GB903790A - Apparatus for cathodic etching objects - Google Patents

Apparatus for cathodic etching objects

Info

Publication number
GB903790A
GB903790A GB341/60A GB34160A GB903790A GB 903790 A GB903790 A GB 903790A GB 341/60 A GB341/60 A GB 341/60A GB 34160 A GB34160 A GB 34160A GB 903790 A GB903790 A GB 903790A
Authority
GB
United Kingdom
Prior art keywords
chamber
workpiece
bellows
evacuated
insulator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB341/60A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nuclear Materials and Equipment Corp
Original Assignee
Nuclear Materials and Equipment Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nuclear Materials and Equipment Corp filed Critical Nuclear Materials and Equipment Corp
Publication of GB903790A publication Critical patent/GB903790A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Abstract

903,790. Cathodic etching. NUCLEAR MATERIALS & EQUIPMENT CORPORATION. Jan. 5, 1960 [Jan. 13, 1959], No. 341/60. Class 83 (4). [Also in Group XL (a)] In cathodic etching in which a workpiece acting as cathode and located in a chamber containing gas at low pressure is etched by electric discharge, the workpiece is embedded in an insulator exposing only the surface that is to be etched. The chamber 301, Fig. 9, having conducting walls 307 earthed to act as an anode, is evacuated through a tube 311 and is supplied with a gas, e.g. argon, through a fitting 400. The workpiece 312 embedded in an insulator 349 leaving opposite faces exposed is held within a clamping ring 351 screwed on to an insulating base 335 bolted to the chamber. The workpiece 312 rests on a conductive plate 329 forming the movable end of a bellows 321, the other end of which is fixed to a bush 325 within the base 335 and carrying a pipe 339. The negative terminal of a supply, e.g. 5000 volts D.C., is connected to the pipe 339 which also supplies cooling water to the inside of the bellows 321. When the chamber 301 is evacuated, expansion of the bellows 321 presses the plate 329 into firm contact with the workpiece 312 and clamps the insulator 349 firmly in position. In a modification, the base A, Fig. 1, of the chamber 23 acts as the anode and the cathode and workpiece holder 75 is supplied with cooling water and connected to the negative supply terminal through concentric pipes 31, 33. The chamber 23 is evacuated through a tube 91 connected through tubes 135, 137 respectively to a mechanical pump and a diffusion pump. Argon is bled into the chamber through a pipe 112. The supply is switched on by a vacuum switch responsive to the pressure of the chamber. In further modifications the bellows are replaced by a diaphragm or a piston and cylinder arrangement.
GB341/60A 1959-01-13 1960-01-05 Apparatus for cathodic etching objects Expired GB903790A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US786516A US3097154A (en) 1959-01-13 1959-01-13 Apparatus for method for etching objects

Publications (1)

Publication Number Publication Date
GB903790A true GB903790A (en) 1962-08-22

Family

ID=25138815

Family Applications (1)

Application Number Title Priority Date Filing Date
GB341/60A Expired GB903790A (en) 1959-01-13 1960-01-05 Apparatus for cathodic etching objects

Country Status (2)

Country Link
US (1) US3097154A (en)
GB (1) GB903790A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2314265A1 (en) * 1975-06-13 1977-01-07 Philips Nv PROCESS FOR REALIZING STRUCTURES PICKLED BY CATHODIC SPRAYING

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3268644A (en) * 1961-07-20 1966-08-23 Nuclear Materials & Equipment Method of making a specimen assembly
US4157465A (en) * 1972-01-10 1979-06-05 Smiths Industries Limited Gas-lubricated bearings
CA2065581C (en) * 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
JP5178502B2 (en) * 2008-12-26 2013-04-10 富士フイルム株式会社 Feed connection structure and electrolytic treatment apparatus
DE102012218582A1 (en) * 2012-10-11 2014-04-17 Areva Gmbh System and method for microstructural examination of a metallic component
DE102013201977B3 (en) * 2013-02-07 2014-07-03 Leibnitz-Institut Für Festkörper-Und Werkstoffforschung Dresden E.V. Method for preparing samples for transmission electron microscope analysis for various applications, involves applying pressure in region around sample during sputtering to realize maximum pressure difference between anode and cathode sides

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2899667A (en) * 1959-08-11 bredtschneider etal
DE661185C (en) * 1936-02-01 1938-06-13 Bernhard Berghaus Method and device for the production of metallic coatings from metals vaporized by means of an electric arc in a chamber
FR835664A (en) * 1937-03-25 1938-12-28 Electrical feedthrough for cathode sputtering devices
US2456902A (en) * 1945-03-17 1948-12-21 Westinghouse Electric Corp Contact and shorting mechanism
US2578027A (en) * 1948-03-15 1951-12-11 Edison Inc Thomas A Storage battery charging system and method
US2658120A (en) * 1948-05-25 1953-11-03 Bendix Aviat Corp Pressure responsive switch
US2702274A (en) * 1951-04-02 1955-02-15 Rca Corp Method of making an electrode screen by cathode sputtering
US2721839A (en) * 1951-10-17 1955-10-25 Westinghouse Air Brake Co Plating apparatus for electrical rectifiers
US2754259A (en) * 1952-11-29 1956-07-10 Sprague Electric Co Process and apparatus for growing single crystals
GB779347A (en) * 1953-08-18 1957-07-17 Edwards & Co London Ltd W Improvements in or relating to etching metals
LU34343A1 (en) * 1955-05-10
US2785246A (en) * 1956-01-20 1957-03-12 Aerotec Corp Altitude speed switch

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2314265A1 (en) * 1975-06-13 1977-01-07 Philips Nv PROCESS FOR REALIZING STRUCTURES PICKLED BY CATHODIC SPRAYING

Also Published As

Publication number Publication date
US3097154A (en) 1963-07-09

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