HK1017387A1 - Process for manufacturing inductive counting systems - Google Patents
Process for manufacturing inductive counting systemsInfo
- Publication number
- HK1017387A1 HK1017387A1 HK99102104A HK99102104A HK1017387A1 HK 1017387 A1 HK1017387 A1 HK 1017387A1 HK 99102104 A HK99102104 A HK 99102104A HK 99102104 A HK99102104 A HK 99102104A HK 1017387 A1 HK1017387 A1 HK 1017387A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- counting systems
- manufacturing inductive
- manufacturing
- inductive counting
- electroconductive substrate
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
- H05K3/184—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1605—Process or apparatus coating on selected surface areas by masking
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
- G06K19/00—Record carriers for use with machines and with at least a part designed to carry digital markings
- G06K19/06—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code
- G06K19/067—Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Of Printed Wiring (AREA)
- General Factory Administration (AREA)
- Chemically Coating (AREA)
- Financial Or Insurance-Related Operations Such As Payment And Settlement (AREA)
- Credit Cards Or The Like (AREA)
- Catalysts (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Multi-Process Working Machines And Systems (AREA)
- Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
- Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP96106010A EP0802266B1 (fr) | 1996-04-17 | 1996-04-17 | Procédé de fabrication de moyens de paiement inductifs |
PCT/EP1997/000845 WO1997039163A1 (fr) | 1996-04-17 | 1997-02-21 | Procede de fabrication de systemes de comptage par induction |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1017387A1 true HK1017387A1 (en) | 1999-11-19 |
Family
ID=8222675
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK99102104A HK1017387A1 (en) | 1996-04-17 | 1999-05-11 | Process for manufacturing inductive counting systems |
Country Status (14)
Country | Link |
---|---|
US (1) | US6120672A (fr) |
EP (1) | EP0802266B1 (fr) |
JP (1) | JP2000511657A (fr) |
CN (1) | CN1071804C (fr) |
AT (1) | ATE195154T1 (fr) |
BR (1) | BR9706567B1 (fr) |
CA (1) | CA2228611A1 (fr) |
DE (1) | DE59605676D1 (fr) |
ES (1) | ES2149401T3 (fr) |
GR (1) | GR3034310T3 (fr) |
HK (1) | HK1017387A1 (fr) |
SI (1) | SI0802266T1 (fr) |
TW (1) | TW337012B (fr) |
WO (1) | WO1997039163A1 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100373405C (zh) * | 2003-02-19 | 2008-03-05 | 中兴通讯股份有限公司 | 一种网卡封装结构装置及其封装方法 |
DE102004004128A1 (de) * | 2004-01-28 | 2005-08-18 | Deutsche Telekom Ag | Verfahren zum Entwerten von Chipkarten und Chipkarten hierzu |
FR3004735B1 (fr) * | 2013-04-23 | 2015-07-03 | Dourdin | Procede de vernissage de pieces metallisees |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4666735A (en) * | 1983-04-15 | 1987-05-19 | Polyonics Corporation | Process for producing product having patterned metal layer |
US5158860A (en) * | 1990-11-01 | 1992-10-27 | Shipley Company Inc. | Selective metallization process |
-
1996
- 1996-04-17 DE DE59605676T patent/DE59605676D1/de not_active Expired - Lifetime
- 1996-04-17 AT AT96106010T patent/ATE195154T1/de not_active IP Right Cessation
- 1996-04-17 ES ES96106010T patent/ES2149401T3/es not_active Expired - Lifetime
- 1996-04-17 EP EP96106010A patent/EP0802266B1/fr not_active Expired - Lifetime
- 1996-04-17 SI SI9630244T patent/SI0802266T1/xx unknown
-
1997
- 1997-02-21 JP JP09536671A patent/JP2000511657A/ja active Pending
- 1997-02-21 BR BRPI9706567-6A patent/BR9706567B1/pt not_active IP Right Cessation
- 1997-02-21 WO PCT/EP1997/000845 patent/WO1997039163A1/fr active Application Filing
