GB8613820D0 - Electron lithography - Google Patents

Electron lithography

Info

Publication number
GB8613820D0
GB8613820D0 GB868613820A GB8613820A GB8613820D0 GB 8613820 D0 GB8613820 D0 GB 8613820D0 GB 868613820 A GB868613820 A GB 868613820A GB 8613820 A GB8613820 A GB 8613820A GB 8613820 D0 GB8613820 D0 GB 8613820D0
Authority
GB
United Kingdom
Prior art keywords
electron lithography
lithography
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB868613820A
Other versions
GB2177847A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Turner D W
Original Assignee
Turner D W
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Turner D W filed Critical Turner D W
Publication of GB8613820D0 publication Critical patent/GB8613820D0/en
Publication of GB2177847A publication Critical patent/GB2177847A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3175—Projection methods, i.e. transfer substantially complete pattern to substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/152—Magnetic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30433—System calibration
    • H01J2237/30438—Registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31777—Lithography by projection
    • H01J2237/31779—Lithography by projection from patterned photocathode
GB08613820A 1985-06-07 1986-06-06 Electron lithography Withdrawn GB2177847A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB858514390A GB8514390D0 (en) 1985-06-07 1985-06-07 Electron lithography

Publications (2)

Publication Number Publication Date
GB8613820D0 true GB8613820D0 (en) 1986-07-09
GB2177847A GB2177847A (en) 1987-01-28

Family

ID=10580332

Family Applications (2)

Application Number Title Priority Date Filing Date
GB858514390A Pending GB8514390D0 (en) 1985-06-07 1985-06-07 Electron lithography
GB08613820A Withdrawn GB2177847A (en) 1985-06-07 1986-06-06 Electron lithography

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB858514390A Pending GB8514390D0 (en) 1985-06-07 1985-06-07 Electron lithography

Country Status (1)

Country Link
GB (2) GB8514390D0 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3851083T2 (en) * 1987-04-28 1995-01-12 Canon Kk Multi-electron beam pattern recorder.
EP0289279B1 (en) * 1987-04-28 1994-08-10 Canon Kabushiki Kaisha A multi-electron-beam pattern drawing apparatus
JPS63269445A (en) * 1987-04-28 1988-11-07 Canon Inc Electron beam head
DE68922929T2 (en) * 1988-03-23 1996-02-22 Fujitsu Ltd Photocathode image projection apparatus for patterning on a semiconductor device.
GB2260666B (en) * 1991-09-20 1995-12-20 Sharp Kk Time division multiplexed diode lasers
US5395738A (en) * 1992-12-29 1995-03-07 Brandes; George R. Electron lithography using a photocathode

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3679497A (en) * 1969-10-24 1972-07-25 Westinghouse Electric Corp Electron beam fabrication system and process for use thereof
US4039810A (en) * 1976-06-30 1977-08-02 International Business Machines Corporation Electron projection microfabrication system
CA1100237A (en) * 1977-03-23 1981-04-28 Roger F.W. Pease Multiple electron beam exposure system
GB8422895D0 (en) * 1984-09-11 1984-10-17 Texas Instruments Ltd Electron beam apparatus

Also Published As

Publication number Publication date
GB8514390D0 (en) 1985-07-10
GB2177847A (en) 1987-01-28

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)