GB990305A - Improvements in or relating to the deposition of material on substrates - Google Patents

Improvements in or relating to the deposition of material on substrates

Info

Publication number
GB990305A
GB990305A GB294463A GB294463A GB990305A GB 990305 A GB990305 A GB 990305A GB 294463 A GB294463 A GB 294463A GB 294463 A GB294463 A GB 294463A GB 990305 A GB990305 A GB 990305A
Authority
GB
United Kingdom
Prior art keywords
mask
base
deposited
stripes
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB294463A
Inventor
John Charles Pritchard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co PLC
Original Assignee
General Electric Co PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co PLC filed Critical General Electric Co PLC
Priority to GB294463A priority Critical patent/GB990305A/en
Publication of GB990305A publication Critical patent/GB990305A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

<PICT:0990305/C6-C7/1> In a coating process such as a vapour deposition process of forming mesa transistors by depositing stripes of Al and a Au-Ag alloy containing Sb on a Ge base, successive depositions of the stripes are deposited through a mask in contact with the substrate and the mask is moved over the substrate between depositions by means of a controlled variation of the temperature of a thermally dilatable member which is mechanically connected to the mask. As shown in Fig. 1, the apparatus comprises a heated support 1 and a Ge substrate supported in a shallow well of the support. The coating materials are held in containers 4 and 5 and a mask 6 in the form of an apertured nickel sheet 5m thick is supported in a backing plate 8 mounted in a frame 10 to which is attached a molybdenum rod 12. The apertures in the mask 40m x10m in size correspond to the required coating stripes on the Ge base and the backing plate 8 has a corresponding series of apertures. The mask is maintained in contact with the Ge base by means of a spring 16 and an electrical resistance heater and a thermocouple 15 are located on rod 12. The assembly is located in a vacuum chamber, the Ge base is heated to 300 DEG C. and the material, e.g. Al, is evaporated from container 4 and deposited through the mask. The temperature of rod 12 is increased by, e.g., 50 DEG C. and the thermal expansion caused moves mask 6 a distance of 15m across the Ge base. In this position the second material, e.g. Au-Ag alloy, is deposited.
GB294463A 1963-01-23 1963-01-23 Improvements in or relating to the deposition of material on substrates Expired GB990305A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB294463A GB990305A (en) 1963-01-23 1963-01-23 Improvements in or relating to the deposition of material on substrates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB294463A GB990305A (en) 1963-01-23 1963-01-23 Improvements in or relating to the deposition of material on substrates

Publications (1)

Publication Number Publication Date
GB990305A true GB990305A (en) 1965-04-28

Family

ID=9749002

Family Applications (1)

Application Number Title Priority Date Filing Date
GB294463A Expired GB990305A (en) 1963-01-23 1963-01-23 Improvements in or relating to the deposition of material on substrates

Country Status (1)

Country Link
GB (1) GB990305A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2233983A (en) * 1989-06-07 1991-01-23 Ppg Industries Inc Producing sputtered coating using foraminous mask member

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2233983A (en) * 1989-06-07 1991-01-23 Ppg Industries Inc Producing sputtered coating using foraminous mask member
GB2233983B (en) * 1989-06-07 1993-07-21 Ppg Industries Inc Apparatus and method for making sputtered coatings

Similar Documents

Publication Publication Date Title
US4543467A (en) Effusion type evaporator cell for vacuum evaporators
US3148084A (en) Process for making conductive film
US3419487A (en) Method of growing thin film semiconductors using an electron beam
US3117025A (en) Thin filming apparatus
SE7710119L (en) WAY TO PRODUCE LARGE SOLAR CELLS
US2919207A (en) Method of applying a ferromagnetic surface to a base utilizing iron carbonyl and oxygen
US3540926A (en) Nitride insulating films deposited by reactive evaporation
US3230109A (en) Vapor deposition method and apparatus
US2413604A (en) Method or process of evaporating metals
GB990305A (en) Improvements in or relating to the deposition of material on substrates
US3392056A (en) Method of making single crystal films and the product resulting therefrom
US2762722A (en) Method and apparatus for coating by thermal evaporation
US3101280A (en) Method of preparing indium antimonide films
KR960032594A (en) Reaction chamber with standard high temperature wall
GB1158888A (en) Improvements relating to Sputtering and Evaporation
GB1103211A (en) Improvements in and relating to vapour deposition and evaporation sources
US3373050A (en) Deflecting particles in vacuum coating process
US3024761A (en) Vacuum evaporation apparatus
JPS5750423A (en) Vapor phase growth device
US3603285A (en) Vapor deposition apparatus
US3530930A (en) Heat transfer method and apparatus
US2432538A (en) Method of coating surfaces with quartz
US4262630A (en) Method of applying layers of source substance over recipient and device for realizing same
GB1093525A (en) Improvements in or relating to arrangements for the manufacture of electronic element s
SU466300A1 (en) Evaporator