GB896934A - Improvements relating to diffraction gratings - Google Patents
Improvements relating to diffraction gratingsInfo
- Publication number
- GB896934A GB896934A GB1734559A GB1734559A GB896934A GB 896934 A GB896934 A GB 896934A GB 1734559 A GB1734559 A GB 1734559A GB 1734559 A GB1734559 A GB 1734559A GB 896934 A GB896934 A GB 896934A
- Authority
- GB
- United Kingdom
- Prior art keywords
- layer
- block
- strips
- chromium
- resist material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
A reflecting phase diffraction grating comprises a base plate with an optically flat surface, several parallel sided strips of a first material on this surface, the strips being of equal width and adjacent strips being spaced apart by a distance equal to their width and the thickness of the strips being equal to one quarter of a wavelength of the light to be used with the grating; a reflecting layer of a second material covering the strips and the uncovered portions of the surface so as to form a reflecting surface with several parallel sided steps corresponding with the strips and a transparent layer of silicone monoxide covering the reflecting surface. The diffraction grating may be made by applying to the optically flat surface of a block, a layer of photo-sensitive resist material on which a diffraction grating pattern is contact printed so that on subsequent development a negative image of the grating in hardened resist material remains upon the surface of the block. The block is then placed inside a vacuum chamber and cleaned by means of a glow discharge whereupon the chromium is vaporised to form a layer over the uncovered part of the surface of the block and over the resist material. The chromium layer is deposited until its thickness is equal to one quarter of the wavelength of the light to be used. On removal of the block from the vacuum chamber it is rubbed with a pad soaked in hydrogen peroxide or nitric acid so as to remove the resist material and its overlying chromium layer. The block is then replaced in the vacuum chamber and cleaned again before a layer of aluminium, chromium or rhodium is deposited on the pattern of chromium and the uncovered portions of the surface of the block so as to result in a reflecting surface in the form of a series of steps, each of a thickness equal to one quarter of a wavelength of the light to be used with the grating. Finally, a layer of silicon monoxide is deposited over the second layer to form an abrasion resistant coating. In a modified method the block is first given a silver coating and this is overcoated with photo-sensitive resist material in which a negative image of the grating is formed as before. The uncovered portions of the silver layer are then etched away with an alcoholic ferric nitrate solution and resist material covering the remaining portions of the silver layer is removed as by weak acetic acid and immersion in a trypsin suspension to leave silver strips on the block. After cleaning, a chromium layer is deposited by evaporation in a vacuum and the silver strips with overlying chromium layer are removed as before. Thereupon a second reflecting coating and a silicon monoxide overcoat are applied as in the first method. Apparatus for measuring the thickness of the chromium layer is also described (see Group XL(b)).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1734559A GB896934A (en) | 1959-05-21 | 1959-05-21 | Improvements relating to diffraction gratings |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1734559A GB896934A (en) | 1959-05-21 | 1959-05-21 | Improvements relating to diffraction gratings |
Publications (1)
Publication Number | Publication Date |
---|---|
GB896934A true GB896934A (en) | 1962-05-23 |
Family
ID=10093549
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1734559A Expired GB896934A (en) | 1959-05-21 | 1959-05-21 | Improvements relating to diffraction gratings |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB896934A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3334956A (en) * | 1963-06-17 | 1967-08-08 | Coleman Instr Corp | Selective diffraction grating system |
EP0110184A1 (en) * | 1982-11-04 | 1984-06-13 | Sumitomo Electric Industries Limited | Process for fabricating integrated optics |
GB2135776A (en) * | 1983-02-18 | 1984-09-05 | Boc Group Plc | Film thickness measurement |
DE3412980A1 (en) * | 1984-04-06 | 1985-10-17 | Dr. Johannes Heidenhain Gmbh, 8225 Traunreut | LIGHT PHASE GRID AND METHOD FOR PRODUCING A LIGHT PHASE GRID |
GB2200765A (en) * | 1986-10-27 | 1988-08-10 | Sharp Kk | A method for the production of an optical phase-shifting board |
EP1674895A1 (en) * | 2004-12-24 | 2006-06-28 | Canon Kabushiki Kaisha | Surface reflection type phase grating |
WO2016019071A1 (en) | 2014-07-29 | 2016-02-04 | Gentex Corporation | Laser ablation with reduced visual effects |
US10185198B2 (en) | 2015-06-19 | 2019-01-22 | Gentex Corporation | Second surface laser ablation |
US10610975B2 (en) | 2014-10-03 | 2020-04-07 | Gentex Corporation | Second surface laser ablation |
US11009760B2 (en) | 2017-05-05 | 2021-05-18 | Gentex Corporation | Interleaving laser ablation |
-
1959
- 1959-05-21 GB GB1734559A patent/GB896934A/en not_active Expired
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3334956A (en) * | 1963-06-17 | 1967-08-08 | Coleman Instr Corp | Selective diffraction grating system |
EP0110184A1 (en) * | 1982-11-04 | 1984-06-13 | Sumitomo Electric Industries Limited | Process for fabricating integrated optics |
GB2135776A (en) * | 1983-02-18 | 1984-09-05 | Boc Group Plc | Film thickness measurement |
DE3412980A1 (en) * | 1984-04-06 | 1985-10-17 | Dr. Johannes Heidenhain Gmbh, 8225 Traunreut | LIGHT PHASE GRID AND METHOD FOR PRODUCING A LIGHT PHASE GRID |
US4708437A (en) * | 1984-04-06 | 1987-11-24 | Dr. Johannes Heidenhain Gmbh | Incident-light phase grid and method for making same |
GB2200765B (en) * | 1986-10-27 | 1991-06-26 | Sharp Kk | A method for the production of an optical phase-shifting board |
GB2200765A (en) * | 1986-10-27 | 1988-08-10 | Sharp Kk | A method for the production of an optical phase-shifting board |
EP1674895A1 (en) * | 2004-12-24 | 2006-06-28 | Canon Kabushiki Kaisha | Surface reflection type phase grating |
WO2016019071A1 (en) | 2014-07-29 | 2016-02-04 | Gentex Corporation | Laser ablation with reduced visual effects |
EP3174662A4 (en) * | 2014-07-29 | 2018-05-02 | Gentex Corporation | Laser ablation with reduced visual effects |
US11130195B2 (en) | 2014-07-29 | 2021-09-28 | Gentex Corporation | Laser ablation with reduced visual effects |
US10610975B2 (en) | 2014-10-03 | 2020-04-07 | Gentex Corporation | Second surface laser ablation |
US10185198B2 (en) | 2015-06-19 | 2019-01-22 | Gentex Corporation | Second surface laser ablation |
US11275285B2 (en) | 2015-06-19 | 2022-03-15 | Gentex Corporation | Second surface laser ablation |
US11009760B2 (en) | 2017-05-05 | 2021-05-18 | Gentex Corporation | Interleaving laser ablation |
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