 |
JP2002517881A (ja) | 2002-06-18 |
DE19824783A1 (de) | 1999-12-16 |
US6570320B1 (en) | 2003-05-27 |
ATE256338T1 (de) | 2003-12-15 |
CN1315051A (zh) | 2001-09-26 |
DE59908030D1 (de) | 2004-01-22 |
ES2212593T3 (es) | 2004-07-16 |
EP1088319A2 (de) | 2001-04-04 |
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