GB896934A - Improvements relating to diffraction gratings - Google Patents

Improvements relating to diffraction gratings

Info

Publication number
GB896934A
GB896934A GB1734559A GB1734559A GB896934A GB 896934 A GB896934 A GB 896934A GB 1734559 A GB1734559 A GB 1734559A GB 1734559 A GB1734559 A GB 1734559A GB 896934 A GB896934 A GB 896934A
Authority
GB
United Kingdom
Prior art keywords
layer
block
strips
chromium
resist material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1734559A
Inventor
Anthony Edward Ennos
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Associated Electrical Industries Ltd
Original Assignee
Associated Electrical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Associated Electrical Industries Ltd filed Critical Associated Electrical Industries Ltd
Priority to GB1734559A priority Critical patent/GB896934A/en
Publication of GB896934A publication Critical patent/GB896934A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1847Manufacturing methods
    • G02B5/1857Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1861Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

A reflecting phase diffraction grating comprises a base plate with an optically flat surface, several parallel sided strips of a first material on this surface, the strips being of equal width and adjacent strips being spaced apart by a distance equal to their width and the thickness of the strips being equal to one quarter of a wavelength of the light to be used with the grating; a reflecting layer of a second material covering the strips and the uncovered portions of the surface so as to form a reflecting surface with several parallel sided steps corresponding with the strips and a transparent layer of silicone monoxide covering the reflecting surface. The diffraction grating may be made by applying to the optically flat surface of a block, a layer of photo-sensitive resist material on which a diffraction grating pattern is contact printed so that on subsequent development a negative image of the grating in hardened resist material remains upon the surface of the block. The block is then placed inside a vacuum chamber and cleaned by means of a glow discharge whereupon the chromium is vaporised to form a layer over the uncovered part of the surface of the block and over the resist material. The chromium layer is deposited until its thickness is equal to one quarter of the wavelength of the light to be used. On removal of the block from the vacuum chamber it is rubbed with a pad soaked in hydrogen peroxide or nitric acid so as to remove the resist material and its overlying chromium layer. The block is then replaced in the vacuum chamber and cleaned again before a layer of aluminium, chromium or rhodium is deposited on the pattern of chromium and the uncovered portions of the surface of the block so as to result in a reflecting surface in the form of a series of steps, each of a thickness equal to one quarter of a wavelength of the light to be used with the grating. Finally, a layer of silicon monoxide is deposited over the second layer to form an abrasion resistant coating. In a modified method the block is first given a silver coating and this is overcoated with photo-sensitive resist material in which a negative image of the grating is formed as before. The uncovered portions of the silver layer are then etched away with an alcoholic ferric nitrate solution and resist material covering the remaining portions of the silver layer is removed as by weak acetic acid and immersion in a trypsin suspension to leave silver strips on the block. After cleaning, a chromium layer is deposited by evaporation in a vacuum and the silver strips with overlying chromium layer are removed as before. Thereupon a second reflecting coating and a silicon monoxide overcoat are applied as in the first method. Apparatus for measuring the thickness of the chromium layer is also described (see Group XL(b)).
GB1734559A 1959-05-21 1959-05-21 Improvements relating to diffraction gratings Expired GB896934A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB1734559A GB896934A (en) 1959-05-21 1959-05-21 Improvements relating to diffraction gratings

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1734559A GB896934A (en) 1959-05-21 1959-05-21 Improvements relating to diffraction gratings

Publications (1)

Publication Number Publication Date
GB896934A true GB896934A (en) 1962-05-23

Family

ID=10093549

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1734559A Expired GB896934A (en) 1959-05-21 1959-05-21 Improvements relating to diffraction gratings

Country Status (1)

Country Link
GB (1) GB896934A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3334956A (en) * 1963-06-17 1967-08-08 Coleman Instr Corp Selective diffraction grating system
EP0110184A1 (en) * 1982-11-04 1984-06-13 Sumitomo Electric Industries Limited Process for fabricating integrated optics
GB2135776A (en) * 1983-02-18 1984-09-05 Boc Group Plc Film thickness measurement
DE3412980A1 (en) * 1984-04-06 1985-10-17 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut LIGHT PHASE GRID AND METHOD FOR PRODUCING A LIGHT PHASE GRID
GB2200765A (en) * 1986-10-27 1988-08-10 Sharp Kk A method for the production of an optical phase-shifting board
EP1674895A1 (en) * 2004-12-24 2006-06-28 Canon Kabushiki Kaisha Surface reflection type phase grating
WO2016019071A1 (en) 2014-07-29 2016-02-04 Gentex Corporation Laser ablation with reduced visual effects
US10185198B2 (en) 2015-06-19 2019-01-22 Gentex Corporation Second surface laser ablation
US10610975B2 (en) 2014-10-03 2020-04-07 Gentex Corporation Second surface laser ablation
US11009760B2 (en) 2017-05-05 2021-05-18 Gentex Corporation Interleaving laser ablation

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3334956A (en) * 1963-06-17 1967-08-08 Coleman Instr Corp Selective diffraction grating system
EP0110184A1 (en) * 1982-11-04 1984-06-13 Sumitomo Electric Industries Limited Process for fabricating integrated optics
GB2135776A (en) * 1983-02-18 1984-09-05 Boc Group Plc Film thickness measurement
DE3412980A1 (en) * 1984-04-06 1985-10-17 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut LIGHT PHASE GRID AND METHOD FOR PRODUCING A LIGHT PHASE GRID
US4708437A (en) * 1984-04-06 1987-11-24 Dr. Johannes Heidenhain Gmbh Incident-light phase grid and method for making same
GB2200765B (en) * 1986-10-27 1991-06-26 Sharp Kk A method for the production of an optical phase-shifting board
GB2200765A (en) * 1986-10-27 1988-08-10 Sharp Kk A method for the production of an optical phase-shifting board
EP1674895A1 (en) * 2004-12-24 2006-06-28 Canon Kabushiki Kaisha Surface reflection type phase grating
WO2016019071A1 (en) 2014-07-29 2016-02-04 Gentex Corporation Laser ablation with reduced visual effects
EP3174662A4 (en) * 2014-07-29 2018-05-02 Gentex Corporation Laser ablation with reduced visual effects
US11130195B2 (en) 2014-07-29 2021-09-28 Gentex Corporation Laser ablation with reduced visual effects
US10610975B2 (en) 2014-10-03 2020-04-07 Gentex Corporation Second surface laser ablation
US10185198B2 (en) 2015-06-19 2019-01-22 Gentex Corporation Second surface laser ablation
US11275285B2 (en) 2015-06-19 2022-03-15 Gentex Corporation Second surface laser ablation
US11009760B2 (en) 2017-05-05 2021-05-18 Gentex Corporation Interleaving laser ablation

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