GB966464A - Method of forming single crystal films - Google Patents
Method of forming single crystal filmsInfo
- Publication number
- GB966464A GB966464A GB48560/62A GB4856062A GB966464A GB 966464 A GB966464 A GB 966464A GB 48560/62 A GB48560/62 A GB 48560/62A GB 4856062 A GB4856062 A GB 4856062A GB 966464 A GB966464 A GB 966464A
- Authority
- GB
- United Kingdom
- Prior art keywords
- silicon
- substrate
- chloride
- single crystal
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/18—Epitaxial-layer growth characterised by the substrate
-
- H10P95/00—
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/085—Isolated-integrated
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/107—Melt
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/15—Silicon on sapphire SOS
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/152—Single crystal on amorphous substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/967—Semiconductor on specified insulator
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US161992A US3139361A (en) | 1961-12-26 | 1961-12-26 | Method of forming single crystal films on a material in fluid form |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB966464A true GB966464A (en) | 1964-08-12 |
Family
ID=22583707
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB48560/62A Expired GB966464A (en) | 1961-12-26 | 1962-12-24 | Method of forming single crystal films |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3139361A (cg-RX-API-DMAC10.html) |
| BE (1) | BE626462A (cg-RX-API-DMAC10.html) |
| GB (1) | GB966464A (cg-RX-API-DMAC10.html) |
| NL (1) | NL286877A (cg-RX-API-DMAC10.html) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1053046A (cg-RX-API-DMAC10.html) * | 1963-02-25 | 1900-01-01 | ||
| FR1370724A (fr) * | 1963-07-15 | 1964-08-28 | Electronique & Automatisme Sa | Procédé de réalisation de couches minces monocristallines |
| US3372069A (en) * | 1963-10-22 | 1968-03-05 | Texas Instruments Inc | Method for depositing a single crystal on an amorphous film, method for manufacturing a metal base transistor, and a thin-film, metal base transistor |
| US3335038A (en) * | 1964-03-30 | 1967-08-08 | Ibm | Methods of producing single crystals on polycrystalline substrates and devices using same |
| US3337375A (en) * | 1964-04-13 | 1967-08-22 | Sprague Electric Co | Semiconductor method and device |
| US3484662A (en) * | 1965-01-15 | 1969-12-16 | North American Rockwell | Thin film transistor on an insulating substrate |
| US3645785A (en) * | 1969-11-12 | 1972-02-29 | Texas Instruments Inc | Ohmic contact system |
| US3770565A (en) * | 1972-01-05 | 1973-11-06 | Us Navy | Plastic mounting of epitaxially grown iv-vi compound semiconducting films |
| US3941647A (en) * | 1973-03-08 | 1976-03-02 | Siemens Aktiengesellschaft | Method of producing epitaxially semiconductor layers |
| US4058418A (en) * | 1974-04-01 | 1977-11-15 | Solarex Corporation | Fabrication of thin film solar cells utilizing epitaxial deposition onto a liquid surface to obtain lateral growth |
| US3993533A (en) * | 1975-04-09 | 1976-11-23 | Carnegie-Mellon University | Method for making semiconductors for solar cells |
| FR2407892A1 (fr) * | 1977-11-04 | 1979-06-01 | Rhone Poulenc Ind | Procede de fabrication de silicium pour la conversion photovoltaique |
| US4323419A (en) * | 1980-05-08 | 1982-04-06 | Atlantic Richfield Company | Method for ribbon solar cell fabrication |
| US4374163A (en) * | 1981-09-29 | 1983-02-15 | Westinghouse Electric Corp. | Method of vapor deposition |
| US11119049B2 (en) * | 2015-07-21 | 2021-09-14 | Fluidsens International Inc. | Particles in liquid detection method and particles in liquid detection system and method to detect particles in the air |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1141561A (fr) * | 1956-01-20 | 1957-09-04 | Cedel | Procédé et moyens pour la fabrication de matériaux semi-conducteurs |
-
0
- BE BE626462D patent/BE626462A/xx unknown
- NL NL286877D patent/NL286877A/xx unknown
-
1961
- 1961-12-26 US US161992A patent/US3139361A/en not_active Expired - Lifetime
-
1962
- 1962-12-24 GB GB48560/62A patent/GB966464A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| BE626462A (cg-RX-API-DMAC10.html) | |
| NL286877A (cg-RX-API-DMAC10.html) | |
| US3139361A (en) | 1964-06-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB966464A (en) | Method of forming single crystal films | |
| US4421592A (en) | Plasma enhanced deposition of semiconductors | |
| KR850001943B1 (ko) | 실리콘 결정체의 연속적 제조방법 | |
| US4123571A (en) | Method for forming smooth self limiting and pin hole free SiC films on Si | |
| US4464222A (en) | Process for increasing silicon thermal decomposition deposition rates from silicon halide-hydrogen reaction gases | |
| JP2548949B2 (ja) | 半導体製造用構成部材 | |
| KR850001942B1 (ko) | 반도체재료의 연속 제조방법 | |
| US3139363A (en) | Method of making a silicon article by use of a removable core of tantalum | |
| CN87206316U (zh) | 氮化硅涂层坩埚 | |
| US3895976A (en) | Processes for the localized and deep diffusion of gallium into silicon | |
| Hall | The thermal decomposition of germane | |
| GB1260233A (en) | Improvements in or relating to the epitaxial deposition of crystalline material from the gas phase | |
| US3226270A (en) | Method of crucible-free production of gallium arsenide rods from alkyl galliums and arsenic compounds at low temperatures | |
| US3734817A (en) | Treated quartz vessels for use in producing and further processing iii-v semiconductor bodies low in silicon | |
| US4451391A (en) | Conductive silicon carbide | |
| JPS54157779A (en) | Production of silicon single crystal | |
| GB997336A (en) | Improvements in or relating to apparatus for the preparation of rod-shaped members of semiconductor material of very high purity | |
| GB1229128A (cg-RX-API-DMAC10.html) | ||
| US3811963A (en) | Method of epitaxially depositing gallium nitride from the liquid phase | |
| JPH0688866B2 (ja) | 窒化ホウ素被覆ルツボおよびその製造方法 | |
| US3345209A (en) | Growth control of disproportionation process | |
| GB934673A (en) | Improvements in or relating to the production of semi-conductor materials | |
| EP0045191A1 (en) | Process and apparatus for the production of semiconductor bodies | |
| JPH0686352B2 (ja) | 高純度半導体単結晶製造用ルツボ | |
| US3573967A (en) | Vapor-liquid-solid crystal growth technique |