- 1997-02-21 CA CA002228611A patent/CA2228611A1/fr not_active Abandoned
- 1997-02-21 CN CN97191098A patent/CN1071804C/zh not_active Expired - Fee Related
- 1997-02-21 US US09/068,404 patent/US6120672A/en not_active Expired - Fee Related
- 1997-03-26 TW TW086103840A patent/TW337012B/zh not_active IP Right Cessation
-
1999
- 1999-05-11 HK HK99102104A patent/HK1017387A1/xx not_active IP Right Cessation
-
2000
- 2000-08-31 GR GR20000401997T patent/GR3034310T3/el not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0802266B1 (fr) | 2000-08-02 |
DE59605676D1 (de) | 2000-09-07 |
JP2000511657A (ja) | 2000-09-05 |
WO1997039163A1 (fr) | 1997-10-23 |
EP0802266A1 (fr) | 1997-10-22 |
ATE195154T1 (de) | 2000-08-15 |
BR9706567B1 (pt) | 2009-05-05 |
SI0802266T1 (en) | 2001-02-28 |
ES2149401T3 (es) | 2000-11-01 |
GR3034310T3 (en) | 2000-12-29 |
TW337012B (en) | 1998-07-21 |
CA2228611A1 (fr) | 1997-10-23 |
BR9706567A (pt) | 1999-07-20 |
CN1198782A (zh) | 1998-11-11 |
US6120672A (en) | 2000-09-19 |
CN1071804C (zh) | 2001-09-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
BR9503615A (pt) | Processo de fabricação de catalisador suportado de carbono ativado e catalisador suportado ativado feito pelo dito processo | |
WO1999010916A3 (fr) | Depot autocatalytique de cuivre sur une surface titanee | |
TW344897B (en) | A process for forming gate oxides possessing different thicknesses on a semiconductor substrate | |
WO2001099173A3 (fr) | Procede de traitement de substrat | |
MY122412A (en) | Heat treatment method for semiconductor substrates | |
GR3003228T3 (en) | Process and installation for applying an insulating multilayer refractory coating, and coating so obtained | |
TW344892B (en) | Method of forming a semiconductor metallization system and structure therefor | |
EP0603849A3 (fr) | Procédé pour fabriquer un substrat semi-conducteur utilisant un procédé de bonding, et substrat semi-conducteur fabriqué par ce procédé. | |
TW345742B (en) | Method for producing integrated circuit capacitor | |
TW351770B (en) | Shield layer, method for forming shield layer and producing substrate | |
WO1997034459A3 (fr) | Procede de formation d'une couche metallique a la surface d'un element destinee a menager un blindage contre les rayonnements electromagnetiques | |
EP0984672A3 (fr) | Procédé de traitement de surfaces métalliques | |
TW200520655A (en) | Method for forming metal wire by microdispensing | |
EP0350206A3 (fr) | Procédé de préparation d'articles en matière plastique conductrice de l'électricité | |
HK1017387A1 (en) | Process for manufacturing inductive counting systems | |
AU4772499A (en) | Process for the preliminary treatment of a metallic workpiece before coating | |
EP0642148A3 (fr) | Procédé de gravure, dispositif de sélection de couleurs et procédé de fabrication. | |
EP0708581A3 (fr) | Procédé de dépÔt sans courant de métal sur un substrat | |
TW373260B (en) | Method and equipment for etching semiconductor substrate | |
DE69314090D1 (de) | Ionenselektieve Elektrode und Verfahren zur Herstellung derselben | |
TW337610B (en) | Structure with reduced stress between a spin-on-glass layer and a metal layer and process for producing the same | |
TW353814B (en) | Metallic wiring substrate and producing method thereof | |
EP0736369A4 (fr) | Rouleau de resine renforce de fibres metallisees et procede de production | |
TW430693B (en) | Currentless metallisation process for non electroconductive substrates | |
EP0629110A3 (fr) | Procédé de formation d'un motif conducteur sur un substrat. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PF | Patent in force | ||
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20100221 |