HK1037388A1 - Sn-cu alloy plating bath - Google Patents
Sn-cu alloy plating bathInfo
- Publication number
- HK1037388A1 HK1037388A1 HK01108185A HK01108185A HK1037388A1 HK 1037388 A1 HK1037388 A1 HK 1037388A1 HK 01108185 A HK01108185 A HK 01108185A HK 01108185 A HK01108185 A HK 01108185A HK 1037388 A1 HK1037388 A1 HK 1037388A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- plating bath
- alloy plating
- alloy
- bath
- plating
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/58—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28674899A JP2001107287A (ja) | 1999-10-07 | 1999-10-07 | Sn−Cu合金めっき浴 |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1037388A1 true HK1037388A1 (en) | 2002-02-08 |
Family
ID=17708535
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK01108185A HK1037388A1 (en) | 1999-10-07 | 2001-11-21 | Sn-cu alloy plating bath |
Country Status (6)
Country | Link |
---|---|
US (1) | US6458264B1 (zh) |
JP (1) | JP2001107287A (zh) |
KR (1) | KR20010039969A (zh) |
CN (1) | CN1223707C (zh) |
HK (1) | HK1037388A1 (zh) |
TW (1) | TW573075B (zh) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001172791A (ja) * | 1999-12-16 | 2001-06-26 | Ishihara Chem Co Ltd | スズ−銅系合金メッキ浴、並びに当該メッキ浴によりスズ−銅系合金皮膜を形成した電子部品 |
CN1662679B (zh) * | 2002-07-25 | 2010-06-16 | 株式会社新菱 | 含有锡-银-铜的电镀液、电镀覆膜及电镀方法 |
ES2531163T3 (es) * | 2002-10-11 | 2015-03-11 | Enthone | Procedimiento y electrolito para la deposición galvánica de bronces |
JP4758614B2 (ja) * | 2003-04-07 | 2011-08-31 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | 電気めっき組成物および方法 |
US7156904B2 (en) * | 2003-04-30 | 2007-01-02 | Mec Company Ltd. | Bonding layer forming solution, method of producing copper-to-resin bonding layer using the solution, and layered product obtained thereby |
JP4632027B2 (ja) * | 2004-11-19 | 2011-02-16 | 石原薬品株式会社 | 鉛フリーのスズ−銀系合金又はスズ−銅系合金電気メッキ浴 |
US20060260948A2 (en) * | 2005-04-14 | 2006-11-23 | Enthone Inc. | Method for electrodeposition of bronzes |
CN101270492B (zh) * | 2007-03-21 | 2010-12-29 | 来明工业(厦门)有限公司 | 锡铜合金镀层的电镀液及电镀方法 |
JP2015193916A (ja) * | 2014-03-18 | 2015-11-05 | 上村工業株式会社 | 錫または錫合金の電気めっき浴、およびバンプの製造方法 |
AR100441A1 (es) * | 2014-05-15 | 2016-10-05 | Nippon Steel & Sumitomo Metal Corp | Solución para deposición para conexión roscada para un caño o tubo y método de producción de la conexión roscada para un caño o tubo |
CN105200469A (zh) * | 2015-10-30 | 2015-12-30 | 无锡市嘉邦电力管道厂 | 一种锡-铜合金电镀液及其电镀方法 |
US11555252B2 (en) | 2018-11-07 | 2023-01-17 | Coventya, Inc. | Satin copper bath and method of depositing a satin copper layer |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4440608A (en) * | 1982-08-16 | 1984-04-03 | Mcgean-Rohco, Inc. | Process and bath for the electrodeposition of tin-lead alloys |
US4749626A (en) * | 1985-08-05 | 1988-06-07 | Olin Corporation | Whisker resistant tin coatings and baths and methods for making such coatings |
US5143544A (en) * | 1990-06-04 | 1992-09-01 | Shipley Company Inc. | Tin lead plating solution |
JP3816241B2 (ja) * | 1998-07-14 | 2006-08-30 | 株式会社大和化成研究所 | 金属を還元析出させるための水溶液 |
-
1999
- 1999-10-07 JP JP28674899A patent/JP2001107287A/ja active Pending
-
2000
- 2000-09-30 CN CNB001285963A patent/CN1223707C/zh not_active Expired - Fee Related
- 2000-10-02 KR KR1020000057795A patent/KR20010039969A/ko not_active Application Discontinuation
- 2000-10-05 US US09/679,619 patent/US6458264B1/en not_active Expired - Fee Related
- 2000-10-06 TW TW89120944A patent/TW573075B/zh not_active IP Right Cessation
-
2001
- 2001-11-21 HK HK01108185A patent/HK1037388A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW573075B (en) | 2004-01-21 |
KR20010039969A (ko) | 2001-05-15 |
JP2001107287A (ja) | 2001-04-17 |
CN1300881A (zh) | 2001-06-27 |
CN1223707C (zh) | 2005-10-19 |
US6458264B1 (en) | 2002-10-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20090930 |