GB8424302D0 - Mask structure - Google Patents

Mask structure

Info

Publication number
GB8424302D0
GB8424302D0 GB8424302A GB8424302A GB8424302D0 GB 8424302 D0 GB8424302 D0 GB 8424302D0 GB 8424302 A GB8424302 A GB 8424302A GB 8424302 A GB8424302 A GB 8424302A GB 8424302 D0 GB8424302 D0 GB 8424302D0
Authority
GB
United Kingdom
Prior art keywords
mask
heat sink
magnetic material
base
mask structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB8424302A
Other versions
GB2148540A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP58177288A external-priority patent/JPS6068341A/en
Priority claimed from JP58177287A external-priority patent/JPS6068340A/en
Application filed by Canon Inc filed Critical Canon Inc
Publication of GB8424302D0 publication Critical patent/GB8424302D0/en
Publication of GB2148540A publication Critical patent/GB2148540A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

A lithographic mask comprises a pattern carrying film supported on a base including magnetic material and/or a heat sink. The magnetic material may be any of Fe, Co or Ni or an alloy thereof and may be distributed in area 103a around the annular base e.g. Fig. 2, or may be in one layer 303g of the base, Fig. 3. The heat sink is preferably of brass. The magnetic material enables the mask to be handled by a magnetic chuck and the heat sink prevents mask distortion due to the mask heating on exposure to X- rays. <IMAGE>
GB8424302A 1983-09-26 1984-09-26 Lithographic mask Withdrawn GB2148540A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP58177288A JPS6068341A (en) 1983-09-26 1983-09-26 Structural body of mask for lithography
JP58177287A JPS6068340A (en) 1983-09-26 1983-09-26 Structural body of mask for lithography

Publications (2)

Publication Number Publication Date
GB8424302D0 true GB8424302D0 (en) 1984-10-31
GB2148540A GB2148540A (en) 1985-05-30

Family

ID=26497885

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8424302A Withdrawn GB2148540A (en) 1983-09-26 1984-09-26 Lithographic mask

Country Status (2)

Country Link
DE (1) DE3435178A1 (en)
GB (1) GB2148540A (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07101663B2 (en) * 1987-02-09 1995-11-01 キヤノン株式会社 Mask holding device
US4963921A (en) * 1985-06-24 1990-10-16 Canon Kabushiki Kaisha Device for holding a mask
DE3620970A1 (en) * 1985-06-24 1987-01-08 Canon Kk Mask holding device
KR920010065B1 (en) * 1989-04-20 1992-11-13 삼성전자 주식회사 X-ray mask
JP2001100395A (en) * 1999-09-30 2001-04-13 Toshiba Corp Mask for exposure and method for manufacturing the same
CN104391426A (en) * 2014-11-21 2015-03-04 胜科纳米（苏州）有限公司 Mask

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3916056A (en) * 1972-12-29 1975-10-28 Rca Corp Photomask bearing a pattern of metal plated areas
US4018938A (en) * 1975-06-30 1977-04-19 International Business Machines Corporation Fabrication of high aspect ratio masks
DE2626851C3 (en) * 1976-06-15 1982-03-18 Siemens AG, 1000 Berlin und 8000 München Process for the production of masks for X-ray lithography

Also Published As

Publication number Publication date
DE3435178A1 (en) 1985-04-04
GB2148540A (en) 1985-05-30

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)